Synthesis of graphene-like transparent conductive films on dielectric substrates using a modified filtered vacuum arc system
- Here, we present a reliable process to deposit transparent conductive films on silicon oxide, quartz, and sapphire using a solid carbon source. This layer consists of partially ordered graphene flakes with a lateral dimension of about 5 nm. The process does not require any catalytic metal and exploits a high current arc evaporation (Φ-HCA) to homogeneously deposit a layer of carbon on heated substrates. A gas atmosphere consisting of Argon or Argon/Hydrogen blend acting as a buffer influences the morphology of the growing film. scanning tunneling microscopy, transmission electron microscopy, and Raman spectra were used for a thorough characterization of the samples in order to optimize the growth parameters. The best carbon layers have a surface resistance of 5.7 × 103 Ω◻ whereas the optical transparency of the coatings is 88% with an excellent homogeneity over areas of several cm2. Such results are compatible with most semiconductor fabrication processes and make this method very promising for various industrial applications.
Author: | Helge Lux, Peter Siemroth, Anna Sgarlata, Paolo Prosposito, Markus Andreas Schubert, Mauro CasalboniORCiD, Sigurd SchraderORCiD |
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URN: | urn:nbn:de:kobv:526-opus4-9738 |
DOI: | https://doi.org/10.1063/1.4921448 |
ISSN: | 1089-7550 |
Parent Title (English): | Journal of Applied Physics |
Document Type: | Article |
Language: | English |
Year of Publication: | 2015 |
Publishing Institution: | Technische Hochschule Wildau |
Release Date: | 2017/06/07 |
Volume: | 117 |
Issue: | 19 |
Source: | The following article appeared in Lux et al., J. Appl. Phys. 117, 195304 (2015) and may be found at http://dx.doi.org/10.1063/1.4921448. |
Copyright: | This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. |
Faculties an central facilities: | Fachbereich Ingenieur- und Naturwissenschaften |
Dewey Decimal Classification: | 6 Technik, Medizin, angewandte Wissenschaften / 62 Ingenieurwissenschaften / 621 Angewandte Physik |
Licence (German): | Das Dokument ist urheberrechtlich geschützt |