TY - CHAP A1 - Scholze, Frank A1 - Laubis, Christian A1 - Dersch, Uwe A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank ED - Bosse, Harald T1 - The influence of line edge roughness and CD uniformity on EUV scatterometry for CD characterization of EUV masks T2 - Modeling Aspects in Optical Metrology Y1 - 2007 VL - 6617 SP - 66171A PB - Proc. SPIE ER - TY - CHAP A1 - Scholze, Frank A1 - Laubis, Christian A1 - Ulm, Gerhard A1 - Dersch, Uwe A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank ED - Schellenberg, Frank T1 - Evaluation of EUV scatterometry for CD characterization of EUV masks using rigorous FEM-simulation T2 - Emerging Lithographic Technologies XII Y1 - 2008 VL - 6921 PB - SPIE ER - TY - CHAP A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank A1 - Scholze, Frank A1 - Laubis, Christian A1 - Dersch, Uwe ED - Horiuchi, Toshiyuki T1 - Metrology of EUV masks by EUV-scatterometry and finite element analysis T2 - Photomask and Next-Generation Lithography Mask Technology XV Y1 - 2008 VL - 7028 PB - SPIE ER - TY - CHAP A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank A1 - Zschiedrich, Lin A1 - Scholze, Frank ED - Martin, P. ED - Naber, R. T1 - Rigorous FEM-Simulation of EUV-Masks: Influence of shape and material parameters T2 - Photomask Technology Y1 - 2006 U6 - https://doi.org/10.1117/12.686828 VL - 6349 SP - 63493D PB - Proc. SPIE ER - TY - CHAP A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank A1 - Scholze, Frank A1 - Laubis, Christian A1 - Dersch, Uwe ED - Bosse, Harald T1 - Finite element analysis of EUV lithography T2 - Modeling Aspects in Optical Metrology Y1 - 2007 U6 - https://doi.org/10.1117/12.726156 VL - 6617 SP - 661718 PB - Proc. SPIE ER - TY - CHAP A1 - Burger, Sven A1 - Zschiedrich, Lin A1 - Pomplun, Jan A1 - Schmidt, Frank A1 - Kato, Akiko A1 - Laubis, Christian A1 - Scholze, Frank T1 - Investigation of 3D Patterns on EUV Masks by Means of Scatterometry and Comparison to Numerical Simulations T2 - Photomask Technology 2011 Y1 - 2011 U6 - https://doi.org/10.1117/12.896839 VL - 8166 SP - 81661Q PB - Proc. SPIE ER - TY - JOUR A1 - Bodermann, Bernd A1 - Buhr, Egbert A1 - Danzebrink, Hans-Ulrich A1 - Bär, Markus A1 - Scholze, Frank A1 - Krumrey, Michael A1 - Wurm, Matthias A1 - Klapetek, Petr A1 - Hansen, Poul-Erik A1 - Korpelainen, Virpi A1 - van Veghel, Marijn A1 - Yacoot, Andrew A1 - Siitonen, Samuli A1 - El Gawhary, Omar A1 - Burger, Sven A1 - Saastamoinen, Toni T1 - Joint Research on Scatterometry and AFM Wafer Metrology JF - AIP Conference Proceedings Y1 - 2011 U6 - https://doi.org/10.1063/1.3657910 VL - 1395 IS - 1 SP - 319 EP - 323 PB - AIP ER - TY - CHAP A1 - Bodermann, Bernd A1 - Hansen, Poul-Erik A1 - Burger, Sven A1 - Henn, Mark-Alexander A1 - Gross, Hermann A1 - Bär, Markus A1 - Scholze, Frank A1 - Endres, Johannes A1 - Wurm, Matthias T1 - First steps towards a scatterometry reference standard T2 - Proc. SPIE Y1 - 2012 U6 - https://doi.org/10.1117/12.929903 VL - 8466 SP - 84660E ER - TY - JOUR A1 - Kato, Akiko A1 - Burger, Sven A1 - Scholze, Frank T1 - Analytical modeling and 3D finite element simulation of line edge roughness in scatterometry JF - Appl. Optics Y1 - 2012 U6 - https://doi.org/10.1364/AO.51.006457 VL - 51 SP - 6457 EP - 6464 ER - TY - CHAP A1 - Scholze, Frank A1 - Bodermann, Bernd A1 - Burger, Sven A1 - Endres, Johannes A1 - Haase, Anton A1 - Krumrey, Michael A1 - Laubis, Christian A1 - Soltwisch, Victor A1 - Ullrich, Albrecht A1 - Wernecke, Jan T1 - Determination of line profiles on photomasks using DUV, EUV and X-ray scattering T2 - Proc. SPIE Y1 - 2014 U6 - https://doi.org/10.1117/12.2065941 VL - 9231 SP - 92310M ER - TY - JOUR A1 - Soltwisch, Victor A1 - Haase, Anton A1 - Wernecke, Jan A1 - Probst, Jürgen A1 - Schoengen, Max A1 - Burger, Sven A1 - Krumrey, Michael A1 - Scholze, Frank T1 - Correlated diffuse x-ray scattering from periodically nanostructured surfaces JF - Phys. Rev. B Y1 - 2016 U6 - https://doi.org/10.1103/PhysRevB.94.035419 VL - 94 SP - 035419 ER - TY - JOUR A1 - Soltwisch, Victor A1 - Burger, Sven A1 - Scholze, Frank T1 - Scatterometry sensitivity analysis for conical diffraction versus in-plane diffraction geometry with respect to the side wall angle JF - Proc. SPIE Y1 - 2013 U6 - https://doi.org/10.1117/12.2020487 VL - 8789 SP - 878905 ER - TY - CHAP A1 - Agcos, Emil A1 - Bodermann, Bernd A1 - Burger, Sven A1 - Dai, Gaoliang A1 - Endres, Johannes A1 - Hansen, Poul-Erik A1 - Nielson, Lars A1 - Madsen, Morten A1 - Heidenreich, Sebastian A1 - Krumrey, Michael A1 - Loechel, Bernd A1 - Probst, Jürgen A1 - Scholze, Frank A1 - Soltwisch, Victor A1 - Wurm, Matthias T1 - Scatterometry reference standards to improve tool matching and traceability in lithographical nanomanufacturing T2 - Proc. SPIE Y1 - 2015 U6 - https://doi.org/10.1117/12.2190409 VL - 9556 SP - 955610 ER - TY - CHAP A1 - Soltwisch, Victor A1 - Wernecke, Jan A1 - Haase, Anton A1 - Probst, Jürgen A1 - Schoengen, Max A1 - Scholze, Frank A1 - Pomplun, Jan A1 - Burger, Sven T1 - Determination of line profile on nanostructured surfaces using EUV and x-ray scattering T2 - Proc. SPIE Y1 - 2014 U6 - https://doi.org/10.1117/12.2066165 VL - 9235 SP - 92351D ER - TY - JOUR A1 - Andrle, Anna A1 - Hönicke, Philipp A1 - Schneider, Philipp-Immanuel A1 - Kayser, Yves A1 - Hammerschmidt, Martin A1 - Burger, Sven A1 - Scholze, Frank A1 - Beckhoff, Burkhard A1 - Soltwisch, Victor T1 - Grazing incidence x-ray fluorescence based characterization of nanostructures for element sensitive profile reconstruction JF - Proc. SPIE Y1 - 2019 U6 - https://doi.org/10.1117/12.2526082 VL - 11057 SP - 110570M ER -