TY - JOUR A1 - Farchmin, Nando A1 - Hammerschmidt, Martin A1 - Schneider, Philipp-Immanuel A1 - Wurm, Matthias A1 - Bodermann, Bernd A1 - Bär, Markus A1 - Heidenreich, Sebastian T1 - Efficient Bayesian inversion for shape reconstruction of lithography masks T2 - J. Micro/Nanolith. MEMS MOEMS Y1 - 2020 UR - https://opus4.kobv.de/opus4-zib/frontdoor/index/index/docId/7828 VL - 19 SP - 024001 ER -