MetadatenAuthor: | Joachim Bauer, Friedhelm Heinrich, Oksana Fursenko, Steffen Marschmeyer, Adrian Bluemich, Silvio Pulwer, Patrick SteglichORCiD, Claus VillringerORCiD, Andreas MaiORCiD, Sigurd SchraderORCiD |
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URN: | urn:nbn:de:kobv:526-opus4-13758 |
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DOI (Version of Record): | https://doi.org/10.1117/12.2269957 |
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ISSN: | 1996-756X |
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Parent Title (English): | Proceedings of SPIE |
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Document Type: | Conference Proceeding |
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Language: | English |
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Year of Publication: | 2017 |
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Publishing Institution: | Technische Hochschule Wildau |
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Release Date: | 2021/02/16 |
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Source: | J. Bauer, F. Heinrich, O. Fursenko, S. Marschmeyer, A. Bluemich, S. Pulwer, P. Steglich, C. Villringer, A. Mai, and S. Schrader "Very high aspect ratio through silicon via reflectometry", Proc. SPIE 10329, Optical Measurement Systems for Industrial Inspection X, 103293J (26 June 2017); https://doi.org/10.1117/12.2269957 |
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Copyright: | Copyright (2017) Society of Photo‑Optical Instrumentation Engineers (SPIE). One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this publication for a fee or for commercial purposes, and modification of the contents of the publication are prohibited. |
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Faculties an central facilities: | Fachbereich Ingenieur- und Naturwissenschaften |
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Dewey Decimal Classification: | 6 Technik, Medizin, angewandte Wissenschaften / 62 Ingenieurwissenschaften / 621 Angewandte Physik |
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Licence (German): | Das Dokument ist urheberrechtlich geschützt |
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