Thermal transient characterization methodology for single-chip and stacked structures

  • High-power semiconductor packages typically exhibit a 3D heat flow, resulting in large lateral changes in chip and case surface temperature. For single-chip devices we propose to use an unambiguous definition for the junction-to-case thermal resistance as a key parameter, based on a transient measurement technique with much higher repeatability, also for very low thermal resistances compared to aHigh-power semiconductor packages typically exhibit a 3D heat flow, resulting in large lateral changes in chip and case surface temperature. For single-chip devices we propose to use an unambiguous definition for the junction-to-case thermal resistance as a key parameter, based on a transient measurement technique with much higher repeatability, also for very low thermal resistances compared to a two-point thermal resistance measurement. The technique is illustrated on thermal transient measurements of power MOSFETs. A comparison between different thermal coupling to the ambient is used to demonstrate the method's capability to reveal even subtle internal details of the package. The concept is extended to multichip and stacked-chip structures, where transfer impedances have to be introduced. Here, the dynamic properties of the package are important and complex impedance mapping is the proper way to characterize the package.show moreshow less

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Metadaten
Author:Oliver SteffensOTHORCiDGND, Peter Szabó, Michael Lenz, Gábor Farkas
DOI:https://doi.org/10.1109/STHERM.2005.1412198
ISSN:1065-2221
Parent Title (English):Semiconductor Thermal Measurement and Management Symposium, 2005
Subtitle (English):Best Paper Award
Publisher:IEEE
Document Type:conference proceeding (article)
Language:English
Year of first Publication:2005
Release Date:2021/09/29
Tag:Assembly; Electrical resistance measurement; Impedance; MOSFETs; Measurement techniques; Semiconductor device packaging; Surface resistance; Temperature; Thermal resistance
First Page:313
Last Page:321
Konferenzangabe:IEEE Twenty First Annual IEEE 21st SEMI-THERM Symposium, San José, CA, 15-17 March 2005
Institutes:Fakultät Angewandte Natur- und Kulturwissenschaften
Fakultät Angewandte Natur- und Kulturwissenschaften / Labor Bauphysik
Publication:Externe Publikationen
research focus:Materialien und Produktion
Frontdoor-URL:https://opus4.kobv.de/opus4-oth-regensburg/2039
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