TY - JOUR A1 - Sopinskyy, Mykola A1 - Grytsenko, Kostyantyn A1 - Villringer, Claus A1 - Kolomzarov, Yurii A1 - Schrader, Sigurd T1 - Determination of scattering and Urbach absorption contributions to the light extinction in PTFE films by using graphical representation technique and numerical solution of the inverse problem JF - Semiconductor Physics, Quantum Electronics & Optoelectronics N2 - Ellipsometrically obtained spectral dependences of ordinary αxy and extra-ordinary αz extinction/attenuation coefficients within the spectral range λ = 300…980 nm of uniaxially anisotropic polytetrafluoroethylene (PTFE) films were analyzed. We considered the capabilities and specific features of the graphical representation technique for determining the contribution of Rayleigh scattering and Urbach absorption to light attenuation in the spectral range beyond fundamental absorption. It has been shown that the graphical approach enables to estimate these contributions qualitatively, semi-quantitatively or quantitatively, depending on the situation. The conclusions made using the analysis of graphical representation are confirmed by numerical solution of the inverse problem via simulation of the αxy (λ), αz (λ) experimental dependences within the framework of a best-fit procedure. Being based on both of these approaches, we have ascertained that, in the as-prepared PTFE films, the so-called anomalous light scattering (ALS) with the spectral dependence of scattering coefficient αs ≈ as λ–p (p > 4) takes place. Transformation of scattering from ALS to the Rayleigh one with p ≈ 4 due to annealing is accompanied by an increase of Urbach (subband) absorption. Both of these factors cause narrowing the dynamic range of extinction coefficient values. Both scattering and absorption coefficients are higher for the component of light polarized along the normal to the substrate as compared to the component polarized in parallel to it. The relationship between observed behavior of the scattering and absorption coefficients and the film structure has been discussed. KW - Rayleigh scattering KW - Urbach tail KW - absorption coefficient KW - scattering coefficient KW - graphical method KW - ellipsometry KW - polytetrafluoroethylene Y1 - 2023 U6 - http://nbn-resolving.de/urn/resolver.pl?urn:nbn:de:kobv:526-opus4-18035 SN - 1605-6582 VL - 26 IS - 3 SP - 303 EP - 314 PB - National Academy of Sciences of Ukraine. Institute for Semiconductor Physics CY - Kyiv ER - TY - JOUR A1 - Grytsenko, Kostyantyn A1 - Kolomzarov, Yurii A1 - Lytvyn, Peter A1 - Kondratenko, Olga A1 - Sopinskyy, Mykola A1 - Lebedyeva, Iryna A1 - Niemczyk, Agata A1 - Baranowska, Jolanta A1 - Moszyński, Dariusz A1 - Villringer, Claus A1 - Schrader, Sigurd T1 - Optical and Mechanical Properties of Thin PTFE Films, Deposited from a Gas Phase JF - Macromolecular Materials and Engineering N2 - Thin polytetrafluoroethylene (PTFE) films are produced by deposition from a gas phase by two methods: electron-enhanced vacuum deposition (EVD) and EVD + low-temperature plasma (LTP). Structure, morphology, and composition of the films are studied by IR spectroscopy, atomic force microscopy, and X-ray photoelectron spectroscopy. They are close to the structure of bulk PTFE. The roughness of the films’ surface is changed with gas pressure and LTP power variations. Films are transparent from UV to near-infrared regions. Refractive and extinction indices and their anisotropy are measured by spectral ellipsometry. They are tuned by variations of deposition conditions. Hardness and Young modulus of the films are increased if EVD + low power LTP is used for film deposition. Use of EVD + LTP also increases thermal stability of the films. Contact angle of the films corresponds to the bulk PTFE. The PTFE molecules oriented are preferentially in perpendicular direction to the substrate surface. KW - deposition in vacuum KW - multiphase structure formation KW - optical property KW - plasma KW - polytetrafluoroethylene thin film Y1 - 2023 U6 - http://nbn-resolving.de/urn/resolver.pl?urn:nbn:de:kobv:526-opus4-17587 VL - 308 IS - 6 PB - Wiley ER - TY - JOUR A1 - Ksianzou, Viachaslau A1 - Villringer, Claus A1 - Grytsenko, Kostyantyn A1 - Pekur, Demyd A1 - Lytvyn, Peter A1 - Sopinskyy, Mykola A1 - Lebedyeva, Iryna A1 - Niemczyk, Agata A1 - Baranowska, Jolanta T1 - Structural and Optical Anomalies in Thin Films Grown in a Magnetic Field by Electron-Assisted Vacuum Deposition of PTFE JF - Macromolecular Materials and Engineering N2 - Polytetrafluoroethylene (PTFE) films are deposited in parallel and perpendicular magnetic fields (MF) by electron-enhanced vacuum deposition (EVD) and EVD + low-temperature plasma (LTP) methods. The structure, morphology, and nanomechanical properties of the films are studied by infrared spectroscopy (IRS), atomic force microscopy (AFM), and spectroscopic ellipsometry. The structure of the thicker films is closer to that of bulk PTFE than that of thin films. The films' crystallinity and surface roughness are higher than those deposited without MF. The birefringence of the refractive index (n) of the films deposited in the MF is inverse to the anisotropy of the n of the films deposited without MF. The hardness of the films is close to that of bulk PTFE. KW - birefringence KW - deposition in vacuum KW - morphology KW - plasma KW - thin polytetrafluoroethylene film Y1 - 2025 U6 - http://nbn-resolving.de/urn/resolver.pl?urn:nbn:de:kobv:526-opus4-19712 VL - 310 IS - 3 PB - Wiley ER -