An Integrated Field Emission Electron Source on a Chip Fabricated by Laser-Micromachining and Mems Technology
- A silicon field emission electron source consisting of a cathode and a grid electrode has been fabricated by laser micromachining. The cathode features 21×21 tips on an area of 4×4 mm 2 , With a self-aligning MEMS technology for the aperture grid, a high electron transmission (99 %) was achieved. Onset voltages of 50…70 V were observed for an emission current of 1 nA. A stable emission current of 1 mA ± 1.3 % at an extraction voltage of 250 V was observed during a 30-min operation.
Author: | Matthias HausladenORCiD, Philipp Buchner, Andreas Schels, Simon Edler, Michael BachmannORCiD, Rupert SchreinerORCiDGND |
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DOI: | https://doi.org/10.1109/IVNC57695.2023.10189001 |
ISBN: | 979-8-3503-0143-4 |
Parent Title (English): | 2023 IEEE 36th International Vacuum Nanoelectronics Conference (IVNC), 10-13 July 2023, Cambridge, MA, USA |
Publisher: | IEEE |
Document Type: | conference proceeding (article) |
Language: | English |
Year of first Publication: | 2023 |
Release Date: | 2023/10/20 |
Tag: | Apertures; Field Emission; Field Emission Array; Ions; Laser-Micromachining; Lasers; Micromechanical devices; Silicon; Silicon Field Emission Array; Steady-state; Vacuum systems |
First Page: | 115 |
Last Page: | 116 |
Institutes: | Fakultät Angewandte Natur- und Kulturwissenschaften |
Fakultät Angewandte Natur- und Kulturwissenschaften / Labor Mikrosensorik | |
Begutachtungsstatus: | peer-reviewed |
research focus: | Sensorik |
Licence (German): |