@inproceedings{GeislerBauerHaaketal.2008, author = {Sebastian Geisler and Joachim Bauer and Ulrich Haak and David Stolarek and K. Schulz and H. Wolf and W. Meier and M. Trojahn and E. Matthus and Harald Beyer and G. Old and Steffen Marschmeyer and B. Kuck}, title = {Double exposure technology for KrF lithography}, pages = {65 -- 73}, year = {2008}, }