TY - CONF A1 - Pomplun, Jan A1 - Burger, Sven A1 - Schmidt, Frank A1 - Zschiedrich, Lin A1 - Scholze, Frank A2 - Martin, P. A2 - Naber, R. T1 - Rigorous FEM-Simulation of EUV-Masks: Influence of shape and material parameters T2 - Photomask Technology Y1 - 2006 UR - https://opus4.kobv.de/opus4-zib/frontdoor/index/index/docId/2325 VL - 6349 SP - 63493D PB - Proc. SPIE ER -