@inproceedings{BurgerZschiedrichPomplunetal.2008, author = {Burger, Sven and Zschiedrich, Lin and Pomplun, Jan and Schmidt, Frank}, title = {JCMsuite: An Adaptive FEM Solver for Precise Simulations in Nano-Optics}, series = {Integrated Photonics and Nanophotonics Research and Applications}, booktitle = {Integrated Photonics and Nanophotonics Research and Applications}, publisher = {Optical Society of America}, doi = {10.1364/IPNRA.2008.ITuE4}, pages = {ITuE4}, year = {2008}, language = {en} } @inproceedings{SchmidtBurgerPomplunetal.2008, author = {Schmidt, Frank and Burger, Sven and Pomplun, Jan and Zschiedrich, Lin}, title = {Advanced FEM analysis of optical waveguides: algorithms and applications}, series = {Integrated Optics}, volume = {6896}, booktitle = {Integrated Optics}, editor = {Greiner, Christoph and W{\"a}chter, Christoph}, publisher = {SPIE}, doi = {10.1117/12.765720}, pages = {689602}, year = {2008}, language = {en} } @inproceedings{ScholzeLaubisUlmetal.2008, author = {Scholze, Frank and Laubis, Christian and Ulm, Gerhard and Dersch, Uwe and Pomplun, Jan and Burger, Sven and Schmidt, Frank}, title = {Evaluation of EUV scatterometry for CD characterization of EUV masks using rigorous FEM-simulation}, series = {Emerging Lithographic Technologies XII}, volume = {6921}, booktitle = {Emerging Lithographic Technologies XII}, editor = {Schellenberg, Frank}, publisher = {SPIE}, year = {2008}, language = {en} } @inproceedings{PomplunBurgerSchmidtetal.2008, author = {Pomplun, Jan and Burger, Sven and Schmidt, Frank and Scholze, Frank and Laubis, Christian and Dersch, Uwe}, title = {Metrology of EUV masks by EUV-scatterometry and finite element analysis}, series = {Photomask and Next-Generation Lithography Mask Technology XV}, volume = {7028}, booktitle = {Photomask and Next-Generation Lithography Mask Technology XV}, editor = {Horiuchi, Toshiyuki}, publisher = {SPIE}, year = {2008}, language = {en} } @inproceedings{PomplunSchmidt2008, author = {Pomplun, Jan and Schmidt, Frank}, title = {Reduced Basis Method for Nano Optical Simulations}, series = {Integrated Photonics and Nanophotonics Research and Applications}, booktitle = {Integrated Photonics and Nanophotonics Research and Applications}, publisher = {Optical Society of America}, pages = {IWD7}, year = {2008}, language = {en} } @inproceedings{BurgerZschiedrichSchmidtetal.2008, author = {Burger, Sven and Zschiedrich, Lin and Schmidt, Frank and Evanschitzky, Peter and Erdmann, Andreas}, title = {Benchmark of rigorous methods for electromagnetic field simulation}, series = {Photomask Technology}, volume = {7122}, booktitle = {Photomask Technology}, editor = {Kawahira, H. and Zurbrick, L. S.}, publisher = {Proc. SPIE}, doi = {10.1117/12.801248}, pages = {71221}, year = {2008}, language = {en} } @inproceedings{ZschiedrichBurgerSchaedleetal.2008, author = {Zschiedrich, Lin and Burger, Sven and Sch{\"a}dle, Achim and Schmidt, Frank}, title = {A rigorous finite-element domain decomposition method for electromagnetic near field simulations}, series = {Optical Microlithography XXI}, volume = {6924}, booktitle = {Optical Microlithography XXI}, editor = {Levinson, Harry and Dusa, Mircea}, publisher = {SPIE}, doi = {10.1117/12.771989}, year = {2008}, language = {en} } @inproceedings{ZschiedrichSchmidt2008, author = {Zschiedrich, Lin and Schmidt, Frank}, title = {Finite element simulation of light propagation in non-periodic mask patterns}, series = {Photomask and Next-Generation Lithography Mask Technology XV}, volume = {7028}, booktitle = {Photomask and Next-Generation Lithography Mask Technology XV}, editor = {Horiuchi, Toshiyuki}, publisher = {SPIE}, year = {2008}, language = {en} }