@inproceedings{ScholzeLaubisDerschetal.2007, author = {Scholze, Frank and Laubis, Christian and Dersch, Uwe and Pomplun, Jan and Burger, Sven and Schmidt, Frank}, title = {The influence of line edge roughness and CD uniformity on EUV scatterometry for CD characterization of EUV masks}, series = {Modeling Aspects in Optical Metrology}, volume = {6617}, booktitle = {Modeling Aspects in Optical Metrology}, editor = {Bosse, Harald}, publisher = {Proc. SPIE}, pages = {66171A}, year = {2007}, language = {en} } @inproceedings{ScholzeLaubisUlmetal.2008, author = {Scholze, Frank and Laubis, Christian and Ulm, Gerhard and Dersch, Uwe and Pomplun, Jan and Burger, Sven and Schmidt, Frank}, title = {Evaluation of EUV scatterometry for CD characterization of EUV masks using rigorous FEM-simulation}, series = {Emerging Lithographic Technologies XII}, volume = {6921}, booktitle = {Emerging Lithographic Technologies XII}, editor = {Schellenberg, Frank}, publisher = {SPIE}, year = {2008}, language = {en} } @inproceedings{PomplunBurgerSchmidtetal.2008, author = {Pomplun, Jan and Burger, Sven and Schmidt, Frank and Scholze, Frank and Laubis, Christian and Dersch, Uwe}, title = {Metrology of EUV masks by EUV-scatterometry and finite element analysis}, series = {Photomask and Next-Generation Lithography Mask Technology XV}, volume = {7028}, booktitle = {Photomask and Next-Generation Lithography Mask Technology XV}, editor = {Horiuchi, Toshiyuki}, publisher = {SPIE}, year = {2008}, language = {en} } @inproceedings{PomplunBurgerSchmidtetal.2007, author = {Pomplun, Jan and Burger, Sven and Schmidt, Frank and Scholze, Frank and Laubis, Christian and Dersch, Uwe}, title = {Finite element analysis of EUV lithography}, series = {Modeling Aspects in Optical Metrology}, volume = {6617}, booktitle = {Modeling Aspects in Optical Metrology}, editor = {Bosse, Harald}, publisher = {Proc. SPIE}, doi = {10.1117/12.726156}, pages = {661718}, year = {2007}, language = {en} } @inproceedings{BurgerZschiedrichPomplunetal.2011, author = {Burger, Sven and Zschiedrich, Lin and Pomplun, Jan and Schmidt, Frank and Kato, Akiko and Laubis, Christian and Scholze, Frank}, title = {Investigation of 3D Patterns on EUV Masks by Means of Scatterometry and Comparison to Numerical Simulations}, series = {Photomask Technology 2011}, volume = {8166}, booktitle = {Photomask Technology 2011}, publisher = {Proc. SPIE}, doi = {10.1117/12.896839}, pages = {81661Q}, year = {2011}, language = {en} } @inproceedings{ScholzeBodermannBurgeretal., author = {Scholze, Frank and Bodermann, Bernd and Burger, Sven and Endres, Johannes and Haase, Anton and Krumrey, Michael and Laubis, Christian and Soltwisch, Victor and Ullrich, Albrecht and Wernecke, Jan}, title = {Determination of line profiles on photomasks using DUV, EUV and X-ray scattering}, series = {Proc. SPIE}, volume = {9231}, booktitle = {Proc. SPIE}, doi = {10.1117/12.2065941}, pages = {92310M}, language = {en} }