TY - CONF A1 - Zschiedrich, Lin A1 - Schmidt, Frank A2 - Horiuchi, Toshiyuki T1 - Finite element simulation of light propagation in non-periodic mask patterns T2 - Photomask and Next-Generation Lithography Mask Technology XV Y1 - 2008 UR - https://opus4.kobv.de/opus4-zib/frontdoor/index/index/docId/2601 UR - http://arxiv.org/pdf/0804.2587v1 VL - 7028 PB - SPIE ER -