TY - CHAP A1 - Bodermann, Bernd A1 - Hansen, Poul-Erik A1 - Burger, Sven A1 - Henn, Mark-Alexander A1 - Gross, Hermann A1 - Bär, Markus A1 - Scholze, Frank A1 - Endres, Johannes A1 - Wurm, Matthias T1 - First steps towards a scatterometry reference standard T2 - Proc. SPIE Y1 - 2012 U6 - https://doi.org/10.1117/12.929903 VL - 8466 SP - 84660E ER - TY - CHAP A1 - Scholze, Frank A1 - Bodermann, Bernd A1 - Burger, Sven A1 - Endres, Johannes A1 - Haase, Anton A1 - Krumrey, Michael A1 - Laubis, Christian A1 - Soltwisch, Victor A1 - Ullrich, Albrecht A1 - Wernecke, Jan T1 - Determination of line profiles on photomasks using DUV, EUV and X-ray scattering T2 - Proc. SPIE Y1 - 2014 U6 - https://doi.org/10.1117/12.2065941 VL - 9231 SP - 92310M ER - TY - JOUR A1 - Endres, Johannes A1 - Burger, Sven A1 - Wurm, Matthias A1 - Bodermann, Bernd T1 - Numerical investigations of the influence of different commonly applied approximations in scatterometry JF - Proc. SPIE Y1 - 2013 U6 - https://doi.org/10.1117/12.2022108 VL - 8789 SP - 878904 ER - TY - CHAP A1 - Agcos, Emil A1 - Bodermann, Bernd A1 - Burger, Sven A1 - Dai, Gaoliang A1 - Endres, Johannes A1 - Hansen, Poul-Erik A1 - Nielson, Lars A1 - Madsen, Morten A1 - Heidenreich, Sebastian A1 - Krumrey, Michael A1 - Loechel, Bernd A1 - Probst, Jürgen A1 - Scholze, Frank A1 - Soltwisch, Victor A1 - Wurm, Matthias T1 - Scatterometry reference standards to improve tool matching and traceability in lithographical nanomanufacturing T2 - Proc. SPIE Y1 - 2015 U6 - https://doi.org/10.1117/12.2190409 VL - 9556 SP - 955610 ER -