TY - CHAP A1 - Burger, Sven A1 - Köhle, Roderick A1 - Zschiedrich, Lin A1 - Nguyen, H. A1 - Schmidt, Frank A1 - März, Reinhard A1 - Nölscher, Christoph ED - Martin, P. ED - Naber, R. T1 - Rigorous Simulation of 3D Masks T2 - Photomask Technology Y1 - 2006 UR - http://arxiv.org/pdf/physics/0610218 VL - 6349 SP - 63494Z PB - Proc. SPIE ER -