@inproceedings{ScholzeLaubisUlmetal.2008, author = {Scholze, Frank and Laubis, Christian and Ulm, Gerhard and Dersch, Uwe and Pomplun, Jan and Burger, Sven and Schmidt, Frank}, title = {Evaluation of EUV scatterometry for CD characterization of EUV masks using rigorous FEM-simulation}, volume = {6921}, booktitle = {Emerging Lithographic Technologies XII}, editor = {Schellenberg, Frank}, publisher = {SPIE}, year = {2008}, language = {en} } @inproceedings{PomplunBurgerSchmidtetal.2008, author = {Pomplun, Jan and Burger, Sven and Schmidt, Frank and Scholze, Frank and Laubis, Christian and Dersch, Uwe}, title = {Metrology of EUV masks by EUV-scatterometry and finite element analysis}, volume = {7028}, booktitle = {Photomask and Next-Generation Lithography Mask Technology XV}, editor = {Horiuchi, Toshiyuki}, publisher = {SPIE}, year = {2008}, language = {en} } @inproceedings{PomplunBurgerSchmidtetal.2006, author = {Pomplun, Jan and Burger, Sven and Schmidt, Frank and Zschiedrich, Lin and Scholze, Frank}, title = {Rigorous FEM-Simulation of EUV-Masks: Influence of shape and material parameters}, volume = {6349}, booktitle = {Photomask Technology}, editor = {Martin, P. and Naber, R.}, publisher = {Proc. SPIE}, doi = {10.1117/12.686828}, pages = {63493D}, year = {2006}, language = {en} } @inproceedings{PomplunBurgerSchmidtetal.2007, author = {Pomplun, Jan and Burger, Sven and Schmidt, Frank and Scholze, Frank and Laubis, Christian and Dersch, Uwe}, title = {Finite element analysis of EUV lithography}, volume = {6617}, booktitle = {Modeling Aspects in Optical Metrology}, editor = {Bosse, Harald}, publisher = {Proc. SPIE}, doi = {10.1117/12.726156}, pages = {661718}, year = {2007}, language = {en} } @inproceedings{ScholzeLaubisDerschetal.2007, author = {Scholze, Frank and Laubis, Christian and Dersch, Uwe and Pomplun, Jan and Burger, Sven and Schmidt, Frank}, title = {The influence of line edge roughness and CD uniformity on EUV scatterometry for CD characterization of EUV masks}, volume = {6617}, booktitle = {Modeling Aspects in Optical Metrology}, editor = {Bosse, Harald}, publisher = {Proc. SPIE}, pages = {66171A}, year = {2007}, language = {en} } @inproceedings{BurgerZschiedrichPomplunetal.2011, author = {Burger, Sven and Zschiedrich, Lin and Pomplun, Jan and Schmidt, Frank and Kato, Akiko and Laubis, Christian and Scholze, Frank}, title = {Investigation of 3D Patterns on EUV Masks by Means of Scatterometry and Comparison to Numerical Simulations}, volume = {8166}, booktitle = {Photomask Technology 2011}, publisher = {Proc. SPIE}, doi = {10.1117/12.896839}, pages = {81661Q}, year = {2011}, language = {en} } @article{SoltwischBurgerScholze2013, author = {Soltwisch, Victor and Burger, Sven and Scholze, Frank}, title = {Scatterometry sensitivity analysis for conical diffraction versus in-plane diffraction geometry with respect to the side wall angle}, volume = {8789}, journal = {Proc. SPIE}, doi = {10.1117/12.2020487}, pages = {878905}, year = {2013}, language = {en} } @article{KatoBurgerScholze2012, author = {Kato, Akiko and Burger, Sven and Scholze, Frank}, title = {Analytical modeling and 3D finite element simulation of line edge roughness in scatterometry}, volume = {51}, journal = {Appl. Optics}, arxiv = {http://arxiv.org/abs/1208.4220}, doi = {10.1364/AO.51.006457}, pages = {6457 -- 6464}, year = {2012}, language = {en} } @article{SoltwischHaaseWerneckeetal.2016, author = {Soltwisch, Victor and Haase, Anton and Wernecke, Jan and Probst, J{\"u}rgen and Schoengen, Max and Burger, Sven and Krumrey, Michael and Scholze, Frank}, title = {Correlated diffuse x-ray scattering from periodically nanostructured surfaces}, volume = {94}, journal = {Phys. Rev. B}, arxiv = {http://arxiv.org/abs/1509.02003}, doi = {10.1103/PhysRevB.94.035419}, pages = {035419}, year = {2016}, language = {en} } @article{AndrleHoenickeSchneideretal.2019, author = {Andrle, Anna and H{\"o}nicke, Philipp and Schneider, Philipp-Immanuel and Kayser, Yves and Hammerschmidt, Martin and Burger, Sven and Scholze, Frank and Beckhoff, Burkhard and Soltwisch, Victor}, title = {Grazing incidence x-ray fluorescence based characterization of nanostructures for element sensitive profile reconstruction}, volume = {11057}, journal = {Proc. SPIE}, arxiv = {http://arxiv.org/abs/2104.13749}, doi = {10.1117/12.2526082}, pages = {110570M}, year = {2019}, language = {en} }