<?xml version="1.0" encoding="utf-8"?>
<export-example>
  <doc>
    <id>2323</id>
    <completedYear>2008</completedYear>
    <publishedYear>2008</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume>6921</volume>
    <type>conferenceobject</type>
    <publisherName>SPIE</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Evaluation of EUV scatterometry for CD characterization of EUV masks using rigorous FEM-simulation</title>
    <parentTitle language="eng">Emerging Lithographic Technologies XII</parentTitle>
    <author>Frank Scholze</author>
    <editor>Frank Schellenberg</editor>
    <author>Christian Laubis</author>
    <author>Gerhard Ulm</author>
    <author>Uwe Dersch</author>
    <author>Jan Pomplun</author>
    <author>Sven Burger</author>
    <author>Frank Schmidt</author>
    <collection role="institutes" number="num">Numerical Mathematics</collection>
    <collection role="institutes" number="compnano">Computational Nano Optics</collection>
    <collection role="persons" number="burger">Burger, Sven</collection>
  </doc>
  <doc>
    <id>2324</id>
    <completedYear>2008</completedYear>
    <publishedYear>2008</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume>7028</volume>
    <type>conferenceobject</type>
    <publisherName>SPIE</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Metrology of EUV masks by EUV-scatterometry and finite element analysis</title>
    <parentTitle language="eng">Photomask and Next-Generation Lithography Mask Technology XV</parentTitle>
    <author>Jan Pomplun</author>
    <editor>Toshiyuki Horiuchi</editor>
    <author>Sven Burger</author>
    <author>Frank Schmidt</author>
    <author>Frank Scholze</author>
    <author>Christian Laubis</author>
    <author>Uwe Dersch</author>
    <collection role="institutes" number="num">Numerical Mathematics</collection>
    <collection role="institutes" number="compnano">Computational Nano Optics</collection>
    <collection role="persons" number="burger">Burger, Sven</collection>
  </doc>
  <doc>
    <id>2325</id>
    <completedYear>2006</completedYear>
    <publishedYear>2006</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>63493D</pageFirst>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume>6349</volume>
    <type>conferenceobject</type>
    <publisherName>Proc. SPIE</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Rigorous FEM-Simulation of EUV-Masks: Influence of shape and material parameters</title>
    <parentTitle language="eng">Photomask Technology</parentTitle>
    <identifier type="doi">10.1117/12.686828</identifier>
    <enrichment key="PeerReviewed">yes</enrichment>
    <author>Jan Pomplun</author>
    <editor>P. Martin</editor>
    <author>Sven Burger</author>
    <editor>R. Naber</editor>
    <author>Frank Schmidt</author>
    <author>Lin Zschiedrich</author>
    <author>Frank Scholze</author>
    <collection role="institutes" number="num">Numerical Mathematics</collection>
    <collection role="institutes" number="compnano">Computational Nano Optics</collection>
    <collection role="persons" number="burger">Burger, Sven</collection>
    <collection role="persons" number="zschiedrich">Zschiedrich, Lin Werner</collection>
  </doc>
  <doc>
    <id>2326</id>
    <completedYear>2007</completedYear>
    <publishedYear>2007</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>661718</pageFirst>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume>6617</volume>
    <type>conferenceobject</type>
    <publisherName>Proc. SPIE</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Finite element analysis of EUV lithography</title>
    <parentTitle language="eng">Modeling Aspects in Optical Metrology</parentTitle>
    <identifier type="doi">10.1117/12.726156</identifier>
    <author>Jan Pomplun</author>
    <editor>Harald Bosse</editor>
    <author>Sven Burger</author>
    <author>Frank Schmidt</author>
    <author>Frank Scholze</author>
    <author>Christian Laubis</author>
    <author>Uwe Dersch</author>
    <collection role="institutes" number="num">Numerical Mathematics</collection>
    <collection role="institutes" number="compnano">Computational Nano Optics</collection>
    <collection role="persons" number="burger">Burger, Sven</collection>
  </doc>
  <doc>
    <id>2384</id>
    <completedYear>2007</completedYear>
    <publishedYear>2007</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>66171A</pageFirst>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume>6617</volume>
    <type>conferenceobject</type>
    <publisherName>Proc. SPIE</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">The influence of line edge roughness and CD uniformity on EUV scatterometry for CD characterization of EUV masks</title>
    <parentTitle language="eng">Modeling Aspects in Optical Metrology</parentTitle>
    <author>Frank Scholze</author>
    <editor>Harald Bosse</editor>
    <author>Christian Laubis</author>
    <author>Uwe Dersch</author>
    <author>Jan Pomplun</author>
    <author>Sven Burger</author>
    <author>Frank Schmidt</author>
    <collection role="institutes" number="num">Numerical Mathematics</collection>
    <collection role="institutes" number="compnano">Computational Nano Optics</collection>
    <collection role="persons" number="burger">Burger, Sven</collection>
  </doc>
  <doc>
    <id>1992</id>
    <completedYear>2011</completedYear>
    <publishedYear>2011</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>81661Q</pageFirst>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume>8166</volume>
    <type>conferenceobject</type>
    <publisherName>Proc. SPIE</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Investigation of 3D Patterns on EUV Masks by Means of Scatterometry and Comparison to Numerical Simulations</title>
    <parentTitle language="eng">Photomask Technology 2011</parentTitle>
    <identifier type="doi">10.1117/12.896839</identifier>
    <enrichment key="PeerReviewed">yes</enrichment>
    <author>Sven Burger</author>
    <author>Lin Zschiedrich</author>
    <author>Jan Pomplun</author>
    <author>Frank Schmidt</author>
    <author>Akiko Kato</author>
    <author>Christian Laubis</author>
    <author>Frank Scholze</author>
    <collection role="institutes" number="num">Numerical Mathematics</collection>
    <collection role="institutes" number="compnano">Computational Nano Optics</collection>
    <collection role="persons" number="burger">Burger, Sven</collection>
    <collection role="persons" number="zschiedrich">Zschiedrich, Lin Werner</collection>
  </doc>
</export-example>
