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In the last decades, laser machining of fused silica has gained in importance where the main challenge is to overcome the high transmission of this medium in order to achieve surface absorption. One approach is plasma treatment using hydrogenous process gases. In doing so, a near-surface glass layer is chemically modified by a removal of oxygen and an implantation of hydrogen, resulting in the formation of optically active defects and an increase in absorption. Against this background, the impact of the plasma power on plasma-induced increase in absorption of fused silica was investigated in the present work. Here, the highest efficiency of the plasma treatment process was found at the lowest applied plasma power whereas for higher plasma powers, a notably lower increase in absorption was observed. This effect is attributed to the decomposition of plasma species required for initiating the formation of optically active defects within the glass. Such decomposition increases with rising power due to the corresponding increase in electric field strength within the plasma. This finding is of substantial interest for an extensive understanding of plasma-glass interactions.