@inproceedings{GeislerBauerHaaketal.2008, author = {Sebastian Geisler and Joachim Bauer and Ulrich Haak and David Stolarek and K. Schulz and H. Wolf and W. Meier and M. Trojahn and E. Matthus}, title = {100 nm half-pitch double exposure KrF lithography using binary masks}, pages = {698 -- 705}, year = {2008}, }