@inproceedings{ScholzeLaubisDerschetal.2007, author = {Scholze, Frank and Laubis, Christian and Dersch, Uwe and Pomplun, Jan and Burger, Sven and Schmidt, Frank}, title = {The influence of line edge roughness and CD uniformity on EUV scatterometry for CD characterization of EUV masks}, series = {Modeling Aspects in Optical Metrology}, volume = {6617}, booktitle = {Modeling Aspects in Optical Metrology}, editor = {Bosse, Harald}, publisher = {Proc. SPIE}, pages = {66171A}, year = {2007}, language = {en} } @inproceedings{ScholzeLaubisUlmetal.2008, author = {Scholze, Frank and Laubis, Christian and Ulm, Gerhard and Dersch, Uwe and Pomplun, Jan and Burger, Sven and Schmidt, Frank}, title = {Evaluation of EUV scatterometry for CD characterization of EUV masks using rigorous FEM-simulation}, series = {Emerging Lithographic Technologies XII}, volume = {6921}, booktitle = {Emerging Lithographic Technologies XII}, editor = {Schellenberg, Frank}, publisher = {SPIE}, year = {2008}, language = {en} } @inproceedings{PomplunBurgerSchmidtetal.2008, author = {Pomplun, Jan and Burger, Sven and Schmidt, Frank and Scholze, Frank and Laubis, Christian and Dersch, Uwe}, title = {Metrology of EUV masks by EUV-scatterometry and finite element analysis}, series = {Photomask and Next-Generation Lithography Mask Technology XV}, volume = {7028}, booktitle = {Photomask and Next-Generation Lithography Mask Technology XV}, editor = {Horiuchi, Toshiyuki}, publisher = {SPIE}, year = {2008}, language = {en} } @inproceedings{PomplunBurgerSchmidtetal.2006, author = {Pomplun, Jan and Burger, Sven and Schmidt, Frank and Zschiedrich, Lin and Scholze, Frank}, title = {Rigorous FEM-Simulation of EUV-Masks: Influence of shape and material parameters}, series = {Photomask Technology}, volume = {6349}, booktitle = {Photomask Technology}, editor = {Martin, P. and Naber, R.}, publisher = {Proc. SPIE}, doi = {10.1117/12.686828}, pages = {63493D}, year = {2006}, language = {en} } @inproceedings{PomplunBurgerSchmidtetal.2007, author = {Pomplun, Jan and Burger, Sven and Schmidt, Frank and Scholze, Frank and Laubis, Christian and Dersch, Uwe}, title = {Finite element analysis of EUV lithography}, series = {Modeling Aspects in Optical Metrology}, volume = {6617}, booktitle = {Modeling Aspects in Optical Metrology}, editor = {Bosse, Harald}, publisher = {Proc. SPIE}, doi = {10.1117/12.726156}, pages = {661718}, year = {2007}, language = {en} } @inproceedings{BurgerZschiedrichPomplunetal.2011, author = {Burger, Sven and Zschiedrich, Lin and Pomplun, Jan and Schmidt, Frank and Kato, Akiko and Laubis, Christian and Scholze, Frank}, title = {Investigation of 3D Patterns on EUV Masks by Means of Scatterometry and Comparison to Numerical Simulations}, series = {Photomask Technology 2011}, volume = {8166}, booktitle = {Photomask Technology 2011}, publisher = {Proc. SPIE}, doi = {10.1117/12.896839}, pages = {81661Q}, year = {2011}, language = {en} } @article{BodermannBuhrDanzebrinketal.2011, author = {Bodermann, Bernd and Buhr, Egbert and Danzebrink, Hans-Ulrich and B{\"a}r, Markus and Scholze, Frank and Krumrey, Michael and Wurm, Matthias and Klapetek, Petr and Hansen, Poul-Erik and Korpelainen, Virpi and van Veghel, Marijn and Yacoot, Andrew and Siitonen, Samuli and El Gawhary, Omar and Burger, Sven and Saastamoinen, Toni}, title = {Joint Research on Scatterometry and AFM Wafer Metrology}, series = {AIP Conference Proceedings}, volume = {1395}, journal = {AIP Conference Proceedings}, number = {1}, publisher = {AIP}, doi = {10.1063/1.3657910}, pages = {319 -- 323}, year = {2011}, language = {en} } @inproceedings{BodermannHansenBurgeretal.2012, author = {Bodermann, Bernd and Hansen, Poul-Erik and Burger, Sven and Henn, Mark-Alexander and Gross, Hermann and B{\"a}r, Markus and Scholze, Frank and Endres, Johannes and Wurm, Matthias}, title = {First steps towards a scatterometry reference standard}, series = {Proc. SPIE}, volume = {8466}, booktitle = {Proc. SPIE}, doi = {10.1117/12.929903}, pages = {84660E}, year = {2012}, language = {en} } @article{KatoBurgerScholze2012, author = {Kato, Akiko and Burger, Sven and Scholze, Frank}, title = {Analytical modeling and 3D finite element simulation of line edge roughness in scatterometry}, series = {Appl. Optics}, volume = {51}, journal = {Appl. Optics}, doi = {10.1364/AO.51.006457}, pages = {6457 -- 6464}, year = {2012}, language = {en} } @inproceedings{ScholzeBodermannBurgeretal., author = {Scholze, Frank and Bodermann, Bernd and Burger, Sven and Endres, Johannes and Haase, Anton and Krumrey, Michael and Laubis, Christian and Soltwisch, Victor and Ullrich, Albrecht and Wernecke, Jan}, title = {Determination of line profiles on photomasks using DUV, EUV and X-ray scattering}, series = {Proc. SPIE}, volume = {9231}, booktitle = {Proc. SPIE}, doi = {10.1117/12.2065941}, pages = {92310M}, language = {en} }