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<export-example>
  <doc>
    <id>1803</id>
    <completedYear>2023</completedYear>
    <publishedYear/>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>303</pageFirst>
    <pageLast>314</pageLast>
    <pageNumber/>
    <edition/>
    <issue>3</issue>
    <volume>26</volume>
    <type>article</type>
    <publisherName>National Academy of Sciences of Ukraine. Institute for Semiconductor Physics</publisherName>
    <publisherPlace>Kyiv</publisherPlace>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Determination of scattering and Urbach absorption contributions to the light extinction in PTFE films by using graphical representation technique and numerical solution of the inverse problem</title>
    <abstract language="eng">Ellipsometrically obtained spectral dependences of ordinary αxy and extra-ordinary αz extinction/attenuation coefficients within the spectral range λ = 300…980 nm of uniaxially anisotropic polytetrafluoroethylene (PTFE) films were analyzed. We considered the capabilities and specific features of the graphical representation technique for determining the contribution of Rayleigh scattering and Urbach absorption to light attenuation in the spectral range beyond fundamental absorption. It has been shown that the graphical approach enables to estimate these contributions qualitatively, semi-quantitatively or quantitatively, depending on the situation. The conclusions made using the analysis of graphical representation are confirmed by numerical solution of the inverse problem via simulation of the αxy (λ), αz (λ) experimental dependences within the framework of a best-fit procedure. Being based on both of these approaches, we have ascertained that, in the as-prepared PTFE films, the so-called anomalous light scattering (ALS) with the spectral dependence of scattering coefficient αs ≈ as λ–p (p &gt; 4) takes place. Transformation of scattering from ALS to the Rayleigh one with p ≈ 4 due to annealing is accompanied by an increase of Urbach (subband) absorption. Both of these factors cause narrowing the dynamic range of extinction coefficient values. Both scattering and absorption coefficients are higher for the component of light polarized along the normal to the substrate as compared to the component polarized in parallel to it. The relationship between observed behavior of the scattering and absorption coefficients and the film structure has been discussed.</abstract>
    <parentTitle language="eng">Semiconductor Physics, Quantum Electronics &amp; Optoelectronics</parentTitle>
    <identifier type="issn">1605-6582</identifier>
    <identifier type="urn">urn:nbn:de:kobv:526-opus4-18035</identifier>
    <enrichment key="opus.import.date">2023-10-02T07:51:36+00:00</enrichment>
    <enrichment key="opus.source">sword</enrichment>
    <enrichment key="opus.import.user">sword</enrichment>
    <enrichment key="DOI_VoR">https://doi.org/10.15407/spqeo26.03.303</enrichment>
    <enrichment key="SourceTitle">Sopinskyy, M. V., Grytsenko, K., Villringer, C., Kolomzarov, Yu. V., &amp; Schrader, S. (2023). Determination of scattering and Urbach absorption contributions to the light extinction in PTFE films by using graphical representation technique and numerical solution of the inverse problem. Semiconductor Physics, Quantum Electronics &amp; Optoelectronics, 26(3), 303–314. doi:10.15407/spqeo26.03.303</enrichment>
    <enrichment key="opus.doi.autoCreate">false</enrichment>
    <enrichment key="opus.urn.autoCreate">true</enrichment>
    <licence>Creative Commons - CC BY-ND - Namensnennung - Keine Bearbeitungen 4.0 International</licence>
    <author>Mykola Sopinskyy</author>
    <author>Kostyantyn Grytsenko</author>
    <author>Claus Villringer</author>
    <author>Yurii Kolomzarov</author>
    <author>Sigurd Schrader</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Rayleigh scattering</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Urbach tail</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>absorption coefficient</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>scattering coefficient</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>graphical method</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>ellipsometry</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>polytetrafluoroethylene</value>
    </subject>
    <collection role="ddc" number="621">Angewandte Physik</collection>
    <collection role="institutes" number="">Fachbereich Ingenieur- und Naturwissenschaften</collection>
    <collection role="open_access" number="">open_access</collection>
    <collection role="Import" number="import">Import</collection>
    <collection role="green_open_access" number="3">Diamond Open Access</collection>
    <thesisPublisher>Technische Hochschule Wildau</thesisPublisher>
    <file>https://opus4.kobv.de/opus4-th-wildau/files/1803/v26n3-p303-314.pdf</file>
  </doc>
  <doc>
    <id>1229</id>
    <completedYear>2019</completedYear>
    <publishedYear/>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>345</pageFirst>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue>5</issue>
    <volume>9</volume>
    <type>article</type>
    <publisherName/>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>1</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">The Role of Substrate Temperature and Magnetic Filtering for DLC by Cathodic Arc Evaporation</title>
    <abstract language="eng">Diamond-like carbon (DLC) films were deposited using two different types of high current arc evaporation. The first process used a magnetic particle filter to remove droplets from the plasma. For the second process, the samples were put into a metallic cage which was placed directly above the plasma source. For both processes, we varied the substrate temperature from 21 to 350 °C in order to investigate the temperature effect. The samples were characterized using SEM, AFM, XPS, Raman Spectroscopy, Ellipsometry, Photometry, and Nano Indentation in order to compare both methods of deposition and provide a careful characterization of such DLC films. We found that the sp3 content and the hardness can be precisely adjusted by changing the substrate temperature. Furthermore, in the case of unfiltered deposition, the optical constants can be shifted in the direction of higher absorbance in order to produce black and hard carbon coatings.</abstract>
    <parentTitle language="eng">Coatings</parentTitle>
    <identifier type="issn">2079-6412</identifier>
    <identifier type="urn">urn:nbn:de:kobv:526-opus4-12295</identifier>
    <enrichment key="SourceTitle">Lux, H.; Edling, M.; Lucci, M.; Kitzmann, J.; Villringer, C.; Siemroth, P.; De Matteis, F.; Schrader, S. The Role of Substrate Temperature and Magnetic Filtering for DLC by Cathodic Arc Evaporation. Coatings 2019, 9, 345.</enrichment>
    <enrichment key="DOI_VoR">https://doi.org/10.3390/coatings9050345</enrichment>
    <licence>Creative Commons - CC BY - Namensnennung 4.0 International</licence>
    <author>Helge Lux</author>
    <author>Matthias Edling</author>
    <author>Massimiliano Lucci</author>
    <author>Julia Kitzmann</author>
    <author>Claus Villringer</author>
    <author>Peter Siemroth</author>
    <author>Fabio De Matteis</author>
    <author>Sigurd Schrader</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>DLC</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>ta-C</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>arc evaporation</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>substrate temperature</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>hardness</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>optical constant</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>ellipsometry</value>
    </subject>
    <collection role="ddc" number="620">Ingenieurwissenschaften und zugeordnete Tätigkeiten</collection>
    <collection role="institutes" number="">Fachbereich Ingenieur- und Naturwissenschaften</collection>
    <collection role="open_access" number="">open_access</collection>
    <collection role="Funding" number="">DFG-geförderter Publikationsfonds</collection>
    <collection role="green_open_access" number="1">Gold Open Access</collection>
    <thesisPublisher>Technische Hochschule Wildau</thesisPublisher>
    <file>https://opus4.kobv.de/opus4-th-wildau/files/1229/coatings-09-00345-v2.pdf</file>
  </doc>
</export-example>
