TY - JOUR A1 - Gschrey, Manuel A1 - Thoma, Alexander A1 - Schnauber, Peter A1 - Seifried, Marc A1 - Schmidt, Ronny A1 - Wohlfeil, Benjamin A1 - Krüger, Luzy A1 - Schulze, Jan-Hindrick A1 - Heindel, Tobias A1 - Burger, Sven A1 - Schmidt, Frank A1 - Strittmatter, Andre A1 - Rodt, Sven A1 - Reitzenstein, Stephan T1 - Highly indistinguishable photons from deterministic quantum-dot microlenses utilizing three-dimensional in situ electron-beam lithography JF - Nature Communications Y1 - 2015 U6 - https://doi.org/10.1038/ncomms8662 VL - 6 SP - 7662 ER - TY - CHAP A1 - Thoma, Alexander A1 - Schnauber, Peter A1 - Gschrey, Manuel A1 - Schmidt, Ronny A1 - Wohlfeil, Benjamin A1 - Seifried, Marc A1 - Schulze, Jan-Hindrick A1 - Burger, Sven A1 - Schmidt, Frank A1 - Strittmatter, Andre A1 - Rodt, Sven A1 - Heindel, Tobias A1 - Reitzenstein, Stephan T1 - Indistinguishable Photons from Deterministically Fabricated Quantum Dot Microlenses T2 - Advanced Photonics Y1 - 2015 U6 - https://doi.org/10.1364/IPRSN.2015.IS4A.6 SP - IS4A.6 ER - TY - CHAP A1 - Gschrey, Manuel A1 - Seifried, Marc A1 - Krüger, Luzy A1 - Schmidt, Ronny A1 - Schulze, Jan-Hindrick A1 - Heindel, Tobias A1 - Burger, Sven A1 - Rodt, Sven A1 - Schmidt, Frank A1 - Strittmatter, Andre A1 - Reitzenstein, Stephan T1 - Advanced Quantum Light Sources: Modelling and Realization by Deterministic Nanofabrication Technologies T2 - Integrated Photonics Research, Silicon and Nanophotonics Y1 - 2014 U6 - https://doi.org/10.1364/IPRSN.2014.IW1A.3 VL - IPRSN SP - IW1A.3 ER - TY - CHAP A1 - Gschrey, Manuel A1 - Seifried, Marc A1 - Krüger, Luzy A1 - Schmidt, Ronny A1 - Schulze, Jan-Hindrick A1 - Heindel, Tobias A1 - Burger, Sven A1 - Rodt, Sven A1 - Schmidt, Frank A1 - Strittmatter, Andre A1 - Reitzenstein, Stephan T1 - Boosting the photon-extraction efficiency of nanophotonic structures by deterministic microlenses T2 - CLEO: 2014 Y1 - 2014 U6 - https://doi.org/10.1364/CLEO_QELS.2014.FF2K.2 SP - FF2K.2 PB - Optical Society of America ER - TY - GEN A1 - Amiranashvili, Shalva A1 - Bandelow, Uwe A1 - Blome, Mark A1 - Burger, Sven A1 - Schmidt, Frank A1 - Schmidt, Kersten A1 - Zschiedrich, Lin ED - Deuflhard, Peter ED - et al., T1 - Nanophotonics and nonlinear fiber optics T2 - MATHEON-Mathematics for Key Technologies Y1 - 2014 U6 - https://doi.org/10.4171/137 VL - 1 SP - 257 EP - 275 PB - European Mathematical Society ER - TY - CHAP A1 - Thoma, Alexander A1 - Schnauber, Peter A1 - Gschrey, Manuel A1 - Schmidt, Ronny A1 - Wohlfeil, Benjamin A1 - Seifried, Marc A1 - Schulze, Jan-Hindrick A1 - Burger, Sven A1 - Schmidt, Frank A1 - Strittmatter, Andre A1 - Rodt, Sven A1 - Heindel, Tobias A1 - Reitzenstein, Stephan T1 - Indistinguishable Photons from Deterministic Quantum Dot Microlenses T2 - European Conference on Lasers and Electro-Optics - European Quantum Electronics Conference Y1 - 2015 U6 - https://doi.org/10.1364/IPRSN.2015.IS4A.6 SP - EA_8_5 ER - TY - CHAP A1 - Scholze, Frank A1 - Laubis, Christian A1 - Ulm, Gerhard A1 - Dersch, Uwe A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank ED - Schellenberg, Frank T1 - Evaluation of EUV scatterometry for CD characterization of EUV masks using rigorous FEM-simulation T2 - Emerging Lithographic Technologies XII Y1 - 2008 VL - 6921 PB - SPIE ER - TY - CHAP A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank A1 - Scholze, Frank A1 - Laubis, Christian A1 - Dersch, Uwe ED - Horiuchi, Toshiyuki T1 - Metrology of EUV masks by EUV-scatterometry and finite element analysis T2 - Photomask and Next-Generation Lithography Mask Technology XV Y1 - 2008 VL - 7028 PB - SPIE ER - TY - CHAP A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank A1 - Zschiedrich, Lin A1 - Scholze, Frank ED - Martin, P. ED - Naber, R. T1 - Rigorous FEM-Simulation of EUV-Masks: Influence of shape and material parameters T2 - Photomask Technology Y1 - 2006 U6 - https://doi.org/10.1117/12.686828 VL - 6349 SP - 63493D PB - Proc. SPIE ER - TY - CHAP A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank A1 - Scholze, Frank A1 - Laubis, Christian A1 - Dersch, Uwe ED - Bosse, Harald T1 - Finite element analysis of EUV lithography T2 - Modeling Aspects in Optical Metrology Y1 - 2007 U6 - https://doi.org/10.1117/12.726156 VL - 6617 SP - 661718 PB - Proc. SPIE ER - TY - CHAP A1 - Scholze, Frank A1 - Laubis, Christian A1 - Dersch, Uwe A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank ED - Bosse, Harald T1 - The influence of line edge roughness and CD uniformity on EUV scatterometry for CD characterization of EUV masks T2 - Modeling Aspects in Optical Metrology Y1 - 2007 VL - 6617 SP - 66171A PB - Proc. SPIE ER - TY - CHAP A1 - Burger, Sven A1 - Zschiedrich, Lin A1 - Pomplun, Jan A1 - Schmidt, Frank A1 - Kato, Akiko A1 - Laubis, Christian A1 - Scholze, Frank T1 - Investigation of 3D Patterns on EUV Masks by Means of Scatterometry and Comparison to Numerical Simulations T2 - Photomask Technology 2011 Y1 - 2011 U6 - https://doi.org/10.1117/12.896839 VL - 8166 SP - 81661Q PB - Proc. SPIE ER - TY - GEN A1 - Schädle, Achim A1 - Zschiedrich, Lin A1 - Burger, Sven A1 - Klose, Roland A1 - Schmidt, Frank T1 - Domain Decomposition Method for Maxwell's Equations: Scattering off Periodic Structures N2 - We present a domain decomposition approach for the computation of the electromagnetic field within periodic structures. We use a Schwarz method with transparent boundary conditions at the interfaces of the domains. Transparent boundary conditions are approximated by the perfectly matched layer method (PML). To cope with Wood anomalies appearing in periodic structures an adaptive strategy to determine optimal PML parameters is developed. We focus on the application to typical EUV lithography line masks. Light propagation within the multi-layer stack of the EUV mask is treated analytically. This results in a drastic reduction of the computational costs and allows for the simulation of next generation lithography masks on a standard personal computer. T3 - ZIB-Report - 06-04 KW - domain decomposition KW - conical diffraction KW - electro-magnetic scattering KW - Maxwell's equations KW - Lithography KW - finite elements Y1 - 2006 U6 - http://nbn-resolving.de/urn/resolver.pl?urn:nbn:de:0297-zib-8984 ER -