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  <doc>
    <id>6470</id>
    <completedYear/>
    <publishedYear/>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>reportzib</type>
    <publisherName/>
    <publisherPlace/>
    <creatingCorporation/>
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    <completedDate>--</completedDate>
    <publishedDate>2017-07-25</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Quantifying parameter uncertainties in optical scatterometry using Bayesian inversion</title>
    <abstract language="eng">We present a Newton-like method to solve inverse problems and to quantify parameter uncertainties. We apply the method to parameter reconstruction in optical scatterometry, where we take into account a priori information and measurement uncertainties using a Bayesian approach. Further, we discuss the influence of numerical accuracy on the reconstruction result.</abstract>
    <identifier type="issn">1438-0064</identifier>
    <identifier type="urn">urn:nbn:de:0297-zib-64704</identifier>
    <enrichment key="SourceTitle">Appeared in: Proc. SPIE 10330, Modeling Aspects in Optical Metrology, (2017)</enrichment>
    <author>Martin Hammerschmidt</author>
    <submitter>Martin Hammerschmidt</submitter>
    <author>Martin Weiser</author>
    <author>Xavier Garcia Santiago</author>
    <author>Lin Zschiedrich</author>
    <author>Bernd Bodermann</author>
    <author>Sven Burger</author>
    <series>
      <title>ZIB-Report</title>
      <number>17-37</number>
    </series>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>computational metrology</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>optical metrology</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>computational lithography</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>nanolithography</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>finite- element methods</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>nanooptics</value>
    </subject>
    <collection role="ccs" number="J.">Computer Applications</collection>
    <collection role="pacs" number="40.00.00">ELECTROMAGNETISM, OPTICS, ACOUSTICS, HEAT TRANSFER, CLASSICAL MECHANICS, AND FLUID DYNAMICS</collection>
    <collection role="msc" number="78-XX">OPTICS, ELECTROMAGNETIC THEORY (For quantum optics, see 81V80)</collection>
    <collection role="institutes" number="num">Numerical Mathematics</collection>
    <collection role="persons" number="burger">Burger, Sven</collection>
    <collection role="persons" number="hammerschmidt">Hammerschmidt, Martin</collection>
    <collection role="persons" number="weiser">Weiser, Martin</collection>
    <collection role="persons" number="zschiedrich">Zschiedrich, Lin Werner</collection>
    <collection role="projects" number="NOLOSS-1">NOLOSS-1</collection>
    <file>https://opus4.kobv.de/opus4-zib/files/6470/ZR-17-37.pdf</file>
  </doc>
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