TY - JOUR A1 - Farchmin, Nando A1 - Hammerschmidt, Martin A1 - Schneider, Philipp-Immanuel A1 - Wurm, Matthias A1 - Bodermann, Bernd A1 - Bär, Markus A1 - Heidenreich, Sebastian T1 - Efficient Bayesian inversion for shape reconstruction of lithography masks JF - J. Micro/Nanolith. MEMS MOEMS Y1 - 2020 U6 - https://doi.org/10.1117/1.JMM.19.2.024001 VL - 19 SP - 024001 ER -