@inproceedings{ScholzeLaubisUlmetal.2008, author = {Frank Scholze and Christian Laubis and Gerhard Ulm and Uwe Dersch and Jan Pomplun and Sven Burger and Frank Schmidt}, title = {Evaluation of EUV scatterometry for CD characterization of EUV masks using rigorous FEM-simulation}, booktitle = {Emerging Lithographic Technologies XII}, editor = {Frank Schellenberg}, volume = {6921}, year = {2008}, }