TY - CONF A1 - Scholze, Frank A1 - Laubis, Christian A1 - Dersch, Uwe A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank A2 - Bosse, Harald T1 - The influence of line edge roughness and CD uniformity on EUV scatterometry for CD characterization of EUV masks T2 - Modeling Aspects in Optical Metrology Y1 - 2007 UR - https://opus4.kobv.de/opus4-zib/frontdoor/index/index/docId/2384 VL - 6617 SP - 66171A PB - Proc. SPIE ER -