@article{GschreyThomaSchnauberetal.2015, author = {Gschrey, Manuel and Thoma, Alexander and Schnauber, Peter and Seifried, Marc and Schmidt, Ronny and Wohlfeil, Benjamin and Kr{\"u}ger, Luzy and Schulze, Jan-Hindrick and Heindel, Tobias and Burger, Sven and Schmidt, Frank and Strittmatter, Andre and Rodt, Sven and Reitzenstein, Stephan}, title = {Highly indistinguishable photons from deterministic quantum-dot microlenses utilizing three-dimensional in situ electron-beam lithography}, volume = {6}, journal = {Nature Communications}, doi = {10.1038/ncomms8662}, pages = {7662}, year = {2015}, language = {en} } @inproceedings{ThomaSchnauberGschreyetal.2015, author = {Thoma, Alexander and Schnauber, Peter and Gschrey, Manuel and Schmidt, Ronny and Wohlfeil, Benjamin and Seifried, Marc and Schulze, Jan-Hindrick and Burger, Sven and Schmidt, Frank and Strittmatter, Andre and Rodt, Sven and Heindel, Tobias and Reitzenstein, Stephan}, title = {Indistinguishable Photons from Deterministically Fabricated Quantum Dot Microlenses}, booktitle = {Advanced Photonics}, doi = {10.1364/IPRSN.2015.IS4A.6}, pages = {IS4A.6}, year = {2015}, language = {en} } @inproceedings{GschreySeifriedKruegeretal.2014, author = {Gschrey, Manuel and Seifried, Marc and Kr{\"u}ger, Luzy and Schmidt, Ronny and Schulze, Jan-Hindrick and Heindel, Tobias and Burger, Sven and Rodt, Sven and Schmidt, Frank and Strittmatter, Andre and Reitzenstein, Stephan}, title = {Advanced Quantum Light Sources: Modelling and Realization by Deterministic Nanofabrication Technologies}, volume = {IPRSN}, booktitle = {Integrated Photonics Research, Silicon and Nanophotonics}, doi = {10.1364/IPRSN.2014.IW1A.3}, pages = {IW1A.3}, year = {2014}, language = {en} } @inproceedings{GschreySeifriedKruegeretal.2014, author = {Gschrey, Manuel and Seifried, Marc and Kr{\"u}ger, Luzy and Schmidt, Ronny and Schulze, Jan-Hindrick and Heindel, Tobias and Burger, Sven and Rodt, Sven and Schmidt, Frank and Strittmatter, Andre and Reitzenstein, Stephan}, title = {Boosting the photon-extraction efficiency of nanophotonic structures by deterministic microlenses}, booktitle = {CLEO: 2014}, publisher = {Optical Society of America}, doi = {10.1364/CLEO_QELS.2014.FF2K.2}, pages = {FF2K.2}, year = {2014}, language = {en} } @misc{AmiranashviliBandelowBlomeetal.2014, author = {Amiranashvili, Shalva and Bandelow, Uwe and Blome, Mark and Burger, Sven and Schmidt, Frank and Schmidt, Kersten and Zschiedrich, Lin}, title = {Nanophotonics and nonlinear fiber optics}, volume = {1}, journal = {MATHEON-Mathematics for Key Technologies}, editor = {Deuflhard, Peter and et al.,}, publisher = {European Mathematical Society}, doi = {10.4171/137}, pages = {257 -- 275}, year = {2014}, language = {en} } @inproceedings{ThomaSchnauberGschreyetal.2015, author = {Thoma, Alexander and Schnauber, Peter and Gschrey, Manuel and Schmidt, Ronny and Wohlfeil, Benjamin and Seifried, Marc and Schulze, Jan-Hindrick and Burger, Sven and Schmidt, Frank and Strittmatter, Andre and Rodt, Sven and Heindel, Tobias and Reitzenstein, Stephan}, title = {Indistinguishable Photons from Deterministic Quantum Dot Microlenses}, booktitle = {European Conference on Lasers and Electro-Optics - European Quantum Electronics Conference}, doi = {10.1364/IPRSN.2015.IS4A.6}, pages = {EA_8_5}, year = {2015}, language = {en} } @inproceedings{ScholzeLaubisUlmetal.2008, author = {Scholze, Frank and Laubis, Christian and Ulm, Gerhard and Dersch, Uwe and Pomplun, Jan and Burger, Sven and Schmidt, Frank}, title = {Evaluation of EUV scatterometry for CD characterization of EUV masks using rigorous FEM-simulation}, volume = {6921}, booktitle = {Emerging Lithographic Technologies XII}, editor = {Schellenberg, Frank}, publisher = {SPIE}, year = {2008}, language = {en} } @inproceedings{PomplunBurgerSchmidtetal.2008, author = {Pomplun, Jan and Burger, Sven and Schmidt, Frank and Scholze, Frank and Laubis, Christian and Dersch, Uwe}, title = {Metrology of EUV masks by EUV-scatterometry and finite element analysis}, volume = {7028}, booktitle = {Photomask and Next-Generation Lithography Mask Technology XV}, editor = {Horiuchi, Toshiyuki}, publisher = {SPIE}, year = {2008}, language = {en} } @inproceedings{PomplunBurgerSchmidtetal.2006, author = {Pomplun, Jan and Burger, Sven and Schmidt, Frank and Zschiedrich, Lin and Scholze, Frank}, title = {Rigorous FEM-Simulation of EUV-Masks: Influence of shape and material parameters}, volume = {6349}, booktitle = {Photomask Technology}, editor = {Martin, P. and Naber, R.}, publisher = {Proc. SPIE}, doi = {10.1117/12.686828}, pages = {63493D}, year = {2006}, language = {en} } @inproceedings{PomplunBurgerSchmidtetal.2007, author = {Pomplun, Jan and Burger, Sven and Schmidt, Frank and Scholze, Frank and Laubis, Christian and Dersch, Uwe}, title = {Finite element analysis of EUV lithography}, volume = {6617}, booktitle = {Modeling Aspects in Optical Metrology}, editor = {Bosse, Harald}, publisher = {Proc. SPIE}, doi = {10.1117/12.726156}, pages = {661718}, year = {2007}, language = {en} } @inproceedings{ScholzeLaubisDerschetal.2007, author = {Scholze, Frank and Laubis, Christian and Dersch, Uwe and Pomplun, Jan and Burger, Sven and Schmidt, Frank}, title = {The influence of line edge roughness and CD uniformity on EUV scatterometry for CD characterization of EUV masks}, volume = {6617}, booktitle = {Modeling Aspects in Optical Metrology}, editor = {Bosse, Harald}, publisher = {Proc. SPIE}, pages = {66171A}, year = {2007}, language = {en} } @inproceedings{BurgerZschiedrichPomplunetal.2011, author = {Burger, Sven and Zschiedrich, Lin and Pomplun, Jan and Schmidt, Frank and Kato, Akiko and Laubis, Christian and Scholze, Frank}, title = {Investigation of 3D Patterns on EUV Masks by Means of Scatterometry and Comparison to Numerical Simulations}, volume = {8166}, booktitle = {Photomask Technology 2011}, publisher = {Proc. SPIE}, doi = {10.1117/12.896839}, pages = {81661Q}, year = {2011}, language = {en} } @misc{SchaedleZschiedrichBurgeretal.2006, author = {Sch{\"a}dle, Achim and Zschiedrich, Lin and Burger, Sven and Klose, Roland and Schmidt, Frank}, title = {Domain Decomposition Method for Maxwell's Equations: Scattering off Periodic Structures}, doi = {/10.1016/j.jcp.2007.04.017}, url = {http://nbn-resolving.de/urn:nbn:de:0297-zib-8984}, number = {06-04}, year = {2006}, abstract = {We present a domain decomposition approach for the computation of the electromagnetic field within periodic structures. We use a Schwarz method with transparent boundary conditions at the interfaces of the domains. Transparent boundary conditions are approximated by the perfectly matched layer method (PML). To cope with Wood anomalies appearing in periodic structures an adaptive strategy to determine optimal PML parameters is developed. We focus on the application to typical EUV lithography line masks. Light propagation within the multi-layer stack of the EUV mask is treated analytically. This results in a drastic reduction of the computational costs and allows for the simulation of next generation lithography masks on a standard personal computer.}, language = {en} }