TY - JOUR A1 - Gschrey, Manuel A1 - Thoma, Alexander A1 - Schnauber, Peter A1 - Seifried, Marc A1 - Schmidt, Ronny A1 - Wohlfeil, Benjamin A1 - Krüger, Luzy A1 - Schulze, Jan-Hindrick A1 - Heindel, Tobias A1 - Burger, Sven A1 - Schmidt, Frank A1 - Strittmatter, Andre A1 - Rodt, Sven A1 - Reitzenstein, Stephan T1 - Highly indistinguishable photons from deterministic quantum-dot microlenses utilizing three-dimensional in situ electron-beam lithography JF - Nature Communications Y1 - 2015 U6 - https://doi.org/10.1038/ncomms8662 VL - 6 SP - 7662 ER - TY - CHAP A1 - Thoma, Alexander A1 - Schnauber, Peter A1 - Gschrey, Manuel A1 - Schmidt, Ronny A1 - Wohlfeil, Benjamin A1 - Seifried, Marc A1 - Schulze, Jan-Hindrick A1 - Burger, Sven A1 - Schmidt, Frank A1 - Strittmatter, Andre A1 - Rodt, Sven A1 - Heindel, Tobias A1 - Reitzenstein, Stephan T1 - Indistinguishable Photons from Deterministically Fabricated Quantum Dot Microlenses T2 - Advanced Photonics Y1 - 2015 U6 - https://doi.org/10.1364/IPRSN.2015.IS4A.6 SP - IS4A.6 ER - TY - CHAP A1 - Gschrey, Manuel A1 - Seifried, Marc A1 - Krüger, Luzy A1 - Schmidt, Ronny A1 - Schulze, Jan-Hindrick A1 - Heindel, Tobias A1 - Burger, Sven A1 - Rodt, Sven A1 - Schmidt, Frank A1 - Strittmatter, Andre A1 - Reitzenstein, Stephan T1 - Advanced Quantum Light Sources: Modelling and Realization by Deterministic Nanofabrication Technologies T2 - Integrated Photonics Research, Silicon and Nanophotonics Y1 - 2014 U6 - https://doi.org/10.1364/IPRSN.2014.IW1A.3 VL - IPRSN SP - IW1A.3 ER - TY - CHAP A1 - Gschrey, Manuel A1 - Seifried, Marc A1 - Krüger, Luzy A1 - Schmidt, Ronny A1 - Schulze, Jan-Hindrick A1 - Heindel, Tobias A1 - Burger, Sven A1 - Rodt, Sven A1 - Schmidt, Frank A1 - Strittmatter, Andre A1 - Reitzenstein, Stephan T1 - Boosting the photon-extraction efficiency of nanophotonic structures by deterministic microlenses T2 - CLEO: 2014 Y1 - 2014 U6 - https://doi.org/10.1364/CLEO_QELS.2014.FF2K.2 SP - FF2K.2 PB - Optical Society of America ER - TY - GEN A1 - Amiranashvili, Shalva A1 - Bandelow, Uwe A1 - Blome, Mark A1 - Burger, Sven A1 - Schmidt, Frank A1 - Schmidt, Kersten A1 - Zschiedrich, Lin ED - Deuflhard, Peter ED - et al., T1 - Nanophotonics and nonlinear fiber optics T2 - MATHEON-Mathematics for Key Technologies Y1 - 2014 U6 - https://doi.org/10.4171/137 VL - 1 SP - 257 EP - 275 PB - European Mathematical Society ER - TY - CHAP A1 - Thoma, Alexander A1 - Schnauber, Peter A1 - Gschrey, Manuel A1 - Schmidt, Ronny A1 - Wohlfeil, Benjamin A1 - Seifried, Marc A1 - Schulze, Jan-Hindrick A1 - Burger, Sven A1 - Schmidt, Frank A1 - Strittmatter, Andre A1 - Rodt, Sven A1 - Heindel, Tobias A1 - Reitzenstein, Stephan T1 - Indistinguishable Photons from Deterministic Quantum Dot Microlenses T2 - European Conference on Lasers and Electro-Optics - European Quantum Electronics Conference Y1 - 2015 U6 - https://doi.org/10.1364/IPRSN.2015.IS4A.6 SP - EA_8_5 ER - TY - CHAP A1 - Scholze, Frank A1 - Laubis, Christian A1 - Ulm, Gerhard A1 - Dersch, Uwe A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank ED - Schellenberg, Frank T1 - Evaluation of EUV scatterometry for CD characterization of EUV masks using rigorous FEM-simulation T2 - Emerging Lithographic Technologies XII Y1 - 2008 VL - 6921 PB - SPIE ER - TY - CHAP A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank A1 - Scholze, Frank A1 - Laubis, Christian A1 - Dersch, Uwe ED - Horiuchi, Toshiyuki T1 - Metrology of EUV masks by EUV-scatterometry and finite element analysis T2 - Photomask and Next-Generation Lithography Mask Technology XV Y1 - 2008 VL - 7028 PB - SPIE ER - TY - CHAP A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank A1 - Zschiedrich, Lin A1 - Scholze, Frank ED - Martin, P. ED - Naber, R. T1 - Rigorous FEM-Simulation of EUV-Masks: Influence of shape and material parameters T2 - Photomask Technology Y1 - 2006 U6 - https://doi.org/10.1117/12.686828 VL - 6349 SP - 63493D PB - Proc. SPIE ER - TY - CHAP A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank A1 - Scholze, Frank A1 - Laubis, Christian A1 - Dersch, Uwe ED - Bosse, Harald T1 - Finite element analysis of EUV lithography T2 - Modeling Aspects in Optical Metrology Y1 - 2007 U6 - https://doi.org/10.1117/12.726156 VL - 6617 SP - 661718 PB - Proc. SPIE ER - TY - CHAP A1 - Scholze, Frank A1 - Laubis, Christian A1 - Dersch, Uwe A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank ED - Bosse, Harald T1 - The influence of line edge roughness and CD uniformity on EUV scatterometry for CD characterization of EUV masks T2 - Modeling Aspects in Optical Metrology Y1 - 2007 VL - 6617 SP - 66171A PB - Proc. SPIE ER - TY - CHAP A1 - Burger, Sven A1 - Zschiedrich, Lin A1 - Pomplun, Jan A1 - Schmidt, Frank A1 - Kato, Akiko A1 - Laubis, Christian A1 - Scholze, Frank T1 - Investigation of 3D Patterns on EUV Masks by Means of Scatterometry and Comparison to Numerical Simulations T2 - Photomask Technology 2011 Y1 - 2011 U6 - https://doi.org/10.1117/12.896839 VL - 8166 SP - 81661Q PB - Proc. SPIE ER -