TY - CHAP A1 - Scholze, Frank A1 - Laubis, Christian A1 - Ulm, Gerhard A1 - Dersch, Uwe A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank ED - Schellenberg, Frank T1 - Evaluation of EUV scatterometry for CD characterization of EUV masks using rigorous FEM-simulation T2 - Emerging Lithographic Technologies XII Y1 - 2008 VL - 6921 PB - SPIE ER - TY - CHAP A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank A1 - Scholze, Frank A1 - Laubis, Christian A1 - Dersch, Uwe ED - Horiuchi, Toshiyuki T1 - Metrology of EUV masks by EUV-scatterometry and finite element analysis T2 - Photomask and Next-Generation Lithography Mask Technology XV Y1 - 2008 VL - 7028 PB - SPIE ER - TY - CHAP A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank A1 - Zschiedrich, Lin A1 - Scholze, Frank ED - Martin, P. ED - Naber, R. T1 - Rigorous FEM-Simulation of EUV-Masks: Influence of shape and material parameters T2 - Photomask Technology Y1 - 2006 U6 - https://doi.org/10.1117/12.686828 VL - 6349 SP - 63493D PB - Proc. SPIE ER - TY - CHAP A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank A1 - Scholze, Frank A1 - Laubis, Christian A1 - Dersch, Uwe ED - Bosse, Harald T1 - Finite element analysis of EUV lithography T2 - Modeling Aspects in Optical Metrology Y1 - 2007 U6 - https://doi.org/10.1117/12.726156 VL - 6617 SP - 661718 PB - Proc. SPIE ER - TY - CHAP A1 - Scholze, Frank A1 - Laubis, Christian A1 - Dersch, Uwe A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank ED - Bosse, Harald T1 - The influence of line edge roughness and CD uniformity on EUV scatterometry for CD characterization of EUV masks T2 - Modeling Aspects in Optical Metrology Y1 - 2007 VL - 6617 SP - 66171A PB - Proc. SPIE ER - TY - CHAP A1 - Burger, Sven A1 - Zschiedrich, Lin A1 - Pomplun, Jan A1 - Schmidt, Frank A1 - Kato, Akiko A1 - Laubis, Christian A1 - Scholze, Frank T1 - Investigation of 3D Patterns on EUV Masks by Means of Scatterometry and Comparison to Numerical Simulations T2 - Photomask Technology 2011 Y1 - 2011 U6 - https://doi.org/10.1117/12.896839 VL - 8166 SP - 81661Q PB - Proc. SPIE ER - TY - JOUR A1 - Soltwisch, Victor A1 - Burger, Sven A1 - Scholze, Frank T1 - Scatterometry sensitivity analysis for conical diffraction versus in-plane diffraction geometry with respect to the side wall angle JF - Proc. SPIE Y1 - 2013 U6 - https://doi.org/10.1117/12.2020487 VL - 8789 SP - 878905 ER - TY - JOUR A1 - Kato, Akiko A1 - Burger, Sven A1 - Scholze, Frank T1 - Analytical modeling and 3D finite element simulation of line edge roughness in scatterometry JF - Appl. Optics Y1 - 2012 U6 - https://doi.org/10.1364/AO.51.006457 VL - 51 SP - 6457 EP - 6464 ER - TY - JOUR A1 - Soltwisch, Victor A1 - Haase, Anton A1 - Wernecke, Jan A1 - Probst, Jürgen A1 - Schoengen, Max A1 - Burger, Sven A1 - Krumrey, Michael A1 - Scholze, Frank T1 - Correlated diffuse x-ray scattering from periodically nanostructured surfaces JF - Phys. Rev. B Y1 - 2016 U6 - https://doi.org/10.1103/PhysRevB.94.035419 VL - 94 SP - 035419 ER - TY - JOUR A1 - Andrle, Anna A1 - Hönicke, Philipp A1 - Schneider, Philipp-Immanuel A1 - Kayser, Yves A1 - Hammerschmidt, Martin A1 - Burger, Sven A1 - Scholze, Frank A1 - Beckhoff, Burkhard A1 - Soltwisch, Victor T1 - Grazing incidence x-ray fluorescence based characterization of nanostructures for element sensitive profile reconstruction JF - Proc. SPIE Y1 - 2019 U6 - https://doi.org/10.1117/12.2526082 VL - 11057 SP - 110570M ER -