<?xml version="1.0" encoding="utf-8"?>
<export-example>
  <doc>
    <id>972</id>
    <completedYear>2016</completedYear>
    <publishedYear/>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue>22</issue>
    <volume>119</volume>
    <type>article</type>
    <publisherName/>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Resolving the nanostructure of plasma-enhanced chemical vapor deposited nanocrystalline SiOx layers for application in solar cells</title>
    <abstract language="eng">Nanocrystalline silicon suboxides (nc-SiOx) have attracted attention during the past years for the use in thin-film silicon solar cells. We investigated the relationships between the nanostructure as well as the chemical, electrical, and optical properties of phosphorous, doped, nc-SiO0.8:H fabricated by plasma-enhanced chemical vapor deposition. The nanostructure was varied through the sample series by changing the deposition pressure from 533 to 1067 Pa. The samples were then characterized by X-ray photoelectron spectroscopy, spectroscopic ellipsometry, Raman spectroscopy, aberration-corrected high-resolution transmission electron microscopy, selected-area electron diffraction, and a specialized plasmon imaging method. We found that the material changed with increasing pressure from predominantly amorphous silicon monoxide to silicon dioxide containing nanocrystalline silicon. The nanostructure changed from amorphous silicon filaments to nanocrystalline silicon filaments, which were found to cause anisotropic electron transport.</abstract>
    <parentTitle language="eng">Journal of Applied Physics</parentTitle>
    <identifier type="issn">1089-7550</identifier>
    <identifier type="urn">urn:nbn:de:kobv:526-opus4-9727</identifier>
    <enrichment key="SourceTitle">M. Klingsporn, S. Kirner, C. Villringer, D. Abou-Ras, I. Costina, M. Lehmann, B. Stannowski; Resolving the nanostructure of plasma-enhanced chemical vapor deposited nanocrystalline SiOx layers for application in solar cells. J. Appl. Phys. 14 June 2016; 119 (22): 223104. https://doi.org/10.1063/1.4953566</enrichment>
    <enrichment key="CopyrightInfo">This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing.</enrichment>
    <enrichment key="DOI_VoR">https://doi.org/10.1063/1.4953566</enrichment>
    <licence>Das Dokument ist urheberrechtlich geschützt.</licence>
    <author>M. Klingsporn</author>
    <author>S. Kirner</author>
    <author>Claus Villringer</author>
    <author>D. Abou-Ras</author>
    <author>Ioan Costina</author>
    <author>M. Lehmann</author>
    <author>Bernd Stannowski</author>
    <collection role="ddc" number="621">Angewandte Physik</collection>
    <collection role="institutes" number="">Fachbereich Ingenieur- und Naturwissenschaften</collection>
    <collection role="open_access" number="">open_access</collection>
    <collection role="green_open_access" number="2">Green Open Access</collection>
    <thesisPublisher>Technische Hochschule Wildau</thesisPublisher>
    <file>https://opus4.kobv.de/opus4-th-wildau/files/972/10.1063-1.4953566.pdf</file>
  </doc>
</export-example>
