TY - CHAP A1 - Pomplun, Jan A1 - Zschiedrich, Lin A1 - Burger, Sven A1 - Schmidt, Frank A1 - Tyminski, Jacek A1 - Flagello, Donis A1 - Toshiharu, N. T1 - Reduced basis method for source mask optimization T2 - Photomask Technology Y1 - 2010 U6 - https://doi.org/10.1117/12.866101 VL - 7823 SP - 78230E PB - Proc. SPIE ER - TY - CHAP A1 - Tyminski, Jacek A1 - Pomplun, Jan A1 - Renwick, Stephen P. T1 - Impact of topographic mask models on scanner matching solutions T2 - Proc. SPIE: Optical Microlithography XXVII Y1 - 2014 U6 - https://doi.org/10.1117/12.2045919 VL - 9052 SP - 905218 ER - TY - CHAP A1 - Tyminski, Jacek A1 - Popescu, Raluca A1 - Burger, Sven A1 - Pomplun, Jan A1 - Zschiedrich, Lin A1 - Matsuyama, Tomoyuki A1 - Noda, Tomoya ED - Conley, W. T1 - Finite element models of lithographic mask topography T2 - Proc. SPIE Y1 - 2012 U6 - https://doi.org/10.1117/12.916957 VL - 8326 SP - 83261B ER - TY - JOUR A1 - Tyminski, Jacek A1 - Pomplun, Jan A1 - Zschiedrich, Lin A1 - Flagello, Donis A1 - Matsuyama, Tomiyuki T1 - Topographic mask modeling with reduced basis finite element method JF - Proc. SPIE Y1 - 2013 U6 - https://doi.org/10.1117/12.2011613 VL - 8683 SP - 86831C ER -