TY - CHAP A1 - Pomplun, Jan A1 - Zschiedrich, Lin A1 - Burger, Sven A1 - Schmidt, Frank A1 - Tyminski, Jacek A1 - Flagello, Donis A1 - Toshiharu, N. T1 - Reduced basis method for source mask optimization T2 - Photomask Technology Y1 - 2010 U6 - https://doi.org/10.1117/12.866101 VL - 7823 SP - 78230E PB - Proc. SPIE ER - TY - CHAP A1 - Burger, Sven A1 - Zschiedrich, Lin A1 - Pomplun, Jan A1 - Schmidt, Frank A1 - Kettner, Benjamin A1 - Lockau, D. T1 - 3D Finite-Element Simulations of Enhanced Light Transmission Through Arrays of Holes in Metal Films T2 - Numerical Methods in Optical Metrology Y1 - 2009 U6 - https://doi.org/10.1117/12.827543 VL - 7390 SP - 73900H PB - Proc. SPIE ER - TY - CHAP A1 - Burger, Sven A1 - Zschiedrich, Lin A1 - Pomplun, Jan A1 - Schmidt, Frank T1 - Finite element method for accurate 3D simulation of plasmonic waveguides T2 - Integrated Optics: Devices, Materials, and Technologies XIV Y1 - 2010 U6 - https://doi.org/10.1117/12.841995 VL - 7604 SP - 76040F PB - Proc. SPIE ER - TY - CHAP A1 - Burger, Sven A1 - Zschiedrich, Lin A1 - Pomplun, Jan A1 - Schmidt, Frank T1 - JCMsuite: An Adaptive FEM Solver for Precise Simulations in Nano-Optics T2 - Integrated Photonics and Nanophotonics Research and Applications Y1 - 2008 U6 - https://doi.org/10.1364/IPNRA.2008.ITuE4 SP - ITuE4 PB - Optical Society of America ER - TY - CHAP A1 - Pomplun, Jan A1 - Zschiedrich, Lin A1 - Burger, Sven A1 - Schmidt, Frank T1 - Reduced basis method for computational lithography T2 - Photomask Technology Y1 - 2009 U6 - https://doi.org/10.1117/12.829639 VL - 7488 SP - 74882B PB - Proc. SPIE ER - TY - CHAP A1 - Schmidt, Frank A1 - Burger, Sven A1 - Pomplun, Jan A1 - Zschiedrich, Lin ED - Greiner, Christoph ED - Wächter, Christoph T1 - Advanced FEM analysis of optical waveguides: algorithms and applications T2 - Integrated Optics Y1 - 2008 U6 - https://doi.org/10.1117/12.765720 VL - 6896 SP - 689602 PB - SPIE ER - TY - CHAP A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank A1 - Zschiedrich, Lin A1 - Scholze, Frank ED - Martin, P. ED - Naber, R. T1 - Rigorous FEM-Simulation of EUV-Masks: Influence of shape and material parameters T2 - Photomask Technology Y1 - 2006 U6 - https://doi.org/10.1117/12.686828 VL - 6349 SP - 63493D PB - Proc. SPIE ER - TY - JOUR A1 - Pomplun, Jan A1 - Burger, Sven A1 - Zschiedrich, Lin A1 - Schmidt, Frank T1 - Adaptive finite element method for simulation of optical nano structures JF - Phys. Status Solidi B Y1 - 2007 U6 - https://doi.org/10.1002/pssb.200743192 VL - 244 SP - 3419 EP - 3434 ER - TY - CHAP A1 - Pomplun, Jan A1 - Holzlöhner, Ronald A1 - Burger, Sven A1 - Zschiedrich, Lin A1 - Schmidt, Frank ED - Adibi, Ali ED - Scherer, Axel ED - Lin, Shawn-Yu T1 - FEM investigation of leaky modes in hollow core photonic crystal fibers T2 - Proc. SPIE, Photonic Crystal Materials and Devices VI Y1 - 2007 UR - http://arxiv.org/pdf/physics/0702165 VL - 6480 SP - 64800M ER - TY - CHAP A1 - Pomplun, Jan A1 - Schmidt, Frank A1 - Burger, Sven A1 - Zschiedrich, Lin T1 - Adaptive Reduced Basis Method for Optical Scattering Problems T2 - Integrated Photonics Research, Silicon and Nanophotonics Y1 - 2010 U6 - https://doi.org/10.1364/IPRSN.2010.IWD4 SP - IWD4 PB - OSA ER -