@inproceedings{KleemannKurzHetzleretal.2011, author = {Kleemann, B. and Kurz, J. and Hetzler, J. and Pomplun, Jan and Burger, Sven and Zschiedrich, Lin and Schmidt, Frank}, title = {Fast online inverse scattering with Reduced Basis Method (RBM) for a 3D phase grating with specific line roughness}, volume = {8083}, booktitle = {Modelling Aspects in Optical Metrology III}, publisher = {Proc. SPIE}, doi = {10.1117/12.889364}, pages = {808309}, year = {2011}, language = {en} } @inproceedings{NeveOzPollokBurgeretal.2011, author = {Neve-Oz, Y. and Pollok, T. and Burger, Sven and Golosovsky, M. and Davidov, D.}, title = {Localized resonant states and transmission in a two- dimensional photonic quasicrystal}, volume = {1}, booktitle = {Proc. of the 5th International Conference on Applied Mathematics, Simulation, Modelling (ASM 'II), Corfu, 2011}, editor = {Mastorakis, N.}, isbn = {978-1-61804-016-9}, pages = {178 -- 182}, year = {2011}, language = {en} } @article{SchlosserSchothBurgeretal.2011, author = {Schlosser, Felix and Schoth, Mario and Burger, Sven and Schmidt, Frank and Knorr, Andreas and Mukamel, S. and Richter, Marten}, title = {Ultrafast nonlinear spectroscopy with spatially confined fields}, volume = {1398}, journal = {AIP Conference Proceedings}, publisher = {AIP}, doi = {10.1063/1.3644223}, pages = {94 -- 96}, year = {2011}, language = {en} } @inproceedings{SchmidtPomplunZschiedrichetal.2011, author = {Schmidt, Frank and Pomplun, Jan and Zschiedrich, Lin and Burger, Sven}, title = {Fast online simulation of 3D nanophotonic structures by the reduced basis method}, volume = {7941}, booktitle = {Integrated Optics: Devices, Materials, and Technologies XV}, publisher = {Proc. SPIE}, doi = {10.1117/12.874726}, pages = {79410G}, year = {2011}, language = {en} } @inproceedings{PomplunBurgerZschiedrichetal.2011, author = {Pomplun, Jan and Burger, Sven and Zschiedrich, Lin and Schmidt, Frank}, title = {Reduced basis method for real-time inverse scatterometry}, volume = {8083}, booktitle = {Modelling Aspects in Optical Metrology III}, publisher = {Proc. SPIE}, doi = {10.1117/12.889892}, pages = {808308}, year = {2011}, language = {en} } @article{ZhaoFrankBurgeretal.2011, author = {Zhao, J. and Frank, B. and Burger, Sven and Giessen, H.}, title = {Large-Area High-Quality Plasmonic Oligomers Fabricated by Angle-Controlled Colloidal Nanolithography}, volume = {5}, journal = {ACS Nano}, number = {11}, doi = {10.1021/nn203177s}, pages = {9009}, year = {2011}, language = {en} } @inproceedings{WongKangLeeetal.2011, author = {Wong, G. and Kang, M. and Lee, H. and Burger, Sven and Zschiedrich, Lin and Biancalana, F. and Russell, P.}, title = {Strongly Twisted Solid-Core PCF: A One-Dimensional Chiral Metamaterial}, booktitle = {Frontiers in Optics}, publisher = {Optical Society of America}, doi = {10.1364/FIO.2011.FMG3}, pages = {FMG3}, year = {2011}, language = {en} } @inproceedings{WenzelCrumpEkhteraeietal.2011, author = {Wenzel, Hans and Crump, Paul and Ekhteraei, Hossein and Schultz, Christoph M. and Pomplun, Jan and Burger, Sven and Zschiedrich, Lin and Schmidt, Frank and Erbert, G{\"o}tz}, title = {Theoretical and experimental analysis of the lateral modes of high-power broad-area lasers}, booktitle = {Numerical Simulation of Optoelectronic Devices}, doi = {10.1109/NUSOD.2011.6041183}, pages = {143 -- 144}, year = {2011}, language = {en} } @article{BodermannBuhrDanzebrinketal.2011, author = {Bodermann, Bernd and Buhr, Egbert and Danzebrink, Hans-Ulrich and B{\"a}r, Markus and Scholze, Frank and Krumrey, Michael and Wurm, Matthias and Klapetek, Petr and Hansen, Poul-Erik and Korpelainen, Virpi and van Veghel, Marijn and Yacoot, Andrew and Siitonen, Samuli and El Gawhary, Omar and Burger, Sven and Saastamoinen, Toni}, title = {Joint Research on Scatterometry and AFM Wafer Metrology}, volume = {1395}, journal = {AIP Conference Proceedings}, number = {1}, publisher = {AIP}, doi = {10.1063/1.3657910}, pages = {319 -- 323}, year = {2011}, language = {en} } @inproceedings{BurgerZschiedrichPomplunetal.2011, author = {Burger, Sven and Zschiedrich, Lin and Pomplun, Jan and Schmidt, Frank}, title = {Rigorous simulations of 3D patterns on extreme ultraviolet lithography masks}, volume = {8083}, booktitle = {Modelling Aspects in Optical Metrology III}, editor = {Bodermann, Bernd}, publisher = {Proc. SPIE}, doi = {10.1117/12.889831}, pages = {80831B}, year = {2011}, language = {en} }