TY - JOUR A1 - Grytsenko, Kostyantyn A1 - Ksianzou, Viachaslau A1 - Kolomzarov, Yurii A1 - Lytvyn, Peter A1 - Dietzel, Birgit A1 - Schrader, Sigurd T1 - Fluoropolymer Film Formation by Electron Activated Vacuum Deposition JF - Surfaces N2 - Polytetrafluoroethylene (PTFE), polyhexafluoropropylene (PHFP) and polychlorotrifluoroethylene (PCTFE) were heated to their decomposition temperature in a high vacuum. The emitted fragments passed an electron cloud, condensed on a substrate and formed fluoropolymer film. Growth rate of PTFE and PHFP films increased up to a factor five in the presence of the electron cloud. Mass spectrometry revealed changes in the mass spectra of fragments generated by thermal decomposition only and formed under electron activation. The observed changes were different for each fluoropolymer. Infrared spectroscopy (IRS) showed that the structure of the films was close to the structure of the bulk polymers. Atomic force microscopy (AFM) has revealed different morphologies of PTFE, PHFP and PCTFE films, suggesting a Volmer–Weber growth mechanism for PTFE and PHFP but a Frank-van der Merwe one for PCTFE. All films were smooth at nanoscale and transparent from ultraviolet to near-infrared region. Additional radio frequency (RF) plasma ignited in the emitted fragments at a low pressure increased mechanical characteristics of the films without losing their optical transparency and smoothness. KW - fluoropolymer thin film KW - vacuum deposition KW - polymerization KW - plasma KW - surface Y1 - 2021 U6 - http://nbn-resolving.de/urn/resolver.pl?urn:nbn:de:kobv:526-opus4-13786 SN - 2571-9637 VL - 4 IS - 1 SP - 66 EP - 80 PB - MDPI ER - TY - JOUR A1 - Grytsenko, Kostyantyn A1 - Kolomzarov, Yurii A1 - Lytvyn, Peter A1 - Kondratenko, Olga A1 - Sopinskyy, Mykola A1 - Lebedyeva, Iryna A1 - Niemczyk, Agata A1 - Baranowska, Jolanta A1 - Moszyński, Dariusz A1 - Villringer, Claus A1 - Schrader, Sigurd T1 - Optical and Mechanical Properties of Thin PTFE Films, Deposited from a Gas Phase JF - Macromolecular Materials and Engineering N2 - Thin polytetrafluoroethylene (PTFE) films are produced by deposition from a gas phase by two methods: electron-enhanced vacuum deposition (EVD) and EVD + low-temperature plasma (LTP). Structure, morphology, and composition of the films are studied by IR spectroscopy, atomic force microscopy, and X-ray photoelectron spectroscopy. They are close to the structure of bulk PTFE. The roughness of the films’ surface is changed with gas pressure and LTP power variations. Films are transparent from UV to near-infrared regions. Refractive and extinction indices and their anisotropy are measured by spectral ellipsometry. They are tuned by variations of deposition conditions. Hardness and Young modulus of the films are increased if EVD + low power LTP is used for film deposition. Use of EVD + LTP also increases thermal stability of the films. Contact angle of the films corresponds to the bulk PTFE. The PTFE molecules oriented are preferentially in perpendicular direction to the substrate surface. KW - deposition in vacuum KW - multiphase structure formation KW - optical property KW - plasma KW - polytetrafluoroethylene thin film Y1 - 2023 U6 - http://nbn-resolving.de/urn/resolver.pl?urn:nbn:de:kobv:526-opus4-17587 VL - 308 IS - 6 PB - Wiley ER - TY - JOUR A1 - Ksianzou, Viachaslau A1 - Villringer, Claus A1 - Grytsenko, Kostyantyn A1 - Pekur, Demyd A1 - Lytvyn, Peter A1 - Sopinskyy, Mykola A1 - Lebedyeva, Iryna A1 - Niemczyk, Agata A1 - Baranowska, Jolanta T1 - Structural and Optical Anomalies in Thin Films Grown in a Magnetic Field by Electron-Assisted Vacuum Deposition of PTFE JF - Macromolecular Materials and Engineering N2 - Polytetrafluoroethylene (PTFE) films are deposited in parallel and perpendicular magnetic fields (MF) by electron-enhanced vacuum deposition (EVD) and EVD + low-temperature plasma (LTP) methods. The structure, morphology, and nanomechanical properties of the films are studied by infrared spectroscopy (IRS), atomic force microscopy (AFM), and spectroscopic ellipsometry. The structure of the thicker films is closer to that of bulk PTFE than that of thin films. The films' crystallinity and surface roughness are higher than those deposited without MF. The birefringence of the refractive index (n) of the films deposited in the MF is inverse to the anisotropy of the n of the films deposited without MF. The hardness of the films is close to that of bulk PTFE. KW - birefringence KW - deposition in vacuum KW - morphology KW - plasma KW - thin polytetrafluoroethylene film Y1 - 2025 U6 - http://nbn-resolving.de/urn/resolver.pl?urn:nbn:de:kobv:526-opus4-19712 VL - 310 IS - 3 PB - Wiley ER -