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Fluoropolymer Film Formation by Electron Activated Vacuum Deposition

  • Polytetrafluoroethylene (PTFE), polyhexafluoropropylene (PHFP) and polychlorotrifluoroethylene (PCTFE) were heated to their decomposition temperature in a high vacuum. The emitted fragments passed an electron cloud, condensed on a substrate and formed fluoropolymer film. Growth rate of PTFE and PHFP films increased up to a factor five in the presence of the electron cloud. Mass spectrometry revealed changes in the mass spectra of fragments generated by thermal decomposition only and formed under electron activation. The observed changes were different for each fluoropolymer. Infrared spectroscopy (IRS) showed that the structure of the films was close to the structure of the bulk polymers. Atomic force microscopy (AFM) has revealed different morphologies of PTFE, PHFP and PCTFE films, suggesting a Volmer–Weber growth mechanism for PTFE and PHFP but a Frank-van der Merwe one for PCTFE. All films were smooth at nanoscale and transparent from ultraviolet to near-infrared region. Additional radio frequency (RF) plasma ignited in the emitted fragments at a low pressure increased mechanical characteristics of the films without losing their optical transparency and smoothness.

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Metadaten
Author:Kostyantyn GrytsenkoORCiD, Viachaslau KsianzouORCiD, Yurii KolomzarovORCiD, Peter Lytvyn, Birgit Dietzel, Sigurd SchraderORCiD
URN:urn:nbn:de:kobv:526-opus4-13786
DOI:https://doi.org/10.3390/surfaces4010009
ISSN:2571-9637
Parent Title (English):Surfaces
Publisher:MDPI
Document Type:Article
Language:English
Year of Publication:2021
Publishing Institution:Technische Hochschule Wildau
Release Date:2021/02/24
Volume:4
Issue:1
First Page:66
Last Page:80
Source:Grytsenko, K.; Ksianzou, V.; Kolomzarov, Y.; Lytvyn, P.; Dietzel, B.; Schrader, S. Fluoropolymer Film Formation by Electron Activated Vacuum Deposition. Surfaces 2021, 4, 66-80. https://doi.org/10.3390/surfaces4010009
Faculties an central facilities:Fachbereich Ingenieur- und Naturwissenschaften
Dewey Decimal Classification:6 Technik, Medizin, angewandte Wissenschaften / 62 Ingenieurwissenschaften / 620 Ingenieurwissenschaften und zugeordnete Tätigkeiten
Licence (German):Creative Commons - CC BY - Namensnennung 4.0 International
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