TY - JOUR A1 - Grytsenko, Kostyantyn A1 - Ksianzou, Viachaslau A1 - Kolomzarov, Yurii A1 - Lytvyn, Peter A1 - Dietzel, Birgit A1 - Schrader, Sigurd T1 - Fluoropolymer Film Formation by Electron Activated Vacuum Deposition JF - Surfaces N2 - Polytetrafluoroethylene (PTFE), polyhexafluoropropylene (PHFP) and polychlorotrifluoroethylene (PCTFE) were heated to their decomposition temperature in a high vacuum. The emitted fragments passed an electron cloud, condensed on a substrate and formed fluoropolymer film. Growth rate of PTFE and PHFP films increased up to a factor five in the presence of the electron cloud. Mass spectrometry revealed changes in the mass spectra of fragments generated by thermal decomposition only and formed under electron activation. The observed changes were different for each fluoropolymer. Infrared spectroscopy (IRS) showed that the structure of the films was close to the structure of the bulk polymers. Atomic force microscopy (AFM) has revealed different morphologies of PTFE, PHFP and PCTFE films, suggesting a Volmer–Weber growth mechanism for PTFE and PHFP but a Frank-van der Merwe one for PCTFE. All films were smooth at nanoscale and transparent from ultraviolet to near-infrared region. Additional radio frequency (RF) plasma ignited in the emitted fragments at a low pressure increased mechanical characteristics of the films without losing their optical transparency and smoothness. KW - fluoropolymer thin film KW - vacuum deposition KW - polymerization KW - plasma KW - surface Y1 - 2021 U6 - http://nbn-resolving.de/urn/resolver.pl?urn:nbn:de:kobv:526-opus4-13786 SN - 2571-9637 VL - 4 IS - 1 SP - 66 EP - 80 PB - MDPI ER - TY - JOUR A1 - Sopinskyy, Mykola A1 - Grytsenko, Kostyantyn A1 - Villringer, Claus A1 - Kolomzarov, Yurii A1 - Schrader, Sigurd T1 - Determination of scattering and Urbach absorption contributions to the light extinction in PTFE films by using graphical representation technique and numerical solution of the inverse problem JF - Semiconductor Physics, Quantum Electronics & Optoelectronics N2 - Ellipsometrically obtained spectral dependences of ordinary αxy and extra-ordinary αz extinction/attenuation coefficients within the spectral range λ = 300…980 nm of uniaxially anisotropic polytetrafluoroethylene (PTFE) films were analyzed. We considered the capabilities and specific features of the graphical representation technique for determining the contribution of Rayleigh scattering and Urbach absorption to light attenuation in the spectral range beyond fundamental absorption. It has been shown that the graphical approach enables to estimate these contributions qualitatively, semi-quantitatively or quantitatively, depending on the situation. The conclusions made using the analysis of graphical representation are confirmed by numerical solution of the inverse problem via simulation of the αxy (λ), αz (λ) experimental dependences within the framework of a best-fit procedure. Being based on both of these approaches, we have ascertained that, in the as-prepared PTFE films, the so-called anomalous light scattering (ALS) with the spectral dependence of scattering coefficient αs ≈ as λ–p (p > 4) takes place. Transformation of scattering from ALS to the Rayleigh one with p ≈ 4 due to annealing is accompanied by an increase of Urbach (subband) absorption. Both of these factors cause narrowing the dynamic range of extinction coefficient values. Both scattering and absorption coefficients are higher for the component of light polarized along the normal to the substrate as compared to the component polarized in parallel to it. The relationship between observed behavior of the scattering and absorption coefficients and the film structure has been discussed. KW - Rayleigh scattering KW - Urbach tail KW - absorption coefficient KW - scattering coefficient KW - graphical method KW - ellipsometry KW - polytetrafluoroethylene Y1 - 2023 U6 - http://nbn-resolving.de/urn/resolver.pl?urn:nbn:de:kobv:526-opus4-18035 SN - 1605-6582 VL - 26 IS - 3 SP - 303 EP - 314 PB - National Academy of Sciences of Ukraine. Institute for Semiconductor Physics CY - Kyiv ER - TY - JOUR A1 - Grytsenko, Kostyantyn A1 - Kolomzarov, Yurii A1 - Lytvyn, Peter A1 - Kondratenko, Olga A1 - Sopinskyy, Mykola A1 - Lebedyeva, Iryna A1 - Niemczyk, Agata A1 - Baranowska, Jolanta A1 - Moszyński, Dariusz A1 - Villringer, Claus A1 - Schrader, Sigurd T1 - Optical and Mechanical Properties of Thin PTFE Films, Deposited from a Gas Phase JF - Macromolecular Materials and Engineering N2 - Thin polytetrafluoroethylene (PTFE) films are produced by deposition from a gas phase by two methods: electron-enhanced vacuum deposition (EVD) and EVD + low-temperature plasma (LTP). Structure, morphology, and composition of the films are studied by IR spectroscopy, atomic force microscopy, and X-ray photoelectron spectroscopy. They are close to the structure of bulk PTFE. The roughness of the films’ surface is changed with gas pressure and LTP power variations. Films are transparent from UV to near-infrared regions. Refractive and extinction indices and their anisotropy are measured by spectral ellipsometry. They are tuned by variations of deposition conditions. Hardness and Young modulus of the films are increased if EVD + low power LTP is used for film deposition. Use of EVD + LTP also increases thermal stability of the films. Contact angle of the films corresponds to the bulk PTFE. The PTFE molecules oriented are preferentially in perpendicular direction to the substrate surface. KW - deposition in vacuum KW - multiphase structure formation KW - optical property KW - plasma KW - polytetrafluoroethylene thin film Y1 - 2023 U6 - http://nbn-resolving.de/urn/resolver.pl?urn:nbn:de:kobv:526-opus4-17587 VL - 308 IS - 6 PB - Wiley ER - TY - CHAP A1 - Grytsenko, Kostyantyn A1 - Doroshenko, T. A1 - Kolomzarov, Yurii A1 - Prokopets, Vadym M. A1 - Fedoriak, O. A1 - Zelinski, R. A1 - Lytvyn, Oksana A1 - Prescher, Dietrich A1 - Grimm, Bernd A1 - Ksianzou, Viachaslau A1 - Schrader, Sigurd A1 - Tolmachev, O. I. A1 - Slominskii, Yu L. A1 - Kurdiukov, V. A1 - Smirnova, G. T1 - Research on the growth of dye film in vacuum in situ N2 - Organic film deposition in vacuum is fast developing scientific and industrial domain. We developed installation for deposition of organic films equipped with optical spectrometer for measurements in situ. We are developing new dyes aimed for application in waveguide sensor, nonlinear optics and studying film organisation during deposition. Fluorinated azo-dyes and azomethine dyes were synthesized at University of Applied Sciences Wildau and at the Institute of Organic Chemistry, Kyiv. Compounds were evaporated at a pressure of 10-3 Pa using resistive heated crucible. Glass and glass covered with polytetrafluoroethylene (PTFE) film are used as substrates. The films were studied with Polytec and StellarNet spectrometers and an atomic force microscope. Optical spectra of the dye films revealed, that some compounds were decomposed during evaporation. Several kinds of dyes were evaporated and deposited without decomposition. Some deposited films formed H-aggregates and other types of aggregates. AFM images of dye films showed that their morphology depends on the chemical structure of the compounds and on the nature of the substrate on which the film was grown. KW - dye KW - solid KW - film KW - in situ KW - optical spectra KW - vacuum deposition Y1 - 2008 U6 - http://nbn-resolving.de/urn/resolver.pl?urn:nbn:de:kobv:526-opus4-15206 SP - 318 EP - 323 PB - Society of Photo-Optical Instrumentation Engineers (SPIE) ER -