TY - JOUR A1 - Farchmin, Nando A1 - Hammerschmidt, Martin A1 - Schneider, Philipp-Immanuel A1 - Wurm, Matthias A1 - Bodermann, Bernd A1 - Bär, Markus A1 - Heidenreich, Sebastian T1 - Efficient Bayesian inversion for shape reconstruction of lithography masks JF - J. Micro/Nanolith. MEMS MOEMS Y1 - 2020 U6 - https://doi.org/10.1117/1.JMM.19.2.024001 VL - 19 SP - 024001 ER - TY - JOUR A1 - Farchmin, Nando A1 - Hammerschmidt, Martin A1 - Schneider, Philipp-Immanuel A1 - Wurm, Matthias A1 - Bär, Markus A1 - Heidenreich, Sebastian T1 - Efficient global sensitivity analysis for silicon line gratings using polynomial chaos JF - Proc. SPIE Y1 - 2019 U6 - https://doi.org/10.1117/12.2525978 VL - 11057 SP - 110570J ER - TY - JOUR A1 - Bodermann, Bernd A1 - Buhr, Egbert A1 - Danzebrink, Hans-Ulrich A1 - Bär, Markus A1 - Scholze, Frank A1 - Krumrey, Michael A1 - Wurm, Matthias A1 - Klapetek, Petr A1 - Hansen, Poul-Erik A1 - Korpelainen, Virpi A1 - van Veghel, Marijn A1 - Yacoot, Andrew A1 - Siitonen, Samuli A1 - El Gawhary, Omar A1 - Burger, Sven A1 - Saastamoinen, Toni T1 - Joint Research on Scatterometry and AFM Wafer Metrology JF - AIP Conference Proceedings Y1 - 2011 U6 - https://doi.org/10.1063/1.3657910 VL - 1395 IS - 1 SP - 319 EP - 323 PB - AIP ER - TY - CHAP A1 - Bodermann, Bernd A1 - Hansen, Poul-Erik A1 - Burger, Sven A1 - Henn, Mark-Alexander A1 - Gross, Hermann A1 - Bär, Markus A1 - Scholze, Frank A1 - Endres, Johannes A1 - Wurm, Matthias T1 - First steps towards a scatterometry reference standard T2 - Proc. SPIE Y1 - 2012 U6 - https://doi.org/10.1117/12.929903 VL - 8466 SP - 84660E ER -