<?xml version="1.0" encoding="utf-8"?>
<export-example>
  <doc>
    <id>1607</id>
    <completedYear>2022</completedYear>
    <publishedYear/>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue>12</issue>
    <volume>9</volume>
    <type>article</type>
    <publisherName>Wiley</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Atomic Layer Deposition of the Conductive Delafossite PtCoO2</title>
    <abstract language="eng">The first atomic layer deposition process for a ternary oxide is reported, which contains a metal of the platinum group, the delafossite PtCoO2. The deposition with the precursors trimethyl-Pt-methylcyclopentadienyl, Co-bis(N-t-butyl-N′-ethylpropanimidamidate), and oxygen plasma results in a process with a nearly constant growth rate and stoichiometric composition over a wide temperature window from 100 to 320 °C. Annealing of the as-deposited amorphous films in an oxygen atmosphere in a temperature window from 700 to 800 °C leads to the formation of the delafossite phase. Very thin films show a pronounced preferred orientation with the Pt sheets being almost parallel to the substrate surface while arbitrary orientation is observed for thicker films. The conformal coating of narrow trenches highlights the potential of this atomic-layer-deposition process. Moreover, heterostructures with magnetic films are fabricated to demonstrate the potential of PtCoO2 for spintronic applications.</abstract>
    <parentTitle language="eng">Advanced Materials Interfaces</parentTitle>
    <identifier type="urn">urn:nbn:de:kobv:526-opus4-16076</identifier>
    <enrichment key="opus.import.date">2022-05-09T07:04:44+00:00</enrichment>
    <enrichment key="opus.source">sword</enrichment>
    <enrichment key="opus.import.user">sword</enrichment>
    <enrichment key="opus.import.file">filename=phps6q8Ie</enrichment>
    <enrichment key="opus.import.checksum">8a01c9d3b5a78f0a39c12aa415c9848a</enrichment>
    <enrichment key="DOI_VoR">https://doi.org/10.1002/admi.202200013</enrichment>
    <enrichment key="SourceTitle">Hagen, D. J., Yoon, J., Zhang, H., Kalkofen, B., Silinskas, M., Börrnert, F., Han, H., Parkin, S. S. P., Atomic Layer Deposition of the Conductive Delafossite PtCoO2. Adv. Mater. Interfaces 2022, 9, 2200013. https://doi.org/10.1002/admi.202200013</enrichment>
    <licence>Creative Commons - CC BY - Namensnennung 4.0 International</licence>
    <author>Dirk J. Hagen</author>
    <author>Jiho Yoon</author>
    <author>Haojie Zhang</author>
    <author>Bodo Kalkofen</author>
    <author>Mindaugas Silinskas</author>
    <author>Felix Börrnert</author>
    <author>Hyeon Han</author>
    <author>Stuart S. P. Parkin</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>ALD</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>atomic layer deposition</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>conductive oxide</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>delafossite</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>PtCoO2 topological material</value>
    </subject>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="institutes" number="">Fachbereich Ingenieur- und Naturwissenschaften</collection>
    <collection role="open_access" number="">open_access</collection>
    <collection role="Import" number="import">Import</collection>
    <collection role="green_open_access" number="1">Gold Open Access</collection>
    <thesisPublisher>Technische Hochschule Wildau</thesisPublisher>
    <file>https://opus4.kobv.de/opus4-th-wildau/files/1607/AdvMaterialsInter-2022.pdf</file>
  </doc>
</export-example>
