TY - CONF A1 - Burger, Sven A1 - Zschiedrich, Lin A1 - Pomplun, Jan A1 - Schmidt, Frank A2 - Bodermann, Bernd T1 - Rigorous simulations of 3D patterns on extreme ultraviolet lithography masks T2 - Modelling Aspects in Optical Metrology III Y1 - 2011 UR - https://opus4.kobv.de/opus4-zib/frontdoor/index/index/docId/1991 VL - 8083 SP - 80831B PB - Proc. SPIE ER -