TY - JOUR A1 - Krenzer, Boris A1 - Hanisch-Blicharski, Anja A1 - Schneider, Paul A1 - Payer, Thomas A1 - Möllenbeck, Simone A1 - Osmani, O. A1 - Kammler, Martin A1 - Meyer, R. A1 - Horn-von Hoegen, Michael T1 - Phonon confinement effects in ultrathin epitaxial bismuth films on silicon studied by time-resolved electron diffraction JF - Physical Review B N2 - The transient temperature evolution of ultrathin bismuth films, epitaxially grown on a silicon single crystal, upon femtosecond laser excitation is studied by time-resolved electron diffraction. The exponential decay of the film temperature is explained by phonon reflection at the interface, which results in a strongly reduced thermal conduction in the cross plane of the layered system. The thermal boundary conductance is found to be as low as 1273 W/(K cm2). Model calculations, including phonon confinement effects, explain the linear relationship between the observed film-temperature decay constant and the film thickness. Even for 2.5 nm thin films the phonon transmission probability across the interface is given by bulk properties. Our simulations show that phonon confinement effects are negligible for bismuth-film thicknesses larger than 1 nm. Y1 - 2009 U6 - https://doi.org/10.1103/PhysRevB.80.024307 VL - 80 IS - 2 PB - APS ER - TY - JOUR A1 - Klein, C. A1 - Nabbefeld, T. A1 - Hattab, H. A1 - Meyer, D. A1 - Jnawali, G. A1 - Kammler, Martin A1 - Meyer zu Heringdorf, Frank-Joachim A1 - Golla-Franz, A. A1 - Müller, B. H. A1 - Schmidt, Thomas A1 - Henzler, M. A1 - Horn-von Hoegen, Michael T1 - Lost in reciprocal space? Determination of the scattering condition in spot profile analysis low-energy electron diffraction JF - Review of scientific instruments N2 - The precise knowledge of the diffraction condition, i.e., the angle of incidence and electron energy, is crucial for the study of surface morphology through spot profile analysis low-energy electron diffraction (LEED). We demonstrate four different procedures to determine the diffraction condition: employing the distortion of the LEED pattern under large angles of incidence, the layer-by-layer growth oscillations during homoepitaxial growth, a G(S) analysis of a rough surface, and the intersection of facet rods with 3D Bragg conditions. Y1 - 2011 U6 - https://doi.org/10.1063/1.3554305 VL - 82 IS - 3 PB - American Institute of Physics ER - TY - JOUR A1 - Schmidt, Thomas A1 - Kröger, Roland A1 - Clausen, T. A1 - Falta, J. A1 - Janzen, Andreas A1 - Kammler, Martin A1 - Kury, P. A1 - Zahl, P. A1 - Horn-von Hoegen, Michael T1 - Surfactant-mediated epitaxy of Ge on Si(111): Beyond the surface JF - Applied Physics Letters N2 - For a characterization of interface and “bulk” properties of Ge films grown on Si(111) by Sb surfactant-mediated epitaxy, grazing incidence x-ray diffraction and transmission electron microscopy have been used. The interface roughness, defect structure, and strain state have been investigated in dependence of film thickness and growth temperature. For all growth parameters, atomically smooth interfaces are observed. For thin Ge layers, about 75% of the strain induced by the lattice mismatch is relaxed by misfit dislocations at the Ge/Si interface. Only a slight increase of the degree of relaxation is found for thicker films. At growth temperatures below about 600 °C, the formation of twins is observed, which can be avoided at higher temperatures. Y1 - 2005 U6 - https://doi.org/10.1063/1.1882760 VL - 86 IS - 11 PB - AIP ER - TY - JOUR A1 - Frigge, Tim A1 - Wall, S. A1 - Krenzer, Boris A1 - Wippermann, St. A1 - Sanna, Simone A1 - Klasing, Friedrich A1 - Hanisch-Blicharski, Anja A1 - Kammler, Martin A1 - Schmidt, Wolf Gero A1 - Horn-von Hoegen, Michael T1 - Abstract - A Reply to the Comment by H. Shim et al. JF - Physical review letters Y1 - 2013 U6 - https://doi.org/10.1103/PhysRevLett.111.149602 VL - 111 IS - 14 PB - American Physical Society ER - TY - JOUR A1 - Chee, See Wee A1 - Kammler, Martin A1 - Graham, Jeremy A1 - Ross, Frances M. A1 - Hull, Robert T1 - Direct Imaging of Microstructural Changes in Si Induced by FIB-Patterning with Si ++ and Ga + Ions JF - Microscopy and Microanalysis Y1 - 2011 U6 - https://doi.org/10.1017/S1431927611004156 VL - 17 IS - S2 SP - 656 EP - 657 PB - Cambridge University Press ER - TY - JOUR A1 - Wolfgramm, Alex A1 - Abb, Valerius A1 - Samp, Artur A1 - Samp, Rafal A1 - Hoffmann, Jens Christoph A1 - Müller, Rainer A1 - Kammler, Martin T1 - Structural and functional evolution of HKUST-1 nanoparticles induced by ball milling JF - Next Materials N2 - In this study, the effect of post-synthetic ball milling on the structural and functional properties of as-synthesized nanoparticles of the copper-based metal-organic framework (MOF) HKUST-1 was investigated for the first time. Nanoparticles were synthesized using sodium formate as a capping agent. The crystalline particles were subjected to a controlled ball milling process, which induced significant structural changes. Powder X-ray diffraction (PXRD) revealed a reduction in crystallite size from 91 nm to 21 nm and the introduction of microstrain, partially disrupting the MOF's long-range crystalline order, as evidenced by peak broadening and the diminished intensity of high-angle reflections. Particle morphology pre- and post-milling was further studied with scanning electron microscopy (SEM) imaging, verifying a narrow particle size distribution of ± 22 nm after milling. Fourier-transform infrared spectroscopy (FTIR) indicated protonation of carboxylate groups in the larger pores of the framework, likely due to moisture incorporation during milling. Brunauer-Emmett-Teller (BET) surface area analysis showed a substantial decrease in specific surface area from 521 m²/g to 226 m²/g, suggesting a partial collapse of the porous framework. We discuss the applicability of ball milling as a versatile means of post-synthetic approach to reduce MOF particle sizes, a key element in the preparation of MOF-based thin films using inks or polymers. KW - Ball milling KW - Copper-based metal-organic framework KW - HKUST-1 KW - Nitrogen adsorption Y1 - 2026 U6 - https://doi.org/10.1016/j.nxmate.2025.101544 N1 - Corresponding author der OTH Regensburg: Alex Wolfgramm VL - 10 PB - Elsevier ER -