TY - CHAP A1 - Burger, Sven A1 - Zschiedrich, Lin A1 - Pomplun, Jan A1 - Schmidt, Frank T1 - JCMsuite: An Adaptive FEM Solver for Precise Simulations in Nano-Optics T2 - Integrated Photonics and Nanophotonics Research and Applications Y1 - 2008 U6 - https://doi.org/10.1364/IPNRA.2008.ITuE4 SP - ITuE4 PB - Optical Society of America ER - TY - CHAP A1 - Schmidt, Frank A1 - Burger, Sven A1 - Pomplun, Jan A1 - Zschiedrich, Lin ED - Greiner, Christoph ED - Wächter, Christoph T1 - Advanced FEM analysis of optical waveguides: algorithms and applications T2 - Integrated Optics Y1 - 2008 U6 - https://doi.org/10.1117/12.765720 VL - 6896 SP - 689602 PB - SPIE ER - TY - CHAP A1 - Scholze, Frank A1 - Laubis, Christian A1 - Ulm, Gerhard A1 - Dersch, Uwe A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank ED - Schellenberg, Frank T1 - Evaluation of EUV scatterometry for CD characterization of EUV masks using rigorous FEM-simulation T2 - Emerging Lithographic Technologies XII Y1 - 2008 VL - 6921 PB - SPIE ER - TY - CHAP A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank A1 - Scholze, Frank A1 - Laubis, Christian A1 - Dersch, Uwe ED - Horiuchi, Toshiyuki T1 - Metrology of EUV masks by EUV-scatterometry and finite element analysis T2 - Photomask and Next-Generation Lithography Mask Technology XV Y1 - 2008 VL - 7028 PB - SPIE ER - TY - CHAP A1 - Pomplun, Jan A1 - Schmidt, Frank T1 - Reduced Basis Method for Nano Optical Simulations T2 - Integrated Photonics and Nanophotonics Research and Applications Y1 - 2008 SP - IWD7 PB - Optical Society of America ER - TY - CHAP A1 - Burger, Sven A1 - Zschiedrich, Lin A1 - Schmidt, Frank A1 - Evanschitzky, Peter A1 - Erdmann, Andreas ED - Kawahira, H. ED - Zurbrick, L. S. T1 - Benchmark of rigorous methods for electromagnetic field simulation T2 - Photomask Technology Y1 - 2008 UR - http://dx.doi.org/10.1117/12.801248 U6 - https://doi.org/10.1117/12.801248 VL - 7122 SP - 71221 PB - Proc. SPIE ER - TY - CHAP A1 - Zschiedrich, Lin A1 - Burger, Sven A1 - Schädle, Achim A1 - Schmidt, Frank ED - Levinson, Harry ED - Dusa, Mircea T1 - A rigorous finite-element domain decomposition method for electromagnetic near field simulations T2 - Optical Microlithography XXI Y1 - 2008 U6 - https://doi.org/10.1117/12.771989 VL - 6924 PB - SPIE ER - TY - CHAP A1 - Zschiedrich, Lin A1 - Schmidt, Frank ED - Horiuchi, Toshiyuki T1 - Finite element simulation of light propagation in non-periodic mask patterns T2 - Photomask and Next-Generation Lithography Mask Technology XV Y1 - 2008 UR - http://arxiv.org/pdf/0804.2587v1 VL - 7028 PB - SPIE ER -