@inproceedings{SteglichMaiStolareketal.2016, author = {Steglich, Patrick and Mai, Christian and Stolarek, David and Lischke, Stefan and Kupijai, Sebastian and Villringer, Claus and Pulwer, Silvio and Heinrich, Friedhelm and Bauer, Joachim and Meister, Stefan and Knoll, Dieter and Casalboni, Mauro and Schrader, Sigurd}, title = {Partially slotted silicon ring resonator covered with electro-optical polymer}, series = {Proceedings of SPIE}, booktitle = {Proceedings of SPIE}, issn = {1996-756X}, url = {http://nbn-resolving.de/urn:nbn:de:kobv:526-opus4-13771}, year = {2016}, abstract = {In this work, we present for the first time a partially slotted silicon ring resonator (PSRR) covered with an electro-optical polymer (Poly[(methyl methacrylate)-co-(Disperse Red 1 acrylate)]). The PSRR takes advantage of both a highly efficient vertical slot waveguide based phase shifter and a low loss strip waveguide in a single ring. The device is realized on 200 mm silicon-on-insulator wafers using 248 nm DUV lithography and covered with the electro-optic polymer in a post process. This silicon-organic hybrid ring resonator has a small footprint, high optical quality factor, and high DC device tunability. A quality factor of up to 105 and a DC device tunability of about 700 pm/V is experimentally demonstrated in the wavelength range of 1540 nm to 1590 nm. Further, we compare our results with state-of-the-art silicon-organic hybrid devices by determining the poling efficiency. It is demonstrated that the active PSRR is a promising candidate for efficient optical switches and tunable filters.}, language = {en} } @inproceedings{GeislerBauerHaaketal.2008, author = {Geisler, Sebastian and Bauer, Joachim and Haak, Ulrich and Stolarek, David and Schulz, K. and Wolf, H. and Meier, W. and Trojahn, M. and Matthus, E. and Beyer, Harald and Old, G. and Marschmeyer, Steffen and Kuck, B.}, title = {Double exposure technology for KrF lithography}, publisher = {Society of Photo-Optical Instrumentation Engineers (SPIE)}, url = {http://nbn-resolving.de/urn:nbn:de:kobv:526-opus4-15176}, pages = {65 -- 73}, year = {2008}, abstract = {The application of Double Exposure Lithography (DEL) would enlarge the capability of 248 nm exposure technique to smaller pitch. We will use the DEL for the integration of critical layers for dedicated applications requiring resolution enhancement into 0.13 μm BiCMOS technology. In this paper we present the overlay precision and the focus difference of 1st and 2nd exposure as critical parameters of the DEL for k1 ≤ 0.3 lithography (100 nm half pitch) with binary masks (BIM). The realization of excellent overlay (OVL) accuracy is a main key of double exposure and double patterning techniques. We show the DEL requires primarily a good mask registration, when the wafer stays in the scanner for both exposures without alignment between 1st and 2nd exposure. The exposure tool overlay error is more a practical limit for double patterning lithography (DPL). Hence we prefer the DEL for the resolution enhancement, especially if we use the KrF high NA lithography tool for 130 nm generation. Experimental and simulated results show that the critical dimension uniformity (CDU) depends strongly on the overlay precision. The DEL results show CDU is not only affected by the OVL but also by an optical proximity effect of 1st and 2nd exposure and the mask registration. The CD uniformity of DEL demands a low focus difference between 1st and 2nd exposure and therefore requires a good focus repeatability of the exposure tool. The Depth of Focus (DOF) of 490 nm at stable CD of lines was achieved for DEL. If we change the focus of one of the exposures the CD-focus performance of spaces was reduced with simultaneous line position changing. CDU vs. focus difference between 1st and 2nd exposure demands a focus repeatability <100 nm for the exposure tool. Summary, the results show DEL has the potential to be a practical lithography enhancement method for device fabrication using high NA KrF tool generation.}, language = {en} } @inproceedings{FursenkoBauerMarschmeyer2016, author = {Fursenko, Oksana and Bauer, Joachim and Marschmeyer, Steffen}, title = {3D through silicon via profile metrology based on spectroscopic reflectometry for SOI applications}, publisher = {Society of Photo-Optical Instrumentation Engineers (SPIE)}, url = {http://nbn-resolving.de/urn:nbn:de:kobv:526-opus4-15272}, pages = {268 -- 273}, year = {2016}, abstract = {Through-silicon via (TSV) technology is a key feature for 3D circuit integration. TSVs are formed by etching a vertical via and filling them with a conductive material for creation of interconnections which go through the silicon or silicon-on-insulator (SOI) wafer. The Bosch etch process on Deep Reactive Ion Etching (DRIE) is commonly used for this purpose. The etch profile defined by the critical dimensions (CDs) at the top and at the bottom, by the depth and by the scallop size on the sidewall needs to be monitored and well controlled. In this work a nondestructive 3D metrology of deeply-etched structures with an aspect ratio of more than 10 and patterns with lateral dimensions from 2 to 7 μm in SOI wafer is proposed. Spectroscopic reflectometry in the spectral range of 250-800 nm using a production metrology tool was applied. The depth determinations based on different algorithms are compared. The Pearson correlation coefficient between measured and calculated reflection is suggested as the most appropriate method. A simple method for top CD evaluation is proposed by the measurement of reflection and using the polynomial approximation of reflection versus TSV filling coefficient which is determined as ratio of CD to pitch. The 3D RCWA simulations confirm this dependence.}, language = {en} } @inproceedings{FursenkoLukosiusLupinaetal.2017, author = {Fursenko, Oksana and Lukosius, Mindaugas and Lupina, G. and Bauer, Joachim and Villringer, Claus and Mai, Andreas}, title = {Development of graphene process control by industrial optical spectroscopy setup}, publisher = {SPIE}, url = {http://nbn-resolving.de/urn:nbn:de:kobv:526-opus4-15319}, pages = {250 -- 259}, year = {2017}, abstract = {The successful integration of graphene into microelectronic devices depends strongly on the availability of fast and nondestructive characterization methods of graphene grown by CVD on large diameter production wafers [1-3] which are in the interest of the semiconductor industry. Here, a high-throughput optical metrology method for measuring the thickness and uniformity of large-area graphene sheets is demonstrated. The method is based on the combination of spectroscopic ellipsometry and normal incidence reflectometry in UV-Vis wavelength range (200-800 nm) with small light spots (~ 30 μm2) realized in wafer optical metrology tool. In the first step graphene layers were transferred on a SiO2/Si substrate in order to determine the optical constants of graphene by the combination of multi-angle ellipsometry and reflectometry. Then these data were used for the development of a process control recipe of CVD graphene on 200 mm Ge(100)/Si(100) wafers. The graphene layer quality was additionally monitored by Raman spectroscopy. Atomic force microscopy measurements were performed for micro topography evaluation. In consequence, a robust recipe for unambiguous thickness monitoring of all components of a multilayer film stack, including graphene, surface residuals or interface layer underneath graphene and surface roughness is developed. Optical monitoring of graphene thickness uniformity over a wafer has shown an excellent long term stability (s=0.004 nm) regardless of the growth of interfacial GeO2 and surface roughness. The sensitivity of the optical identification of graphene during microelectronic processing was evaluated. This optical metrology technique with combined data collection exhibit a fast and highly precise method allowing one an unambiguous detection of graphene after transferring as well as after the CVD deposition process on a Ge(100)/Si(100) wafer. This approach is well suited for industrial applications due to its repeatability and flexibility.}, language = {en} } @inproceedings{PulwerSteglichVillringeretal.2016, author = {Pulwer, Silvio and Steglich, Patrick and Villringer, Claus and Bauer, Joachim and Burger, Martin and Franz, M. and Grieshober, K. and Wirth, F. and Blondeau, J. and Rautenberg, J. and Mouti, S. and Schrader, Sigurd}, title = {Triangulation-based 3D surveying borescope}, publisher = {SPIE}, url = {http://nbn-resolving.de/urn:nbn:de:kobv:526-opus4-15307}, pages = {51 -- 56}, year = {2016}, abstract = {In this work, a measurement concept based on triangulation was developed for borescopic 3D-surveying of surface defects. The integration of such measurement system into a borescope environment requires excellent space utilization. The triangulation angle, the projected pattern, the numerical apertures of the optical system, and the viewing angle were calculated using partial coherence imaging and geometric optical raytracing methods. Additionally, optical aberrations and defocus were considered by the integration of Zernike polynomial coefficients. The measurement system is able to measure objects with a size of 50 μm in all dimensions with an accuracy of ± 5 μm. To manage the issue of a low depth of field while using an optical high resolution system, a wavelength dependent aperture was integrated. Thereby, we are able to control depth of field and resolution of the optical system and can use the borescope in measurement mode with high resolution and low depth of field or in inspection mode with low resolution and higher depth of field. First measurements of a demonstrator system are in good agreement with our simulations.}, language = {en} } @inproceedings{GeislerBauerHaaketal.2008, author = {Geisler, Sebastian and Bauer, Joachim and Haak, Ulrich and Jagdhold, Ulrich A. and Pliquett, R. and Matthus, E. and Schrader, R. and Wolf, H. and Baetz, U. and Beyer, Harald and Niehoff, Martin}, title = {Optical proximity correction for 0.13 um SiGe:C BiCMOS}, publisher = {Society of Photo-Optical Instrumentation Engineers (SPIE)}, url = {http://nbn-resolving.de/urn:nbn:de:kobv:526-opus4-15194}, pages = {376 -- 381}, year = {2008}, abstract = {We present results for a rule based optical proximity (RB-OPC) and a model based optical proximity correction (MB-OPC) for 0.13 μm SiGe:C BiCMOS technology. The technology provides integrated high performance heterojunction bipolar transistors (HBTs) with cut-off frequencies up to 300 GHz. This requires an optical proximity correction of critical layers with an excellent mask quality. This paper provides results of the MB-OPC and RB-OPC using the Mentor Calibre software in comparison to uncorrected structures (NO-OPC). We show RB- and MB-OPC methods for the shallow trench and gate layer, and the RB-OPC for the emitter window-, contact- and metal layers. We will discuss the impact of the RB- and MB-OPC rules on the process margin and yield in the 0.13 μm SiGe:C BiCMOS technology, based on CD-SEM data obtained from the evaluation of the RB- and MB-OPC corrected SRAM cells.}, language = {en} } @inproceedings{GeislerBauerHaaketal.2008, author = {Geisler, Sebastian and Bauer, Joachim and Haak, Ulrich and Stolarek, David and Schulz, K. and Wolf, H. and Meier, W. and Trojahn, M. and Matthus, E.}, title = {100 nm half-pitch double exposure KrF lithography using binary masks}, url = {http://nbn-resolving.de/urn:nbn:de:kobv:526-opus4-15169}, pages = {698 -- 705}, year = {2008}, abstract = {In this paper we investigate the process margin for the 100nm half - pitch double exposure KrF lithography using binary masks for different illumination settings. The application of Double Exposure Lithography (DEL) would enlarge the capability of 248 nm exposure technique to smaller pitch e.g. for the integration of dedicated layers into 0.13 μm BiCMOS with critical dimension (CD) requirements exceeding the standard 248 nm lithography specification. The DEL was carried out with a KrF Scanner (Nikon S207D, NALens = 0.82) for a critical dimension (CD) of 100nm half pitch. The chemical amplified positive resists SL4800 or UV2000 (Rohm \& Haas) with a thickness of 325nm were coated on a 70 nm AR10L (Rohm \& Haas) bottom anti-reflective coating (BARC). With a single exposure and using binary masks it is not possible to resolve 100nm lines with a pitch of 200 nm, due to the refraction and the resolution limit. First we investigated the effect of focus variation. It is shown that the focus difference of 1st and 2nd exposure is one critical parameter of the DEL. This requires a good focus repeatability of the scanner. The depth of focus (DOF) of 360 nm with the coherence parameter σ = 0.4 was achieved for DEL with SL4800 resist. The influence of the better resist resolution of UV2000 on the process window will be shown (DOF = 460 nm). If we change the focus of one of the exposures the CD and DOF performance of spaces is reduced with simultaneous line position changing. Second we investigated the effect of different illumination shapes and settings. The results for conventional illumination with different values for σ and annular illumination with σinner = 0.57 and σouter = 0.85 will be shown. In summary, the results show that DEL has the potential to be a practical lithography enhancement method for device fabrication using high NA KrF tool generation.}, language = {en} } @inproceedings{BauerHeinrichFursenkoetal.2017, author = {Bauer, Joachim and Heinrich, Friedhelm and Fursenko, Oksana and Marschmeyer, Steffen and Bluemich, Adrian and Pulwer, Silvio and Steglich, Patrick and Villringer, Claus and Mai, Andreas and Schrader, Sigurd}, title = {Very high aspect ratio through silicon via reflectometry}, series = {Proceedings of SPIE}, booktitle = {Proceedings of SPIE}, issn = {1996-756X}, url = {http://nbn-resolving.de/urn:nbn:de:kobv:526-opus4-13758}, year = {2017}, abstract = {Through Silicon Via (TSV) technology is a key feature of new 3D integration of circuits by creation of interconnections using vias, which go through the silicon wafer. Typically, the highly-selective Bosch Si etch process, characterized by a high etch rate and high aspect ratio and forming of scallops on the sidewalls is used. As presented in this paper, we have developed an experimental setup and a respective evaluation algorithm for the control and monitoring of very high aspect ratio TSV profiles by spectroscopic reflectometry. For this purpose square via arrays with lateral dimension from 3 to 10 μm were fabricated by a Bosch etch process and analyzed by our setup. By exploiting interference and diffraction effects of waves reflected from the top and bottom surfaces as well as from the side walls of the TSV patterns, the measurements provided etch depths, CD values and scallop periods. The results were compared with data obtained by a commercial wafer metrology tool. Aspect ratios of up to 35:1 were safely evaluable by our setup.}, language = {en} }