@article{LuxSiemrothSgarlataetal.2015, author = {Lux, Helge and Siemroth, Peter and Sgarlata, Anna and Prosposito, Paolo and Schubert, Markus Andreas and Casalboni, Mauro and Schrader, Sigurd}, title = {Synthesis of graphene-like transparent conductive films on dielectric substrates using a modified filtered vacuum arc system}, series = {Journal of Applied Physics}, volume = {117}, journal = {Journal of Applied Physics}, number = {19}, issn = {1089-7550}, url = {http://nbn-resolving.de/urn:nbn:de:kobv:526-opus4-9738}, year = {2015}, abstract = {Here, we present a reliable process to deposit transparent conductive films on silicon oxide, quartz, and sapphire using a solid carbon source. This layer consists of partially ordered graphene flakes with a lateral dimension of about 5 nm. The process does not require any catalytic metal and exploits a high current arc evaporation (Φ-HCA) to homogeneously deposit a layer of carbon on heated substrates. A gas atmosphere consisting of Argon or Argon/Hydrogen blend acting as a buffer influences the morphology of the growing film. scanning tunneling microscopy, transmission electron microscopy, and Raman spectra were used for a thorough characterization of the samples in order to optimize the growth parameters. The best carbon layers have a surface resistance of 5.7 × 103 Ω◻ whereas the optical transparency of the coatings is 88\% with an excellent homogeneity over areas of several cm2. Such results are compatible with most semiconductor fabrication processes and make this method very promising for various industrial applications.}, language = {en} }