@article{FarchminHammerschmidtSchneideretal.2020, author = {Farchmin, Nando and Hammerschmidt, Martin and Schneider, Philipp-Immanuel and Wurm, Matthias and Bodermann, Bernd and B{\"a}r, Markus and Heidenreich, Sebastian}, title = {Efficient Bayesian inversion for shape reconstruction of lithography masks}, volume = {19}, journal = {J. Micro/Nanolith. MEMS MOEMS}, doi = {10.1117/1.JMM.19.2.024001}, pages = {024001}, year = {2020}, language = {en} } @article{FarchminHammerschmidtSchneideretal.2019, author = {Farchmin, Nando and Hammerschmidt, Martin and Schneider, Philipp-Immanuel and Wurm, Matthias and B{\"a}r, Markus and Heidenreich, Sebastian}, title = {Efficient global sensitivity analysis for silicon line gratings using polynomial chaos}, volume = {11057}, journal = {Proc. SPIE}, doi = {10.1117/12.2525978}, pages = {110570J}, year = {2019}, language = {en} } @inproceedings{AgcosBodermannBurgeretal.2015, author = {Agcos, Emil and Bodermann, Bernd and Burger, Sven and Dai, Gaoliang and Endres, Johannes and Hansen, Poul-Erik and Nielson, Lars and Madsen, Morten and Heidenreich, Sebastian and Krumrey, Michael and Loechel, Bernd and Probst, J{\"u}rgen and Scholze, Frank and Soltwisch, Victor and Wurm, Matthias}, title = {Scatterometry reference standards to improve tool matching and traceability in lithographical nanomanufacturing}, volume = {9556}, booktitle = {Proc. SPIE}, doi = {10.1117/12.2190409}, pages = {955610}, year = {2015}, language = {en} }