@inproceedings{PomplunBurgerSchmidtetal.2006, author = {Pomplun, Jan and Burger, Sven and Schmidt, Frank and Zschiedrich, Lin and Scholze, Frank}, title = {Rigorous FEM-Simulation of EUV-Masks: Influence of shape and material parameters}, series = {Photomask Technology}, volume = {6349}, booktitle = {Photomask Technology}, editor = {Martin, P. and Naber, R.}, publisher = {Proc. SPIE}, doi = {10.1117/12.686828}, pages = {63493D}, year = {2006}, language = {en} } @inproceedings{BurgerZschiedrichSchaedleetal.2006, author = {Burger, Sven and Zschiedrich, Lin and Sch{\"a}dle, Achim and Klose, Roland and Kettner, Benjamin and Pomplun, Jan and Pollok, T. and Schmidt, Frank}, title = {Advanced FEM Analysis of Nano-Optical Devices}, series = {Proc. Symposium on Photonics Technologies for the 7th Framework Programme}, booktitle = {Proc. Symposium on Photonics Technologies for the 7th Framework Programme}, year = {2006}, language = {en} } @inproceedings{ScholzeLaubisDerschetal.2007, author = {Scholze, Frank and Laubis, Christian and Dersch, Uwe and Pomplun, Jan and Burger, Sven and Schmidt, Frank}, title = {The influence of line edge roughness and CD uniformity on EUV scatterometry for CD characterization of EUV masks}, series = {Modeling Aspects in Optical Metrology}, volume = {6617}, booktitle = {Modeling Aspects in Optical Metrology}, editor = {Bosse, Harald}, publisher = {Proc. SPIE}, pages = {66171A}, year = {2007}, language = {en} } @inproceedings{PomplunBurgerSchmidtetal.2007, author = {Pomplun, Jan and Burger, Sven and Schmidt, Frank and Scholze, Frank and Laubis, Christian and Dersch, Uwe}, title = {Finite element analysis of EUV lithography}, series = {Modeling Aspects in Optical Metrology}, volume = {6617}, booktitle = {Modeling Aspects in Optical Metrology}, editor = {Bosse, Harald}, publisher = {Proc. SPIE}, doi = {10.1117/12.726156}, pages = {661718}, year = {2007}, language = {en} } @inproceedings{PomplunHolzloehnerBurgeretal.2007, author = {Pomplun, Jan and Holzl{\"o}hner, Ronald and Burger, Sven and Zschiedrich, Lin and Schmidt, Frank}, title = {FEM investigation of leaky modes in hollow core photonic crystal fibers}, series = {Proc. SPIE, Photonic Crystal Materials and Devices VI}, volume = {6480}, booktitle = {Proc. SPIE, Photonic Crystal Materials and Devices VI}, editor = {Adibi, Ali and Scherer, Axel and Lin, Shawn-Yu}, pages = {64800M}, year = {2007}, language = {en} } @inproceedings{ZschiedrichBurgerPomplunetal.2007, author = {Zschiedrich, Lin and Burger, Sven and Pomplun, Jan and Schmidt, Frank}, title = {Goal oriented adaptive finite element method for precise simulation of optical components}, series = {Proc. SPIE, Integrated Optics}, volume = {6475}, booktitle = {Proc. SPIE, Integrated Optics}, editor = {Sidorin, Y. and Waechter, Ch.}, pages = {64750H}, year = {2007}, language = {en} } @inproceedings{BurgerZschiedrichPomplunetal.2008, author = {Burger, Sven and Zschiedrich, Lin and Pomplun, Jan and Schmidt, Frank}, title = {JCMsuite: An Adaptive FEM Solver for Precise Simulations in Nano-Optics}, series = {Integrated Photonics and Nanophotonics Research and Applications}, booktitle = {Integrated Photonics and Nanophotonics Research and Applications}, publisher = {Optical Society of America}, doi = {10.1364/IPNRA.2008.ITuE4}, pages = {ITuE4}, year = {2008}, language = {en} } @inproceedings{SchmidtBurgerPomplunetal.2008, author = {Schmidt, Frank and Burger, Sven and Pomplun, Jan and Zschiedrich, Lin}, title = {Advanced FEM analysis of optical waveguides: algorithms and applications}, series = {Integrated Optics}, volume = {6896}, booktitle = {Integrated Optics}, editor = {Greiner, Christoph and W{\"a}chter, Christoph}, publisher = {SPIE}, doi = {10.1117/12.765720}, pages = {689602}, year = {2008}, language = {en} } @inproceedings{ScholzeLaubisUlmetal.2008, author = {Scholze, Frank and Laubis, Christian and Ulm, Gerhard and Dersch, Uwe and Pomplun, Jan and Burger, Sven and Schmidt, Frank}, title = {Evaluation of EUV scatterometry for CD characterization of EUV masks using rigorous FEM-simulation}, series = {Emerging Lithographic Technologies XII}, volume = {6921}, booktitle = {Emerging Lithographic Technologies XII}, editor = {Schellenberg, Frank}, publisher = {SPIE}, year = {2008}, language = {en} } @inproceedings{PomplunBurgerSchmidtetal.2008, author = {Pomplun, Jan and Burger, Sven and Schmidt, Frank and Scholze, Frank and Laubis, Christian and Dersch, Uwe}, title = {Metrology of EUV masks by EUV-scatterometry and finite element analysis}, series = {Photomask and Next-Generation Lithography Mask Technology XV}, volume = {7028}, booktitle = {Photomask and Next-Generation Lithography Mask Technology XV}, editor = {Horiuchi, Toshiyuki}, publisher = {SPIE}, year = {2008}, language = {en} } @inproceedings{BurgerZschiedrichPomplunetal.2009, author = {Burger, Sven and Zschiedrich, Lin and Pomplun, Jan and Schmidt, Frank and Kettner, Benjamin and Lockau, D.}, title = {3D Finite-Element Simulations of Enhanced Light Transmission Through Arrays of Holes in Metal Films}, series = {Numerical Methods in Optical Metrology}, volume = {7390}, booktitle = {Numerical Methods in Optical Metrology}, publisher = {Proc. SPIE}, doi = {10.1117/12.827543}, pages = {73900H}, year = {2009}, language = {en} } @inproceedings{PomplunZschiedrichBurgeretal.2009, author = {Pomplun, Jan and Zschiedrich, Lin and Burger, Sven and Schmidt, Frank}, title = {Reduced basis method for computational lithography}, series = {Photomask Technology}, volume = {7488}, booktitle = {Photomask Technology}, publisher = {Proc. SPIE}, doi = {10.1117/12.829639}, pages = {74882B}, year = {2009}, language = {en} } @inproceedings{PomplunZschiedrichBurgeretal.2010, author = {Pomplun, Jan and Zschiedrich, Lin and Burger, Sven and Schmidt, Frank and Tyminski, Jacek and Flagello, Donis and Toshiharu, N.}, title = {Reduced basis method for source mask optimization}, series = {Photomask Technology}, volume = {7823}, booktitle = {Photomask Technology}, publisher = {Proc. SPIE}, doi = {10.1117/12.866101}, pages = {78230E}, year = {2010}, language = {en} } @inproceedings{BurgerZschiedrichPomplunetal.2010, author = {Burger, Sven and Zschiedrich, Lin and Pomplun, Jan and Schmidt, Frank}, title = {Finite element method for accurate 3D simulation of plasmonic waveguides}, series = {Integrated Optics: Devices, Materials, and Technologies XIV}, volume = {7604}, booktitle = {Integrated Optics: Devices, Materials, and Technologies XIV}, publisher = {Proc. SPIE}, doi = {10.1117/12.841995}, pages = {76040F}, year = {2010}, language = {en} } @inproceedings{PomplunSchmidtBurgeretal.2010, author = {Pomplun, Jan and Schmidt, Frank and Burger, Sven and Zschiedrich, Lin}, title = {Adaptive Reduced Basis Method for Optical Scattering Problems}, series = {Integrated Photonics Research, Silicon and Nanophotonics}, booktitle = {Integrated Photonics Research, Silicon and Nanophotonics}, publisher = {OSA}, doi = {10.1364/IPRSN.2010.IWD4}, pages = {IWD4}, year = {2010}, language = {en} } @inproceedings{PomplunBurgerZschiedrichetal.2011, author = {Pomplun, Jan and Burger, Sven and Zschiedrich, Lin and Schmidt, Frank}, title = {Reduced basis method for real-time inverse scatterometry}, series = {Modelling Aspects in Optical Metrology III}, volume = {8083}, booktitle = {Modelling Aspects in Optical Metrology III}, publisher = {Proc. SPIE}, doi = {10.1117/12.889892}, pages = {808308}, year = {2011}, language = {en} } @inproceedings{BurgerZschiedrichPomplunetal.2011, author = {Burger, Sven and Zschiedrich, Lin and Pomplun, Jan and Schmidt, Frank}, title = {Rigorous simulations of 3D patterns on extreme ultraviolet lithography masks}, series = {Modelling Aspects in Optical Metrology III}, volume = {8083}, booktitle = {Modelling Aspects in Optical Metrology III}, editor = {Bodermann, Bernd}, publisher = {Proc. SPIE}, doi = {10.1117/12.889831}, pages = {80831B}, year = {2011}, language = {en} } @inproceedings{BurgerZschiedrichPomplunetal.2011, author = {Burger, Sven and Zschiedrich, Lin and Pomplun, Jan and Schmidt, Frank and Kato, Akiko and Laubis, Christian and Scholze, Frank}, title = {Investigation of 3D Patterns on EUV Masks by Means of Scatterometry and Comparison to Numerical Simulations}, series = {Photomask Technology 2011}, volume = {8166}, booktitle = {Photomask Technology 2011}, publisher = {Proc. SPIE}, doi = {10.1117/12.896839}, pages = {81661Q}, year = {2011}, language = {en} } @inproceedings{BurgerPomplunSchmidtetal.2011, author = {Burger, Sven and Pomplun, Jan and Schmidt, Frank and Zschiedrich, Lin}, title = {Finite-element method simulations of high-Q nanocavities with 1D photonic bandgap}, series = {Physics and Simulation of Optoelectronic Devices XIX}, volume = {7933}, booktitle = {Physics and Simulation of Optoelectronic Devices XIX}, publisher = {Proc. SPIE}, doi = {10.1117/12.875044}, pages = {79330T}, year = {2011}, language = {en} } @inproceedings{KleemannKurzHetzleretal.2011, author = {Kleemann, B. and Kurz, J. and Hetzler, J. and Pomplun, Jan and Burger, Sven and Zschiedrich, Lin and Schmidt, Frank}, title = {Fast online inverse scattering with Reduced Basis Method (RBM) for a 3D phase grating with specific line roughness}, series = {Modelling Aspects in Optical Metrology III}, volume = {8083}, booktitle = {Modelling Aspects in Optical Metrology III}, publisher = {Proc. SPIE}, doi = {10.1117/12.889364}, pages = {808309}, year = {2011}, language = {en} }