TY - JOUR A1 - Bodermann, Bernd A1 - Buhr, Egbert A1 - Danzebrink, Hans-Ulrich A1 - Bär, Markus A1 - Scholze, Frank A1 - Krumrey, Michael A1 - Wurm, Matthias A1 - Klapetek, Petr A1 - Hansen, Poul-Erik A1 - Korpelainen, Virpi A1 - van Veghel, Marijn A1 - Yacoot, Andrew A1 - Siitonen, Samuli A1 - El Gawhary, Omar A1 - Burger, Sven A1 - Saastamoinen, Toni T1 - Joint Research on Scatterometry and AFM Wafer Metrology JF - AIP Conference Proceedings Y1 - 2011 U6 - https://doi.org/10.1063/1.3657910 VL - 1395 IS - 1 SP - 319 EP - 323 PB - AIP ER - TY - CHAP A1 - Bodermann, Bernd A1 - Hansen, Poul-Erik A1 - Burger, Sven A1 - Henn, Mark-Alexander A1 - Gross, Hermann A1 - Bär, Markus A1 - Scholze, Frank A1 - Endres, Johannes A1 - Wurm, Matthias T1 - First steps towards a scatterometry reference standard T2 - Proc. SPIE Y1 - 2012 U6 - https://doi.org/10.1117/12.929903 VL - 8466 SP - 84660E ER - TY - JOUR A1 - Burger, Sven A1 - Zschiedrich, Lin A1 - Pomplun, Jan A1 - Schmidt, Frank A1 - Bodermann, Bernd T1 - Fast simulation method for parameter reconstruction in optical metrology JF - Proc. SPIE Y1 - 2013 U6 - https://doi.org/10.1117/12.2011154 VL - 8681 SP - 868119 ER - TY - CHAP A1 - Scholze, Frank A1 - Bodermann, Bernd A1 - Burger, Sven A1 - Endres, Johannes A1 - Haase, Anton A1 - Krumrey, Michael A1 - Laubis, Christian A1 - Soltwisch, Victor A1 - Ullrich, Albrecht A1 - Wernecke, Jan T1 - Determination of line profiles on photomasks using DUV, EUV and X-ray scattering T2 - Proc. SPIE Y1 - 2014 U6 - https://doi.org/10.1117/12.2065941 VL - 9231 SP - 92310M ER - TY - JOUR A1 - Hammerschmidt, Martin A1 - Weiser, Martin A1 - Santiago, Xavier Garcia A1 - Zschiedrich, Lin A1 - Bodermann, Bernd A1 - Burger, Sven T1 - Quantifying parameter uncertainties in optical scatterometry using Bayesian inversion JF - Proc. SPIE Y1 - 2017 U6 - https://doi.org/10.1117/12.2270596 VL - 10330 SP - 1033004 ER - TY - JOUR A1 - Endres, Johannes A1 - Burger, Sven A1 - Wurm, Matthias A1 - Bodermann, Bernd T1 - Numerical investigations of the influence of different commonly applied approximations in scatterometry JF - Proc. SPIE Y1 - 2013 U6 - https://doi.org/10.1117/12.2022108 VL - 8789 SP - 878904 ER - TY - CHAP A1 - Agcos, Emil A1 - Bodermann, Bernd A1 - Burger, Sven A1 - Dai, Gaoliang A1 - Endres, Johannes A1 - Hansen, Poul-Erik A1 - Nielson, Lars A1 - Madsen, Morten A1 - Heidenreich, Sebastian A1 - Krumrey, Michael A1 - Loechel, Bernd A1 - Probst, Jürgen A1 - Scholze, Frank A1 - Soltwisch, Victor A1 - Wurm, Matthias T1 - Scatterometry reference standards to improve tool matching and traceability in lithographical nanomanufacturing T2 - Proc. SPIE Y1 - 2015 U6 - https://doi.org/10.1117/12.2190409 VL - 9556 SP - 955610 ER - TY - JOUR A1 - Siefke, Thomas A1 - Hurtado, Carol A1 - Dickmann, Johannes A1 - Dickmann, Walter A1 - Käseberg, Tim A1 - Meyer, Jan A1 - Burger, Sven A1 - Zeitner, Uwe A1 - Bodermann, Bernd A1 - Kroker, Stefanie T1 - Quasi-bound states in the continuum for deep subwavelength structural information retrieval for DUV nano-optical polarizers JF - Opt. Express Y1 - 2020 U6 - https://doi.org/10.1364/OE.396044 VL - 28 SP - 23122 ER - TY - JOUR A1 - Farchmin, Nando A1 - Hammerschmidt, Martin A1 - Schneider, Philipp-Immanuel A1 - Wurm, Matthias A1 - Bodermann, Bernd A1 - Bär, Markus A1 - Heidenreich, Sebastian T1 - Efficient Bayesian inversion for shape reconstruction of lithography masks JF - J. Micro/Nanolith. MEMS MOEMS Y1 - 2020 U6 - https://doi.org/10.1117/1.JMM.19.2.024001 VL - 19 SP - 024001 ER - TY - GEN A1 - Hammerschmidt, Martin A1 - Weiser, Martin A1 - Santiago, Xavier Garcia A1 - Zschiedrich, Lin A1 - Bodermann, Bernd A1 - Burger, Sven T1 - Quantifying parameter uncertainties in optical scatterometry using Bayesian inversion N2 - We present a Newton-like method to solve inverse problems and to quantify parameter uncertainties. We apply the method to parameter reconstruction in optical scatterometry, where we take into account a priori information and measurement uncertainties using a Bayesian approach. Further, we discuss the influence of numerical accuracy on the reconstruction result. T3 - ZIB-Report - 17-37 KW - computational metrology KW - optical metrology KW - computational lithography KW - nanolithography KW - finite- element methods KW - nanooptics Y1 - 2017 U6 - http://nbn-resolving.de/urn/resolver.pl?urn:nbn:de:0297-zib-64704 SN - 1438-0064 ER - TY - JOUR A1 - Schneider, Philipp-Immanuel A1 - Manley, Phillip A1 - Krüger, Jan A1 - Zschiedrich, Lin A1 - Köning, Rainer A1 - Bodermann, Bernd A1 - Burger, Sven T1 - Reconstructing phase aberrations for high-precision dimensional microscopy JF - Proc. SPIE Y1 - 2022 U6 - https://doi.org/10.1117/12.2620762 VL - 12137 SP - 121370I ER - TY - CHAP A1 - Krüger, Jan A1 - Manley, Phillip A1 - Zschiedrich, Lin A1 - Hammerschmidt, Martin A1 - Schneider, Philipp-Immanuel A1 - Köning, Rainer A1 - Bodermann, Bernd T1 - Untersuchung des Schwingungseinflusses auf gemessene Punktspreizfunktionen in der optischen Mikroskopie T2 - Proc. DGaO Y1 - 2022 U6 - http://nbn-resolving.de/urn/resolver.pl?urn:nbn:de:0287-2022-P005-6 SP - P5 ER - TY - CHAP A1 - Manley, Phillip A1 - Krüger, Jan A1 - Zschiedrich, Lin A1 - Hammerschmidt, Martin A1 - Bodermann, Bernd A1 - Köning, Rainer A1 - Schneider, Philipp-Immanuel T1 - Elementary, my dear Zernike: model order reduction for accelerating optical dimensional microscopy T2 - EPJ Web Conf. Y1 - 2022 U6 - https://doi.org/10.1051/epjconf/202226610010 VL - 266 SP - 10010 ER - TY - CHAP A1 - Manley, Phillip A1 - Krüger, Jan A1 - Bodermann, Bernd A1 - Köning, Rainer A1 - Heinrich, Andreas A1 - Eder, Christian A1 - Goehnermeier, Aksel A1 - Zeiser, Ulrike A1 - Hammerschmidt, Martin A1 - Zschiedrich, Lin A1 - Schneider, Philipp-Immanuel T1 - Efficient simulation of microscopic imaging for reconstruction of nanostructures T2 - Proc. SPIE Y1 - 2023 U6 - https://doi.org/10.1117/12.2673077 VL - PC12619 SP - PC126190B ER - TY - CHAP A1 - Krüger, Jan A1 - Bodermann, Bernd A1 - Köning, Rainer A1 - Manley, Phillip A1 - Zschiedrich, Lin A1 - Schneider, Philipp-Immanuel A1 - Heinrich, Andreas A1 - Eder, Christian A1 - Zeiser, Ulrike A1 - Goehnermeier, Aksel T1 - On aberration retrieval for optical microscopes in length metrology T2 - Proc. SPIE Y1 - 2023 U6 - https://doi.org/10.1117/12.2672294 VL - PC12619 SP - PC126190A ER -