TY - CONF A1 - Pomplun, Jan A1 - Zschiedrich, Lin A1 - Burger, Sven A1 - Schmidt, Frank A1 - Tyminski, Jacek A1 - Flagello, Donis A1 - Toshiharu, N. T1 - Reduced basis method for source mask optimization T2 - Photomask Technology Y1 - 2010 UR - https://opus4.kobv.de/opus4-zib/frontdoor/index/index/docId/1975 VL - 7823 SP - 78230E PB - Proc. SPIE ER -