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Silicon Chip Field Emission Electron Source Fabricated by Laser Micromachining

  • The components for a silicon chip electron source were fabricated by laser micromachining using pulsed laser ablation and wet chemical cleaning and etching dips. The field emission electron source consists of a silicon field emission cathode with 4 × 4 conical shaped emitters with a height of 250 μm and a tip radius of about 50 nm, a 50 μm thick laser-structured mica spacer, and a silicon grid electrode with a grid periodicity of 200 μm and a bar width of 50 μm. These three components are combined to a single chip with the size of 14 × 10 mm2 and the thickness of 1 mm to form the electron source. Several of these devices were characterized in ultrahigh vacuum. Onset voltages of about 165 V and cathode currents of about 15 μA for voltages lower than 350 V were observed. Operating the electron source with an anode voltage of 500 V and an extraction grid voltage of 300 V yielded a cathode current of 4.5 μA ± 8.9%, an anode current of 4.0 μA ± 9.6%, and a corresponding grid transmittance of 89%. Regulating the anode current by the extraction grid voltage, an extremely stable anode current of 5.0 μA ± 0.017% was observed. A long-term measurement over 120 h was performed, and no significant degradation or failure was observed.

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Metadaten
Author:Christoph LangerORCiD, Vitali Bomke, Matthias HausladenORCiD, Robert Damian ŁawrowskiORCiD, Christian PrommesbergerORCiD, Michael BachmannORCiD, Rupert SchreinerORCiDGND
DOI:https://doi.org/10.1116/1.5134872
Parent Title (German):Journal of Vacuum Science & Technology B
Publisher:AIP Publishing
Document Type:Article
Language:English
Year of first Publication:2020
Release Date:2021/01/29
Tag:Electrical properties and parameters; Electron sources; Etching; Field emitter arrays; Laser ablation; Laser micromachining; Silicon chip; Triodes; Ultra-high vacuum
Volume:38
Issue:1
Article Number:013202
Institutes:Fakultät Angewandte Natur- und Kulturwissenschaften
Fakultät Angewandte Natur- und Kulturwissenschaften / Labor Mikrosensorik
Begutachtungsstatus:peer-reviewed
research focus:Produktion und Systeme
Licence (German):Keine Lizenz - Es gilt das deutsche Urheberrecht: § 53 UrhG