TY - CHAP A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank A1 - Zschiedrich, Lin A1 - Scholze, Frank ED - Martin, P. ED - Naber, R. T1 - Rigorous FEM-Simulation of EUV-Masks: Influence of shape and material parameters T2 - Photomask Technology Y1 - 2006 U6 - https://doi.org/10.1117/12.686828 VL - 6349 SP - 63493D PB - Proc. SPIE ER - TY - CHAP A1 - Burger, Sven A1 - Zschiedrich, Lin A1 - Schädle, Achim A1 - Klose, Roland A1 - Kettner, Benjamin A1 - Pomplun, Jan A1 - Pollok, T. A1 - Schmidt, Frank T1 - Advanced FEM Analysis of Nano-Optical Devices T2 - Proc. Symposium on Photonics Technologies for the 7th Framework Programme Y1 - 2006 ER - TY - CHAP A1 - Scholze, Frank A1 - Laubis, Christian A1 - Dersch, Uwe A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank ED - Bosse, Harald T1 - The influence of line edge roughness and CD uniformity on EUV scatterometry for CD characterization of EUV masks T2 - Modeling Aspects in Optical Metrology Y1 - 2007 VL - 6617 SP - 66171A PB - Proc. SPIE ER - TY - CHAP A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank A1 - Scholze, Frank A1 - Laubis, Christian A1 - Dersch, Uwe ED - Bosse, Harald T1 - Finite element analysis of EUV lithography T2 - Modeling Aspects in Optical Metrology Y1 - 2007 U6 - https://doi.org/10.1117/12.726156 VL - 6617 SP - 661718 PB - Proc. SPIE ER - TY - CHAP A1 - Pomplun, Jan A1 - Holzlöhner, Ronald A1 - Burger, Sven A1 - Zschiedrich, Lin A1 - Schmidt, Frank ED - Adibi, Ali ED - Scherer, Axel ED - Lin, Shawn-Yu T1 - FEM investigation of leaky modes in hollow core photonic crystal fibers T2 - Proc. SPIE, Photonic Crystal Materials and Devices VI Y1 - 2007 UR - http://arxiv.org/pdf/physics/0702165 VL - 6480 SP - 64800M ER - TY - CHAP A1 - Zschiedrich, Lin A1 - Burger, Sven A1 - Pomplun, Jan A1 - Schmidt, Frank ED - Sidorin, Y. ED - Waechter, Ch. T1 - Goal oriented adaptive finite element method for precise simulation of optical components T2 - Proc. SPIE, Integrated Optics Y1 - 2007 UR - http://arxiv.org/pdf/physics/0702128 VL - 6475 SP - 64750H ER - TY - CHAP A1 - Burger, Sven A1 - Zschiedrich, Lin A1 - Pomplun, Jan A1 - Schmidt, Frank T1 - JCMsuite: An Adaptive FEM Solver for Precise Simulations in Nano-Optics T2 - Integrated Photonics and Nanophotonics Research and Applications Y1 - 2008 U6 - https://doi.org/10.1364/IPNRA.2008.ITuE4 SP - ITuE4 PB - Optical Society of America ER - TY - CHAP A1 - Schmidt, Frank A1 - Burger, Sven A1 - Pomplun, Jan A1 - Zschiedrich, Lin ED - Greiner, Christoph ED - Wächter, Christoph T1 - Advanced FEM analysis of optical waveguides: algorithms and applications T2 - Integrated Optics Y1 - 2008 U6 - https://doi.org/10.1117/12.765720 VL - 6896 SP - 689602 PB - SPIE ER - TY - CHAP A1 - Scholze, Frank A1 - Laubis, Christian A1 - Ulm, Gerhard A1 - Dersch, Uwe A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank ED - Schellenberg, Frank T1 - Evaluation of EUV scatterometry for CD characterization of EUV masks using rigorous FEM-simulation T2 - Emerging Lithographic Technologies XII Y1 - 2008 VL - 6921 PB - SPIE ER - TY - CHAP A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank A1 - Scholze, Frank A1 - Laubis, Christian A1 - Dersch, Uwe ED - Horiuchi, Toshiyuki T1 - Metrology of EUV masks by EUV-scatterometry and finite element analysis T2 - Photomask and Next-Generation Lithography Mask Technology XV Y1 - 2008 VL - 7028 PB - SPIE ER - TY - CHAP A1 - Burger, Sven A1 - Zschiedrich, Lin A1 - Pomplun, Jan A1 - Schmidt, Frank A1 - Kettner, Benjamin A1 - Lockau, D. T1 - 3D Finite-Element Simulations of Enhanced Light Transmission Through Arrays of Holes in Metal Films T2 - Numerical Methods in Optical Metrology Y1 - 2009 U6 - https://doi.org/10.1117/12.827543 VL - 7390 SP - 73900H PB - Proc. SPIE ER - TY - CHAP A1 - Pomplun, Jan A1 - Zschiedrich, Lin A1 - Burger, Sven A1 - Schmidt, Frank T1 - Reduced basis method for computational lithography T2 - Photomask Technology Y1 - 2009 U6 - https://doi.org/10.1117/12.829639 VL - 7488 SP - 74882B PB - Proc. SPIE ER - TY - CHAP A1 - Pomplun, Jan A1 - Zschiedrich, Lin A1 - Burger, Sven A1 - Schmidt, Frank A1 - Tyminski, Jacek A1 - Flagello, Donis A1 - Toshiharu, N. T1 - Reduced basis method for source mask optimization T2 - Photomask Technology Y1 - 2010 U6 - https://doi.org/10.1117/12.866101 VL - 7823 SP - 78230E PB - Proc. SPIE ER - TY - CHAP A1 - Burger, Sven A1 - Zschiedrich, Lin A1 - Pomplun, Jan A1 - Schmidt, Frank T1 - Finite element method for accurate 3D simulation of plasmonic waveguides T2 - Integrated Optics: Devices, Materials, and Technologies XIV Y1 - 2010 U6 - https://doi.org/10.1117/12.841995 VL - 7604 SP - 76040F PB - Proc. SPIE ER - TY - CHAP A1 - Pomplun, Jan A1 - Schmidt, Frank A1 - Burger, Sven A1 - Zschiedrich, Lin T1 - Adaptive Reduced Basis Method for Optical Scattering Problems T2 - Integrated Photonics Research, Silicon and Nanophotonics Y1 - 2010 U6 - https://doi.org/10.1364/IPRSN.2010.IWD4 SP - IWD4 PB - OSA ER - TY - CHAP A1 - Pomplun, Jan A1 - Burger, Sven A1 - Zschiedrich, Lin A1 - Schmidt, Frank T1 - Reduced basis method for real-time inverse scatterometry T2 - Modelling Aspects in Optical Metrology III Y1 - 2011 U6 - https://doi.org/10.1117/12.889892 VL - 8083 SP - 808308 PB - Proc. SPIE ER - TY - CHAP A1 - Burger, Sven A1 - Zschiedrich, Lin A1 - Pomplun, Jan A1 - Schmidt, Frank ED - Bodermann, Bernd T1 - Rigorous simulations of 3D patterns on extreme ultraviolet lithography masks T2 - Modelling Aspects in Optical Metrology III Y1 - 2011 U6 - https://doi.org/10.1117/12.889831 VL - 8083 SP - 80831B PB - Proc. SPIE ER - TY - CHAP A1 - Burger, Sven A1 - Zschiedrich, Lin A1 - Pomplun, Jan A1 - Schmidt, Frank A1 - Kato, Akiko A1 - Laubis, Christian A1 - Scholze, Frank T1 - Investigation of 3D Patterns on EUV Masks by Means of Scatterometry and Comparison to Numerical Simulations T2 - Photomask Technology 2011 Y1 - 2011 U6 - https://doi.org/10.1117/12.896839 VL - 8166 SP - 81661Q PB - Proc. SPIE ER - TY - CHAP A1 - Burger, Sven A1 - Pomplun, Jan A1 - Schmidt, Frank A1 - Zschiedrich, Lin T1 - Finite-element method simulations of high-Q nanocavities with 1D photonic bandgap T2 - Physics and Simulation of Optoelectronic Devices XIX Y1 - 2011 U6 - https://doi.org/10.1117/12.875044 VL - 7933 SP - 79330T PB - Proc. SPIE ER - TY - CHAP A1 - Kleemann, B. A1 - Kurz, J. A1 - Hetzler, J. A1 - Pomplun, Jan A1 - Burger, Sven A1 - Zschiedrich, Lin A1 - Schmidt, Frank T1 - Fast online inverse scattering with Reduced Basis Method (RBM) for a 3D phase grating with specific line roughness T2 - Modelling Aspects in Optical Metrology III Y1 - 2011 U6 - https://doi.org/10.1117/12.889364 VL - 8083 SP - 808309 PB - Proc. SPIE ER -