@inproceedings{MeisterAlSaadiFrankeetal.2010, author = {Meister, Stefan and Al-Saadi, Aws and Franke, B{\"u}lent A. and Mahdi, Shaimaa and Kuhlow, Berndt and Voigt, Karsten and Tillack, Bernd and Richter, Harald H. and Zimmermann, Lars and Ksianzou, Viachaslau and Schrader, Sigurd and Eichler, Hans J.}, title = {Photonic crystal microcavities in SOI waveguides produced in a CMOS environment}, publisher = {Society of Photo-Optical Instrumentation Engineers (SPIE)}, url = {http://nbn-resolving.de/urn:nbn:de:kobv:526-opus4-15223}, pages = {330 -- 339}, year = {2010}, abstract = {We have investigated microcavities in Silicon-on-Insolator (SOI) waveguides. The rectangular waveguides with 500 nm width are fabricated in the 220 nm silicon device layer. The microcavities are formed by one-dimensional photonic crystals in Fabry-Perot structure directly written in the waveguides. The SOI photonic structures are produced in a CMOS environment using 248 nm DUV lithography, where the waveguides as well as the photonic crystals are created in the same step using a single mask. In order to achieve a desired spectral shape of the filter function capable for several applications, a number of different cavities were investigated, e.g. single cavities of first and higher order as well as multi-cavity filters. The experimental results are compared with simulations of photonic crystal microcavities in strip waveguides. The spectral transmission function of such filters dependent on the design parameters are calculated by an analysis based on Finite-Difference-Time-Domain (FDTD) method.}, language = {en} }