TY - CHAP A1 - Hausler, Peter A1 - Roth, Carina A1 - Aumer, F. A1 - Vitzthumecker, Thomas A1 - Genslein, Christa A1 - Hirsch, Thomas A1 - Bierl, Rudolf T1 - Miniaturisiertes Sensorsystem zur Oberflächenplasmonenresonanzspektroskopie T2 - 118. Jahrestagung der deutschen Gesellschaft für angewandte Optik (DGaO), 6.-10. Juni 2017, Dresden N2 - Die Oberflächenplasmonenresonanzspektroskopie (SPR) wird aufgrund ihrer Vorzüge der zerstörungs- und markierungsfreien Messung, sowie der hohen Sensitivität sehr erfolgreich im Labormaßstab eingesetzt. Aufgrund der hohen Kosten geschieht dies bislang hauptsächlich in der Bioanalytik und dem Wirkstoffscreening. Gezeigt wird ein Ansatz, mit dem diese Technologie auf ein ultrakompaktes, kostengünstiges Sensorsystem übertragen wird, welches in der Lage ist, hoch-sensitiv Änderungen im Brechungsindex von 10-6 Einheiten (RIU) zu detektieren. Für Wasser bewirkt eine Temperaturschwankung von 1 K bereits eine Änderung von 1 mRIU. Daher wird durch ein integriertes Referenzsystem, sowie die Miniaturisierung erreicht, dass das System gegenüber Temperaturschwankungen, weitestgehend stabil ist. In dem MOEMS wird anstatt der konventionellen 1-Punkt bzw. 2-Punkt Messung ein bildgebendes Verfahren angewendet. Die Sensorfläche von 15 x 15 mm wird dabei mit einem handelsüblichen 4 Mio. Pixel CMOS Sensor ausgewertet. Um verlässliche Datenpunkte zu erhalten benötigt man eine Fläche von 10 x 10 Pixel. Demzufolge können auf dem Sensor theoretisch bis zu 40.000 Sensorspots parallel ausgewertet werden. KW - Messtechnik KW - Optische Systeme KW - Spektroskopie Y1 - 2017 ER - TY - CHAP A1 - Hausler, Peter A1 - Genslein, Christa A1 - Roth, Carina A1 - Vitzthumecker, Thomas A1 - Hirsch, Thomas A1 - Bierl, Rudolf T1 - Miniaturized Surface Plasmon Resonance based Sensor System T2 - Proceedings of the 6th International Conference on Photonics, Optics and Laser Technology - PHOTOPTICS, Funchal, Madeira, Portugal N2 - We describe the miniaturization of the Surface Plasmon Resonance (SPR) technology which mainly finds its applications in pharmaceutical screening and biotechnology so far. SPR spectroscopy is a label-free, non-destructive and highly sensitive measurement principle detecting changes in the refractive index in striking distance to a gold surface. A transfer of this technology to a miniaturized sensor will broaden the range of possible applications. A promising feature which is included in the miniaturized system is the angle-dependent recording of the SPR signals without moving parts. Commercial SPR assays are mainly working with a small number of sensing spots. In contrast, the SPR imaging system shown here will allow to use an array of many sensing spots. In combination with chemical receptors designed as an artificial nose, the simultaneous detection of many analytes is envisioned for future applications. KW - Surface Plasmon Resonance Spectroscopy KW - Sensor KW - SPR-imaging KW - Miniaturization KW - Micro-Opto-Electro-Mechanical Systems Y1 - 2018 SN - 978-989-758-286-8 U6 - https://doi.org/10.5220/0006555400630066 SP - 63 EP - 66 PB - SciTePress ER - TY - JOUR A1 - Genslein, Christa A1 - Hausler, Peter A1 - Kirchner, Eva-Maria A1 - Bierl, Rudolf A1 - Baeumner, Antje J. A1 - Hirsch, Thomas T1 - Graphene-enhanced plasmonic nanohole arrays for environmental sensing in aqueous samples JF - Beilstein Journal of Nanotechnology N2 - The label-free nature of surface plasmon resonance techniques (SPR) enables a fast, specific, and sensitive analysis of molecular interactions. However, detection of highly diluted concentrations and small molecules is still challenging. It is shown here that in contrast to continuous gold films, gold nanohole arrays can significantly improve the performance of SPR devices in angle-dependent measurement mode, as a signal amplification arises from localized surface plasmons at the nanostructures. This leads consequently to an increased sensing capability of molecules bound to the nanohole array surface. Furthermore, a reduced graphene oxide (rGO) sensor surface was layered over the nanohole array. Reduced graphene oxide is a 2D nanomaterial consisting of sp2-hybridized carbon atoms and is an attractive receptor surface for SPR as it omits any bulk phase and therefore allows fast response times. In fact, it was found that nanohole arrays demonstrated a higher shift in the resonance angle of 250–380% compared to a continuous gold film. At the same time the nanohole array structure as characterized by its diameter-to-periodicity ratio had minimal influence on the binding capacity of the sensor surface. As a simple and environmentally highly relevant model, binding of the plasticizer diethyl phthalate (DEP) via π-stacking was monitored on the rGO gold nanohole array realizing a limit of detection of as low as 20 nM. The concentration-dependent signal change was studied with the best performing rGO-modified nanohole arrays. Compared to continuous gold films a diameter-to-periodicity ratio (D/P) of 0.43 lead to a 12-fold signal enhancement. Finally, the effect of environmental waters on the sensor was evaluated using samples from sea, lake and river waters spiked with analytically relevant amounts of DEP during which significant changes in the SPR signal are observed. It is expected that this concept can be successfully transferred to enhance the sensitivity in SPR sensors. KW - diethyl phthalate KW - environmental sensing KW - nanohole array KW - nanosphere lithography KW - surface plasmon resonance Y1 - 2016 U6 - http://nbn-resolving.de/urn/resolver.pl?urn:nbn:de:bvb:355-epub-398623 IS - 7 SP - 1564 EP - 1573 ER - TY - JOUR A1 - Sokolowski-Tinten, Klaus A1 - Blome, Christian A1 - Blums, Juris A1 - Dietrich, Clemens A1 - Tarsevitch, Alexander A1 - Horn-von Hoegen, Michael A1 - von der Linde, Dietrich A1 - Cavalleri, Andrea A1 - Kammler, Martin A1 - Uschmann, Ingo A1 - Foerster, Eckhart T1 - Femtosecond X-ray Diffraction Study of Large Amplitude Coherent Optical Phonons in Laser-Excited Bismuth JF - Conference on Lasers and Electro-Optics, 1–6 June 2003, Baltimore, Maryland N2 - Femtosecond time-resolved X-ray diffraction was used to directly study optical phonons in laser-excited Bismuth. A periodic modulation of the diffraction efficiency reveals initially coherent lattice distortions with atomic displacements of nearly 10% of the nearest- neighbor-distance. Y1 - 2003 UR - https://opg.optica.org/abstract.cfm?uri=cleo-2003-CMZ6 PB - Optical Society of America ER - TY - CHAP A1 - Hausler, Peter A1 - Genslein, Christa A1 - Roth, Carina A1 - Hirsch, Thomas A1 - Bierl, Rudolf T1 - Mikro-Opto-Elektro-Mechanisches Sensorsystem zur Oberflächenplasmonenresonanzspektroskopie T2 - MikroSystemTechnik Kongress 2017 : MEMS, Mikroelektronik, Systeme 23.-25. Oktober 2017 in München N2 - Gezeigt wird die Miniaturisierung eines Messsystems für Oberflächenplasmonenresonanzspektroskopie (SPR), einer markierungs-, sowie zerstörungsfreien als auch hoch sensitiven Technologie. Aufgrund der hohen Kosten klassischer SPR-Geräte wird sie bisher jedoch vornehmlich in der Bio- und Medizintechnik eingesetzt. Das Messprinzip ermöglicht die Erfassung von Brechungsindexänderungen nahe einer Oberfläche. Der Transfer dieser Technologie von Laborgeräten hin zu einem miniaturisierten Sensorsystem senkt die Kosten, macht das System robuster und ermöglicht so ein wesentlich breiteres Anwendungsspektrum. Ein sehr vielversprechendes Merkmal des hier vorgestellten Systems ist die Möglichkeit den SPR-Effekt winkelabhängig zur Lichtquelle ohne bewegliche Bauteile zu verfolgen. The miniaturization of Surface Plasmon Resonance (SPR) technology, which mainly finds its applications in pharmaceutical screening and biotechnology so far, is described. SPR spectroscopy is a label-free, non destructive and highly sensitive measurement principle which is capable of detecting changes in the refractive index in striking distance to a gold surface. A transfer of this technology to a miniaturized sensor will broaden the range of possible applications. A promising feature which is included in the miniaturized system is the angle-dependent recording of the SPR signals without moving parts. KW - Bewegungselement KW - Biotechnik KW - Brechungsindex KW - Goldoberfläche KW - Laborgerät KW - Lichtquelle KW - Medizintechnik KW - Messprinzip KW - Messsystem KW - Miniaturisierung KW - Oberflächenplasmon KW - Oberflächenplasmonenresonanzspektroskopie KW - pharmazeutisches Screening KW - Sensorsystem KW - Spektroskopie Y1 - 2017 SN - 978-3-8007-4491-6 IS - CD-ROM SP - 645 EP - 647 PB - VDE-Verlag CY - Berlin ER - TY - JOUR A1 - Lindner, Matthias A1 - Pipa, Andrei V. A1 - Karpen, Norbert A1 - Hink, Rüdiger A1 - Berndt, Dominik A1 - Foest, Rüdiger A1 - Bonaccurso, Elmar A1 - Weichwald, Robert A1 - Friedberger, Alois A1 - Caspari, Ralf A1 - Brandenburg, Ronny A1 - Schreiner, Rupert T1 - Icing Mitigation by MEMS-Fabricated Surface Dielectric Barrier Discharge JF - Applied Sciences N2 - Avoiding ice accumulation on aerodynamic components is of enormous importance to flight safety. Novel approaches utilizing surface dielectric barrier discharges (SDBDs) are expected to be more efficient and effective than conventional solutions for preventing ice accretion on aerodynamic components. In this work, the realization of SDBDs based on thin-film substrates by means of micro-electro-mechanical-systems (MEMS) technology is presented. The anti-icing performance of the MEMS SDBDs is presented and compared to SDBDs manufactured by printed circuit board (PCB) technology. It was observed that the 35 mu m thick electrodes of the PCB SDBDs favor surface icing with an initial accumulation of supercooled water droplets at the electrode impact edges. This effect was not observed for 0.3 mu m thick MEMS-fabricated electrodes indicating a clear advantage for MEMS-technology SDBDs for anti-icing applications. Titanium was identified as the most suitable material for MEMS electrodes. In addition, an optimization of the MEMS-SDBDs with respect to the dielectric materials as well as SDBD design is discussed. KW - aerospace engineering KW - anti-icing KW - DBD PLASMA ACTUATORS KW - EXCITATION KW - FLOW-CONTROL KW - low-temperature plasma KW - MEMS KW - SEPARATION CONTROL KW - SDBD Y1 - 2021 U6 - https://doi.org/10.3390/app112311106 N1 - Corresponding author: Matthias Lindner VL - 11 IS - 23 SP - 1 EP - 17 PB - MDPI CY - Basel ER - TY - CHAP A1 - Genslein, Christa A1 - Hauser, Peter A1 - Kirchner, Eva-Maria A1 - Bierl, Rudolf A1 - Baeumner, Antje J. A1 - Hirsch, Thomas T1 - Detection of small molecules with surface plasmon resonance by synergistic plasmonic effects of nanostructured surfaces and graphene T2 - SPIE Proceedings, Plasmonics in Biology and Medicine XIV, 2017, San Francisco, California N2 - Surface plasmon resonance depends on the dielectric medium at the vicinity and makes it a quasi-universal detector. Therefore, and due to the label-free nature, SPR is a widely used sensing tool for real‐time monitoring molecular interactions of various analytes. However, detection of highly diluted analytes and small molecules (< 400 Da) is still challenging. Gold nanohole arrays provide plasmonic hotspots with improved surface sensitivity and 2D carbon nanomaterials enable binding near the surface. Both effects together are promising in the development of SPR sensors for the efficient determination of small molecules. Graphene is known for efficient binding of molecules with delocalized aromatic π-systems. Additionally, the electromagnetic field is locally enhanced and modulated by the interaction of graphene photonics with the plasmonics of metal nanostructures. The advantages of chemical vapor deposition (CVD) graphene over reduced graphene oxide (rGO) is illustrated by a proof of concept study. In comparison to substrates consisting of a continuous film the surface sensitivity is enhanced for a nanohole arrays and further improved for CVD graphene functionalization in contrast to rGO. The feasibility of the sensor was demonstrated for the detection of adenine down to a concentration of 0.9 μM. Y1 - 2017 U6 - https://doi.org/10.1117/12.2252256 VL - 10080 IS - 1008001F ER - TY - CHAP A1 - Hausler, Peter A1 - Holler, Sven A1 - Hirsch, Thomas A1 - Bierl, Rudolf T1 - High integrated miniaturized sensor based on Surface Plasmon Resonance T2 - International Biosensor Conference, 11th Workshop on Biosensors & Bioanalytical Microtechniques in Environmental, Food & Clinical Analysis, BBMEC 11, 26.-30. September 2015, Regensburg, Germany Y1 - 2015 ER - TY - CHAP A1 - Hausler, Peter A1 - Holler, Sven A1 - Hirsch, Thomas A1 - Bierl, Rudolf T1 - Miniaturisierte Oberflächenplasmonenresonanz Sensorplattform T2 - MEMS, Mikroelektronik, Systeme, MikroSystemTechnik Kongress 2015, 26.- 28. Oktober 2015, Karlsruhe, proceedings Y1 - 2015 SN - 978-3-8007-4100-7 PB - VDE Verlag CY - Berlin ER - TY - JOUR A1 - Wall, Simone A1 - Krenzer, Boris A1 - Wippermann, Stefan A1 - Sanna, Simone A1 - Klasing, Friedrich A1 - Hanisch-Blicharski, Anja A1 - Kammler, Martin A1 - Schmidt, Wolf Gero A1 - Horn-von Hoegen, Michael T1 - Atomistic picture of charge density wave formation at surfaces JF - Physical review letters N2 - We used ultrafast electron diffraction and density-functional theory calculations to gain insight into the charge density wave (CDW) formation on In/Si(111). Weak excitation by a femtosecond-laser pulse results in the melting of the CDW. The immediate freezing is hindered by a barrier for the motion of atoms during the phase transition: The melted CDW constitutes a long-lived, supercooled phase and is strong evidence for a first-order transition. The freezing into the CDW is triggered by preexisting adsorbates. Starting at these condensation nuclei, the CDW expands one dimensionally on the In/Si(111) surface, with a constant velocity of more than 80 m/s. Y1 - 2012 U6 - https://doi.org/10.1103/PhysRevLett.109.186101 VL - 109 IS - 18 PB - APS ER - TY - JOUR A1 - Frigge, Tim A1 - Kalus, Annika A1 - Klasing, Friedrich A1 - Kammler, Martin A1 - Hanisch-Blicharski, Anja A1 - Horn-von Hoegen, Michael T1 - Nanoscale Heat Transport in Self-Organized Ge Clusters on Si(001) JF - MRS Online Proceedings Library N2 - Ultrafast time resolved transmission electron diffraction (TED) in a reflection geometry was used to study the cooling behavior of self-organized, well defined nanoscale germanium hut and dome clusters on Si(001). The clusters were heated in a pump-probe scheme by fs-laser pulses. The resulting transient temperature rise was then determined from the drop in diffraction intensity caused by the Debye-Waller effect. From a cooling time of τ=177 ps we estimated a strongly reduced heat transfer compared with homogeneous films of equivalent thickness. Y1 - 2012 U6 - https://doi.org/10.1557/opl.2013.148 SP - 45 EP - 50 PB - Springer ER - TY - JOUR A1 - Möllenbeck, Simone A1 - Hanisch-Blicharski, Anja A1 - Schneider, Paul A1 - Ligges, Manuel A1 - Zhou, Ping A1 - Kammler, Martin A1 - Krenzer, Boris A1 - Horn-von Hoegen, Michael T1 - Ultra-fast Time-Resolved Electron Diffraction of Strongly Driven Phase Transitions on Silicon Surfaces JF - MRS Online Proceedings Library N2 - The dynamics of strongly driven phase transitions at surfaces are studied by ultra-fast time-resolved reflection high energy electron diffraction. The surfaces are excited by an intense fs-laser pulse (pump) and probed by an ultra-short electron pulse with variable time delay. The order-disorder phase transition from a c(4 × 2) to a(2 × 1) of the bare Si(001) surface shows a transient decrease of the intensity of the c(4 × 2) spots which recovers on a time scale of a few hundred picoseconds indicating the excitation of the phase transition. On Si(111) a monolayer of Indium induces a (4 × 1) reconstruction which undergoes a Peierls like phase transition to a (8 × "2") reconstruction below 100 K. Upon laser excitation with a fluence of 3.4 mJ/cm 2 at a temperature of 72 K the phase transition was strongly driven. The (8 × "2")-diffraction spots instantaneously disappears, while the intensity of the (4 × 1)-spots increases. This increase of the (4 × 1) spot intensity excludes an explanation by the Debye-Waller-Effect and is evidence for a true structural phase transition at a surface. © 2010 Materials Research Society. Y1 - 2009 U6 - https://doi.org/10.1557/PROC-1230-MM03-09 PB - Springer ER - TY - JOUR A1 - Lu, Wei A1 - Nicoul, Matthieu A1 - Shymanovich, Uladzimir A1 - Tarsevitch, Alexander A1 - Kammler, Martin A1 - Horn-von Hoegen, Michael A1 - von der Linde, Dietrich A1 - Sokolowski-Tinten, Klaus T1 - Extreme Phonon Softening in Laser-excited Bismuth - Towards an Inverse Peierls-transition JF - MRS Online Proceedings Library N2 - Large amplitude coherent optical phonons have been investigated in laser-excited Bismuth by means of femtosecond time-resolved X-ray diffraction. For absorbed laser fluences above 2 mJ/cm2, the experimental data reveal an extreme softening of the excited A1g-mode down to frequencies of about 1 THz, only 1/3 of the unperturbed A1g-frequency. At even stronger excitation the measured diffraction signals no longer exhibit an oscillatory behavior presenting strong indication that upon intense laser-excitation the Peierls-distortion, which defines the equilibrium structure of Bismuth, can be transiently reversed. Y1 - 2009 U6 - https://doi.org/10.1557/PROC-1230-MM03-05 VL - 1230 PB - Springer ER - TY - JOUR A1 - Hanisch-Blicharski, Anja A1 - Krenzer, Boris A1 - Möllenbeck, Simone A1 - Ligges, Manuel A1 - Zhou, Ping A1 - Kammler, Martin A1 - Horn-von Hoegen, Michael T1 - Transient Cooling of Ultrathin Epitaxial Bi(111)-Films on Si(111) Upon Femtosecond Laser Excitation Studied by Ultrafast Reflection High Energy Electron Diffraction JF - MRS Online Proceedings Library N2 - With time resolved ultrafast electron diffraction the cooling process across the interface between a thin film and the underlying substrate was studied after excitation with short laser pulses. From the exponential decay of the surface temperature evolution a thermal boundary conductance of 1430 W/(cm2K) is determined for a 9.7 nm thin Bi(111) film on Si(111). A linear dependence between laser fluence and initial temperature rise was measured for film-thicknesses between 2.5 nm and 34.5 nm. The ratio of initial temperature rise and laser fluence for different film-thicknesses is compared to a model taking multilayer optics into account. The data agree well with this model. Y1 - 2009 U6 - https://doi.org/10.1557/PROC-1172-T04-08 SP - 1 EP - 6 PB - Springer ER - TY - JOUR A1 - Al-Falou, A. A. A1 - Kammler, Martin A1 - Horn-von Hoegen, Michael T1 - Strain state analysis of hetero-epitaxial systems JF - Europhysics Letters N2 - We present a new method to analyze the strain state of epitaxial hetero structures by high-resolution spot profile analysis low-energy electron diffraction. From the variation of the spot profiles with the vertical scattering vector we determine the hetero film roughness, the change of interlayer spacing due to tetragonal distortion, and the variation of the interlayer distance due to partial relaxation of the strained rough film. The practical implementation of this method is simple and can be used to determine the onset of strain-relieving defects during the growth process. Y1 - 2005 U6 - https://doi.org/10.1209/epl/i2004-10399-6 VL - 69 IS - 4 SP - 570 EP - 576 PB - IOP ER - TY - JOUR A1 - Kammler, Martin A1 - Horn-von Hoegen, Michael T1 - Low energy electron diffraction of epitaxial growth of bismuth on Si(111) JF - Surface Science N2 - The epitaxial growth of Bi on Si(1 1 1) studied by spot profile analyzing low energy electron diffraction shows for low coverage rotationally disordered Bi cluster with preferred orientations following the threefold symmetry of the Si substrate. With further deposition the Bi cluster coalesces and the surface orientation changes from the pseudo cubic Bi(1 1 0) surface orientation of the Bi cluster into the hexagonal Bi(1 1 1) surface of the resulting Bi film. KW - Bismuth KW - Epitaxial growth KW - LEED KW - low energy electron diffraction KW - Silicon KW - Structural transition Y1 - 2005 U6 - https://doi.org/10.1016/j.susc.2004.11.033 VL - 576 IS - 1-3 SP - 56 EP - 60 PB - Elsevier ER - TY - CHAP A1 - Siders, C. W. A1 - Cavalleri, Andrea A1 - Tóth, Csaba A1 - Wilson, K. R. A1 - Squier, Jeff A. A1 - Barty, C. P. J. A1 - Kammler, Martin A1 - Sokolowski-Tinten, Klaus A1 - Horn-von Hoegen, Michael A1 - von der Linde, D. T1 - Femtosecond X-ray diffraction of short-pulse irradiated semiconductors T2 - Summaries of Papers Presented at the Lasers and Electro-Optics. CLEO '02. Technical Diges, 24-24 May 2002, Long Beach, CA, USA N2 - Summary form only given, as follow. Ultrafast optical-pump, X-ray diffraction probe experiments are providing new ways to study transient processes including the direct observation of the atomic motion by which many solid-state processes and chemical and biochemical reactions take place. Current table-top-terawatt femtosecond laser systems provide an attractive source of few-hundred femtosecond duration bursts of angstrom-scale X-ray radiation with fluxes comparable to standard rotating anode sources. Their compact size enables time resolved structural dynamics to be studied in the small laboratory with temporal resolution better than typical molecular vibrational periods. Ultrafast structural dynamics in crystalline samples are readily studied with such systems and experiments to be discussed in this talk include ultrafast non-thermal solid-to-liquid transition in thin single-crystal Ge-111 films grown on Si-111 substrates; ultrafast non-thermal solid-to-solid transitions in bulk vanadium dioxide from a low temperature insulating phase to a high temperature metallic phase; and harmonic and anharmonic coherent acoustic dynamics in layered Ge-111/Si-111 and bulk GaAs-111 samples. Future improvements in high-average power short-pulse lasers will enable the study of a wider class of materials such as amorphous solids or liquid-phase dynamics of simple molecules, while proposed 4th generation light sources based upon single-pass X-ray free-electron lasers will permit singleshot structural determination of complex biomolecules. KW - high-speed techniques KW - X-ray diffraction KW - laser beam effects KW - semiconductor materials KW - solid-liquid transformations KW - solid-state phase transformations KW - metal-insulator transition Y1 - 2002 U6 - https://doi.org/10.1109/CLEO.2002.1033997 SP - 297 EP - 298 PB - IEEE ER - TY - JOUR A1 - Sokolowski-Tinten, Klaus A1 - Blome, Christian A1 - Blums, Juris A1 - Cavalleri, Andrea A1 - Dietrich, Clemens A1 - Tarasevitch, Alexander A1 - Uschmann, Ingo A1 - Förster, Eckhard A1 - Kammler, Martin A1 - Horn-von Hoegen, Michael A1 - von der Linde, Dietrich T1 - Femtosecond X-ray measurement of coherent lattice vibrations near the Lindemann stability limit JF - Nature N2 - The study of phase-transition dynamics in solids beyond a time-averaged kinetic description requires direct measurement of the changes in the atomic configuration along the physical pathways leading to the new phase. The timescale of interest is in the range 10(-14) to 10(-12) s. Until recently, only optical techniques were capable of providing adequate time resolution, albeit with indirect sensitivity to structural arrangement. Ultrafast laser-induced changes of long-range order have recently been directly established for some materials using time-resolved X-ray diffraction. However, the measurement of the atomic displacements within the unit cell, as well as their relationship with the stability limit of a structural phase, has to date remained obscure. Here we report time-resolved X-ray diffraction measurements of the coherent atomic displacement of the lattice atoms in photoexcited bismuth close to a phase transition. Excitation of large-amplitude coherent optical phonons gives rise to a periodic modulation of the X-ray diffraction efficiency. Stronger excitation corresponding to atomic displacements exceeding 10 per cent of the nearest-neighbour distance-near the Lindemann limit-leads to a subsequent loss of long-range order, which is most probably due to melting of the material. Y1 - 2003 U6 - https://doi.org/10.1038/nature01490 VL - 422 IS - 6929 SP - 287 EP - 289 PB - Springer ER - TY - JOUR A1 - Hild, R. A1 - Seifert, C. A1 - Kammler, Martin A1 - Meyer zu Heringdorf, Frank-Joachim A1 - Horn-von Hoegen, Michael A1 - Zhachuk, R.A A1 - Olshanetsky, B.Z T1 - Kinetics of Au induced faceting of vicinal Si(111) JF - Surface Science N2 - Au induced faceting of vicinal Si(1 1 1) has been studied during adsorption at elevated temperature by spot profile analyzing of low energy electron diffraction and after quenching to room temperature by scanning tunneling microscopy. On the surfaces inclined towards five different types of facets form with increasing Au coverage at adsorption temperatures Tads below 800 °C. They are (4 4 3), (7 7 5), (5 5 3), a stepped (2 2 1), and the (3 3 1) facets. Atomic models for the (5 5 3) and (7 7 5) facet planes are proposed on the basis of high resolution STM images. At C we found the formation of an ordered step train which covers the entire surface. With further increasing Au coverage the stepped surface decomposes again into (1 1 1) terraces and step bunches. Driving force is the formation of the Si(1 1 1)-(5×2)–Au reconstruction. KW - Low energy electron diffraction (LEED) KW - Scanning tunneling microscopy KW - Silicon KW - Gold KW - Faceting KW - Adsorption kinetics KW - Step formation and bunching Y1 - 2002 U6 - https://doi.org/10.1016/S0039-6028(02)01666-7 VL - 512 IS - 1-2 SP - 117 EP - 127 PB - Elsevier ER - TY - JOUR A1 - Sokolowski-Tinten, Klaus A1 - Horn-von Hoegen, Michael A1 - von der Linde, D. A1 - Cavalleri, Andrea A1 - Siders, C. W. A1 - Brown, F. L. H. A1 - Leitner, D. M. A1 - Tóth, Csaba A1 - Squier, Jeff A. A1 - Barty, C. P. J. A1 - Wilson, K. R. A1 - Kammler, Martin T1 - Transient lattice dynamics in fs-laser-excited semiconductors probed by ultrafast X-ray diffraction JF - Journal de Physique IV N2 - A study of lattice dynamics in fs-laser-excited crystalline bulk Ge and Ge/Si-heterostructures, using time-resolved x-ray diffraction, was presented. Fast energy transport deep into the bulk of the material, coherent acoustic phonon dynamics, lattice anharmonicity, and vibrational transport across a buried interfaces were observed. Graphs showing time-dependent shifts of the centroid of the measured rocking curves in the Ge-overlayer and in the Si-substrate for different fluences, were presented. Y1 - 2001 U6 - https://doi.org/10.1051/jp4:2001290 VL - 11 IS - Pr2 SP - 473 EP - 477 PB - EDP ER - TY - JOUR A1 - Sokolowski-Tinten, Klaus A1 - Cavalleri, Andrea A1 - Siders, C. W. A1 - Brown, F. L. H. A1 - Leitner, D. M. A1 - Tóth, Csaba A1 - Kammler, Martin A1 - Horn-von Hoegen, Michael A1 - von der Linde, D. A1 - Squier, Jeff A. A1 - Barty, C. P. J. A1 - Wilson, K. R. T1 - Time-resolved x-ray diffraction study of ultrafast acoustic phonon dynamics in Ge/Si-heterostructures JF - Chemical Physics N2 - Using time-resolved x-ray diffraction the ultafast strain dynamics in fs-laserexcited Ge/Si-heterostructures has been studied. A fluence dependent, anharmonic damping of the impulsively generated acoustic phonons and vibrational transport across the buried Ge/Si-interface are observed. Y1 - 2001 U6 - https://doi.org/10.1007/978-3-642-56546-5_81 VL - 66 SP - 281 EP - 283 PB - Springer ER - TY - CHAP A1 - Sokolowski-Tinten, Klaus A1 - Blome, Christian A1 - Dietrich, Clemens A1 - Blums, Juris A1 - Horn-von Hoegen, Michael A1 - von der Linde, D. A1 - Cavalleri, Andrea A1 - Squier, Jeff A. A1 - Kammler, Martin T1 - Structural dynamics in laser-excited solids investigated with femtosecond x-ray diffraction T2 - 2002 Summaries of Papers Presented at the Quantum Electronics and Laser Science Conference, 19-24 May 2002, Long Beach, CA, USA N2 - Summary form only given. Ultrashort x-ray pulses offer a unique combination of atomic-scale spatial and temporal resolution, which permits direct measurements of structural transients on an ultrafast time scale. Using time-resolved X-ray diffraction with femtosecond, multi-keV X-ray pulses we have studied transient lattice dynamics in optically excited semiconductors. Y1 - 2002 U6 - https://doi.org/10.1109/QELS.2002.1031182 SP - 115 EP - 116 PB - IEEE ER - TY - JOUR A1 - Sokolowski-Tinten, Klaus A1 - Blome, Christian A1 - Dietrich, Clemens A1 - Tarasevitch, A. A1 - Horn-von Hoegen, Michael A1 - von der Linde, D. A1 - Cavalleri, Andrea A1 - Squier, Jeff A. A1 - Kammler, Martin T1 - Femtosecond x-ray measurement of ultrafast melting and large acoustic transients JF - Physical review letters N2 - Time-resolved x-ray diffraction with ultrashort ( approximately 300 fs), multi-keV x-ray pulses has been used to study the femtosecond laser-induced solid-to-liquid phase transition in a thin crystalline layer of germanium. Nonthermal melting is observed to take place within 300-500 fs. Following ultrafast melting we observe strong acoustic perturbations evolving on a picosecond time scale. Y1 - 2001 U6 - https://doi.org/10.1103/PhysRevLett.87.225701 VL - 87 PB - APS ER - TY - JOUR A1 - Sokolowski-Tinten, Klaus A1 - Blome, Christian A1 - Dietrich, Clemens A1 - Tarasevitch, A. A1 - Horn-von Hoegen, Michael A1 - von der Linde, D. A1 - Cavalleri, Andrea A1 - Squier, Jeff A. A1 - Kammler, Martin T1 - Femtosecond time-resolved X-ray diffraction study of ultrafast structural dynamics in laser-excited solids JF - International Conference on Ultrafast Phenomena, 12 May 2002, Vancouver Canada N2 - Time-resolved x-ray diffraction with sub-300 fs, multi-keV x-ray pulses was used to study ultrafast lattice dynamics in laser-irradiated germanium and bismuth. In bismuth strong excitation of optical phonons is observed prior to disordering of the material. Y1 - 2002 U6 - https://doi.org/10.1007/978-3-642-59319-2_10 VL - 71 SP - 36 EP - 38 PB - Optica Publishing Grou ER - TY - INPR A1 - Tringides, Michael C. A1 - Conrad, E. H. A1 - Menzel, Andreas A1 - Voss, Neil R. A1 - Kammler, Martin A1 - Horn-von Hoegen, Michael T1 - Dynamics of atomic steps on Si(001) studied by temporal LEED spectroscopy [Poster] N2 - While surface kinetics measurements for single atom diffusion have proliferated, little work exists attempting to measure surface dynamics under equilibrium conditions. We will present our recent work on developing Temporal LEED Spectroscopy (TLS) as a dynamic probe of surfaces capable of kinetics measurements at both high temperatures and surface coverages. By tuning the diffraction to specific structural entities such as steps, islands, etc., and monitoring the diffracted signal as a function of time, dynamics information about these structures can be obtained. As an example we will present TLS results for the dynamics of step fluctuations on Si(001) [1]. We have measured activation energies and identified step-edge diffusion as the rate limiting process for 950K < T < 1130K. Although this result is in apparent disagreement with earlier work, a careful analysis, considering crossover temperatures between different microscopic processes, can reconcile the differences. 1. M. Kammler, et al., Phys. Rev. B (in press). Y1 - 2002 UR - https://www.researchgate.net/publication/252546721_Dynamics_of_atomic_steps_on_Si001_studied_by_temporal_LEED_spectroscopy_poster ER - TY - JOUR A1 - Horn-von Hoegen, Michael A1 - Meyer zu Heringdorf, Frank-Joachim A1 - Kammler, Martin A1 - Schaeffer, C. A1 - Reinking, D. A1 - Hofmann, K. R. T1 - Bi surfactant mediated epitaxy of Ge on Si(111) JF - Thin Solid Films N2 - We have tested Bi for the surfactant mediated epitaxy of Ge on Si(111). Islanding of Ge is prevented and a 2D layer growth of smooth and continuous Ge films is observed. The lattice mismatch is accommodated by a periodic array of dislocations confined to the Si/Ge interface. The large covalent radius of Bi reduces the binding energy, allowing Very efficient segregation and low doping levels even at low growth temperatures. Unfortunately, this results also in a high Bi desorption flux limiting the possible growth temperatures below 600 degrees C. Consequently the Ge films show a high defect density in the order of 10(8) cm(-2) for stacking faults and 10(9) cm(-2) for dislocations which limit electron Hall mobility to values below 700 cm(2)/V s at room temperature. KW - Hall mobility KW - Heteroepitaxial growth KW - Surfactants KW - Doping KW - Molecular beam epitaxy KW - Silicon KW - Germanium KW - Bismuth KW - Low energy electron diffraction KW - Scanning electron microscopy Y1 - 1999 U6 - https://doi.org/10.1016/S0040-6090(98)01659-9 VL - 343-344 SP - 579 EP - 582 PB - Elsevier ER - TY - JOUR A1 - Cavalleri, Andrea A1 - Siders, C. W. A1 - Brown, F. L. H. A1 - Leitner, D. M. A1 - Tóth, Csaba A1 - Squier, Jeff A. A1 - Barty, C. P. J. A1 - Wilson, K. R. A1 - Sokolowski-Tinten, Klaus A1 - Horn-von Hoegen, Michael A1 - von der Linde, D. A1 - Kammler, Martin T1 - Anharmonic lattice dynamics in germanium measured with ultrafast x-ray diffraction JF - Physical review letters N2 - Damping of impulsively generated coherent acoustic oscillations in a femtosecond laser-heated thin germanium film is measured as a function of fluence by means of ultrafast x-ray diffraction. By simultaneously measuring picosecond strain dynamics in the film and in the unexcited silicon substrate, we separate anharmonic damping from acoustic transmission through the buried interface. The measured damping rate and its dependence on the calculated temperature of the thermal bath is consistent with estimated four-body, elastic dephasing times (T2) for 7-GHz longitudinal acoustic phonons in germanium. Y1 - 2000 U6 - https://doi.org/10.1103/PhysRevLett.85.586 VL - 85 IS - 3 SP - 586 EP - 589 PB - APS ER - TY - JOUR A1 - Sokolowski-Tinten, Klaus A1 - Horn-von Hoegen, Michael A1 - von der Linde, D. A1 - Cavalleri, Andrea A1 - Siders, C. W. A1 - Brown, F. L. H. A1 - Tóth, Csaba A1 - Squier, Jeff A. A1 - Barty, C. P. J. A1 - Wilson, K. R. A1 - Kammler, Martin T1 - Time-resolved x-ray diffraction study of ultrafast acoustic phonon dynamics in Ge/Si-heterostructures JF - International Conference on Ultrafast Phenomena , 9 July 2000, Charleston N2 - Using time-resolved x-ray diffraction the ultafast strain dynamics in fs-laserexcited Ge/Si-heterostructures has been studied. A fluence dependent, anharmonic damping of the impulsively generated acoustic phonons and vibrational transport across the buried Ge/Si-interface are observed. KW - Acoustic Phonon KW - Acoustic Transmission KW - Carrier Diffusion KW - Homogenous Expansion KW - Lattice Anharmonicity Y1 - 2000 UR - https://opg.optica.org/abstract.cfm?uri=UP-2000-MF43 PB - Optica ER - TY - JOUR A1 - Siders, C. W. A1 - Cavalleri, Andrea A1 - Sokolowski-Tinten, Klaus A1 - Tóth, Csaba A1 - Guo, T. A1 - Kammler, Martin A1 - Horn-von Hoegen, Michael A1 - Wilson, K. R. A1 - von der Linde, D. A1 - Barty, C. P. J. T1 - Detection of nonthermal melting by ultrafast X-ray diffraction JF - Science N2 - Using ultrafast, time-resolved, 1.54 angstrom x-ray diffraction, thermal and ultrafast nonthermal melting of germanium, involving passage through nonequilibrium extreme states of matter, was observed. Such ultrafast, optical-pump, x-ray diffraction probe measurements provide a way to study many other transient processes in physics, chemistry, and biology, including direct observation of the atomic motion by which many solid-state processes and chemical and biochemical reactions take place. Y1 - 1999 U6 - https://doi.org/10.1126/science.286.5443.1340 VL - 286 IS - 5443 SP - 1340 EP - 1342 ER - TY - JOUR A1 - Reinking, D. A1 - Kammler, Martin A1 - Hoffmann, N. A1 - Horn-von Hoegen, Michael A1 - Hofmann, K. R. T1 - Fabrication of high-mobility Ge p-channel MOSFETs on Si substrates JF - Electronics Letters N2 - The first fabrication of Ge p-channel MOSFETs (p-MOSFETs) on Si substrates is reported. A CMOS compatible process based on relaxed Ge layers grown on Si(111) substrates by surfactant mediated epitaxy (SME) was used. The non-optimised low temperature process yielded normally-off Ge p-MOSFETs with record channel drift mobilities of 430 cm2/Vs KW - silicon KW - CMOS integrated circuits KW - germanium KW - carrier mobility KW - epitaxial growth KW - integrated circuit technology KW - elemental semiconductors KW - semiconductor growth KW - MOSFET KW - Insulated gate field effect transistors KW - Thin film growth and epitaxy Y1 - 1999 U6 - https://doi.org/10.1049/el:19990349 VL - 35 IS - 6 SP - 503 EP - 504 PB - IET ER - TY - CHAP A1 - Kuhn, Alexander A1 - Franzius, Jan Niklas A1 - Möller, Dennis A1 - Pralle, Norbert A1 - Reich, Franziska A1 - Hellmuth, René A1 - Tombeil, Anne-Sophie A1 - Wenzel, Günter A1 - Linner, Thomas A1 - Schmailzl, Marc A1 - Hu, Rongbo A1 - Bock, Thomas A1 - Maufroy, Christophe A1 - Kopp, Verena A1 - Bölke, Nico A1 - Daub, Urban T1 - Kompetenzzentrum für Baurobotik im Hochbau (CONSAS) - Förderkennzeichen 16SV8637 T2 - Roboter für Assistenzfunktionen: Konzeptstudien für die Interaktion in der Praxis Y1 - 2023 UR - https://www.researchgate.net/publication/373084211_Kompetenzzentrum_fur_Baurobotik_im_Hochbau_CONSAS_-_Forderkennzeichen_16SV8637 SN - 9783731512448 SP - 169 EP - 207 ER - TY - JOUR A1 - Siders, C. W. A1 - Cavalleri, Andrea A1 - Sokolowski-Tinten, Klaus A1 - Tóth, Csaba A1 - Guo, T. A1 - Kammler, Martin A1 - Horn-von Hoegen, Michael A1 - Wilson, K. R. A1 - von der Linde, D. A1 - Barty, C. P. J. T1 - Direct Observation of Ultrafast Non-thermal Melting by Ultrafast X-ray Diffraction JF - Ultrafast Phenomena XII N2 - Ultrafast nonthermal melting of femtosecond laser-irradiated germanium was observed directly for the first time using sub-picosecond, 1.54-angstrom x-ray diffraction. Such measurements allow the study of transient atomic motion fundamental to many processes in physics, chemistry, and biology. Y1 - 2000 U6 - https://doi.org/10.1007/978-3-642-56546-5_80 VL - 66 SP - 276 EP - 280 PB - Springer ER - TY - CHAP A1 - Sokolowski-Tinten, Klaus A1 - von der Linde, D. A1 - Siders, C. W. A1 - Cavalleri, Andrea A1 - Tóth, Csaba A1 - Guo, T. A1 - Wilson, K. R. A1 - Barty, C. P. J. A1 - Kammler, Martin A1 - Horn-von Hoegen, Michael T1 - Lattice dynamics of femtosecond laser-excited semiconductors probed by ultrafast x-ray diffraction T2 - Applications of High Field and Short Wavelength Sources VIII N2 - The present knowledge of the atomic structure of matter is to a large extent due to x-ray spectroscopies. Y1 - 1999 U6 - https://doi.org/10.1364/HFSW.1999.PD3 PB - Optica ER - TY - CHAP A1 - Buchner, Stefan A1 - Wagner, Marcus A1 - Höller, Christoph T1 - Inverse Acoustic Characterization of Rigid Porous Media using Artificial Neural Networks T2 - Proceedings of DAS|DAGA 2025, 51st Annual Meeting on Acoustics, March 17-20, 2025, Copenhagen N2 - Porous sound absorbers can be described by the isotropic Biot model, and its fluid phase can be represented by the Champoux-Allard model. To apply these models to a given absorber material, the five acoustical and the four mechanical material parameters must be known. The direct measurement of these parameters is complex and requires cost-intensive measurement equipment. Current inverse methods to obtain these material parameters solve an optimization problem, trying to fit the absorption or impedance curve of the material model to the impedance tube measurement data. Solving this optimization problem, i.e. finding the global minimum, is not guaranteed in an acceptable amount of time, as the optimization problem possesses a multitude of local minima. This work proposes an alternative, data driven approach using artificial neural networks to obtain the material parameters necessary for the characterization of open porous materials. The approach only requires the results of standard impedance tube measurements. The characterization of rigid- and elastic frame materials has been investigated. The datasets were generated using the rigid and elastic frame models for porous absorbers. The approach shows good results for impedance curves generated by the analytical models, the validation with real-world impedance tube measurement data is currently under investigation. Y1 - 2025 SN - 978-3-939296-23-2 U6 - https://doi.org/10.71568/dasdaga2025.142 SP - 847 EP - 850 CY - Berlin ER - TY - JOUR A1 - Schmidt, Thomas A1 - Kröger, Roland A1 - Flege, Jan Ingo A1 - Horn-von Hoegen, Michael A1 - Clausen, T. A1 - Falta, J. A1 - Janzen, Andreas A1 - Zahl, P. A1 - Kury, P. A1 - Kammler, Martin T1 - Less strain energy despite fewer misfit dislocations: the impact of ordering JF - Physical review letters N2 - The average strain state of Ge films grown on Si(111) by surfactant mediated epitaxy has been compared to the ordering of the interfacial misfit dislocation network. Surprisingly, a smaller degree of average lattice relaxation was found in films grown at higher temperature. On the other hand, these films exhibit a better ordered dislocation network. This effect energetically compensates the higher strain at higher growth temperature, leading to the conclusion that, apart from the formation of misfit dislocations, their ordering represents an important channel for lattice-strain energy relaxation. Y1 - 2006 U6 - https://doi.org/10.1103/PhysRevLett.96.066101 VL - 96 IS - 6 PB - APS ER - TY - JOUR A1 - Hull, Robert A1 - Gray, J. L. A1 - Kammler, Martin A1 - Vandervelde, T. A1 - Kobayashi, Takeshi A1 - Kumar, P. A1 - Pernell, T. A1 - Bean, J. C. A1 - Floro, J. A. A1 - Ross, Frances M. T1 - Precision placement of heteroepitaxial semiconductor quantum dots JF - Materials Science and Engineering: B N2 - We describe two new approaches to the patterning of Si(1 0 0) surfaces for controlled nucleation of heteroepitaxial Ge semiconductor clusters. In the first method, a Ga ' -focused ion beam in situ to the growth chamber is used to create local regions of enhanced Ga ' concentration and surface topography. It is shown that at low ion doses (Â/10 14 cm (2), implanted Ga causes local nucleation of Ge clusters upon the implanted region. At higher doses (]/10 15 cm (2), a complex surface topography localizes nucleation of Ge clusters. This approach can be used to seed complex patterns of Ge clusters with diameters of tens of nanometers and positional accuracy of sub-100 nm. The second method employs self-assembly of complex strain-stabilized ''quantum quadruplet'' and ''quantum fortress'' structures, whereby cooperative island nucleation around shallow strain-relieving pits is identified during Ge x Si 1(x /Si(1 0 0) heteroepitaxy. These configurations are kinetically limited structures that exist over a range of compositions, growth temperatures, and growth rates, but which are destabilized by strain relaxation (e.g. by the introduction of misfit dislocations) and by growth conditions which provide high adatom surface mobilities. Both methods have broad potential application to nanoelectronic device architectures. 2003 Elsevier Science B.V. All rights reserved. KW - Strained layer epitaxy KW - Strain relaxation KW - Quantum fortress KW - Molecular beam epitaxy KW - Controlled nucleation Y1 - 2003 U6 - https://doi.org/10.1016/S0921-5107(02)00680-3 VL - 101 IS - 1-3 SP - 1 EP - 8 PB - Elsevier ER - TY - JOUR A1 - Koenig, Eric A1 - Guertler, Katherine T1 - Parlaying students´ work experience into practice-oriented esp JF - Journal of teaching english for specific and academic purposes N2 - Instructors of English for Special Purposes often describe the challenge of determining which specific content and competencies to address in their courses. After all, it is the focus on technical subject matter which students expect to differentiate engineering ESP from standard EFL. Yet ESP instructors, who frequently have a background in fields such as applied linguistics or education, often receive little input from technical specialists as to which specialist topics are most relevant to their target domain. Our research indicates that ESP instructors in higher education can leverage a valuable resource to enrich teaching effectiveness: students who have already gained professional experience. As part of a longitudinal study at two universities of applied sciences (UAS) in southern Germany, engineering students at the beginning of their first semester of compulsory technical English participate in an online survey. The course participants provide relevant biographical information such as work experience and evaluate the perceived importance of a selection of skills and applications for a Technical English course. The surveys, administered in October 2016 and October 2017 and encompassing nearly 1000 respondents, provide compelling insights. Analysis reveals conclusive correlations between the perceived importance of course components and students' declared level of previous work experience. Listening comprehension, reading comprehension, process description, and test and measurement are topics whose importance correlates positively with work experience level. In addition, there are clear trends relating work experience level with the importance of the reading and writing of technical documents as well as communication and interaction. This data provides empirically-founded criteria for selecting the topics to include in the scope of a Technical English course for engineers, informed by the judgment of students with occupational experience. Additionally, recognizing that students with work experience have legitimate practitioner credibility allows instructors to identify and select relevant subject matter in concordance with experienced students' learning objectives. ESP learners will profit greatly from cultivating skills with proven practical applicability. KW - ESP curricula KW - ESP practitioners KW - Technical English KW - work experience Y1 - 2018 U6 - https://doi.org/10.22190/JTESAP1802277K VL - 6 IS - 2, Special issue SP - 277 EP - 284 PB - Universität Nis ER - TY - CHAP A1 - Krysztof, Michał A1 - Urbański, Paweł A1 - Grzebyk, Tomasz A1 - Hausladen, Matthias A1 - Schreiner, Rupert T1 - MEMS X-Ray Source: Electron Emitter Development T2 - 2022 21st International Conference on Micro and Nanotechnology for Power Generation and Energy Conversion Applications (PowerMEMS): 12-15 Dec. 2022, Salt Lake City, UT, USA N2 - The article presents a fabrication process and characterization of silicon emitters designed for MEMS X-ray source. The emitters, made of p-type and n-type silicon, were prepared by a modified laser micromachining process. Both types of emitters worked without any carbon nanotube coverage, which was the case in the previous realization of electron emitters. The p-type emitter gave smaller electron beam currents (<50 nA) with stable emission in a saturation region. The n-type emitter provides higher emission currents (>1 µA) not limited by saturation region, but with higher fluctuations. The final choice of emitter will be adjusted for different applications. KW - Micromechanical devices KW - MEMS KW - X-ray source KW - electron emitter KW - X-ray radiation Y1 - 2022 U6 - https://doi.org/10.1109/PowerMEMS56853.2022.10007563 SP - 248 EP - 251 PB - IEEE ER - TY - CHAP A1 - Koenig, Eric A1 - Guertler, Katherine A1 - Żarnowska, Dorota A1 - Horbačauskienė, Jolita T1 - Developing English language competence for global engineers T2 - 2020 IEEE Global Engineering Education Conference (EDUCON): 27-30 April 2020, Porto, Portugal N2 - English language skills are essential to professional communication in international engineering environments. Given the concomitant degree of specialization, university-level coursework in English for Specific Purposes is an essential component of engineering student preparation. This large-scale survey of university students of engineering in three European countries provides important insight into the most relevant language skills, with the goal of informing communicative, task-based curricula for Technical English courses. KW - English as a foreign language KW - English for engineers KW - English for specific purposes KW - professional communication KW - technical English Y1 - 2020 U6 - https://doi.org/10.1109/EDUCON45650.2020.9125208 SP - 242 EP - 249 ER - TY - CHAP A1 - Koenig, Eric A1 - Guertler, Katherine T1 - Are you experienced? Technical and interpersonal communication prioritization in engineering ESP T2 - Proceedings of Languages for Specific Purposes in Higher Education - Current Trends, Approaches and Issues, Brno University of Technology/Tschechien Y1 - 2017 UR - https://www.oth-regensburg.de/en/professoren-profilseiten/professoren-am/guertler-katherine/research.html ER - TY - JOUR A1 - Hanisch-Blicharski, Anja A1 - Janzen, Andreas A1 - Krenzer, Boris A1 - Wall, S. A1 - Klasing, Friedrich A1 - Kalus, Annika A1 - Frigge, Tim A1 - Kammler, Martin A1 - Horn-von Hoegen, Michael T1 - Ultra-fast electron diffraction at surfaces: from nanoscale heat transport to driven phase transitions JF - Ultramicroscopy N2 - Many fundamental processes of structural changes at surfaces occur on a pico- or femtosecond time scale. In order to study such ultra-fast processes, we have combined modern surface science techniques with fs-laser pulses in a pump-probe scheme. Reflection high energy electron diffraction (RHEED) with grazing incident electrons ensures surface sensitivity for the probing electron pulses. Utilizing the Debye-Waller effect, we studied the cooling of vibrational excitations in monolayer adsorbate systems or the nanoscale heat transport from an ultra-thin film through a hetero-interface on the lower ps-time scale. The relaxation dynamics of a driven phase transition far away from thermal equilibrium is demonstrated with the In-induced (8×2) reconstruction on Si(111). This surface exhibits a Peierls-like phase transition at 100K from a (8×2) ground state to (4×1) excited state. Upon excitation by a fs-laser pulse, this structural phase transition is driven into an excited (4×1) state at a sample temperature of 20K. Relaxation into the (8×2) ground state occurs after more than 150 ps. Y1 - 2013 U6 - https://doi.org/10.1016/j.ultramic.2012.07.017 VL - 127 SP - 2 EP - 8 PB - Elsevier ER - TY - CHAP A1 - Koenig, Eric A1 - Guertler, Katherine A1 - Tluková, Jolana ED - Vranova, Martina T1 - Harnessing learners’ domain expertise for LSP curriculum development: Experience-based best practices and strategies T2 - New to the LSP Classroom? A Selection of Monographs on Successful Practices N2 - In Chapter 7, a team of authors from European technical universities addresses the most common challenge novice LSP practitioners usually have—inadequate knowledge of the target domain. They propose strategies to develop the language instructor’s technical terminology and concepts. Struggling with feelings of intimidation in an alienating environment of the technical English classroom led the authors to a realization that the best source of target-domain knowledge is their own students. Interacting with students and receiving and appreciating subject-matter input from them bridges the gap between LSP practitioners with humanistic training and their technology-oriented students. By creating the classroom culture of two sets of experts in cooperation to solve a problem, both the teachers and the students can symbiotically learn from each other. Such teacher-student cooperation will give novice LSP practitioners a considerable head start. Moreover, it ensures that course design and curriculum can be tailored to the students’ needs. Such student-guided input will also make up for the intensely felt lack of contact between LSP instructors and experts teaching subject-matter courses. The reflections on the unenviable situation of LSP instructors in an environment where everybody else but them has the target-domain knowledge is then followed by a list of specific in-class and take-home activities that incorporate the student-domain expertise in the ESP classroom. All these activities can be adapted to any language, level of proficiency, or target domain. Y1 - 2023 SN - 978-1-64889-150-2 SP - 131 EP - 146 PB - Vernon Press CY - Wilmington, DE ER - TY - CHAP A1 - Koenig, Eric A1 - Guertler, Katherine ED - Haase, Christoph T1 - Supporting weaker students in the mixed-level ESL classroom T2 - English Language Teaching Through the Lens of Experience Y1 - 2019 SN - 978-1-5275-3718-7 SP - 181 EP - 194 PB - Cambridge Scholars Publisher CY - Newcastle-upon-Tyne ER - TY - CHAP A1 - Langer, Christoph A1 - Prommesberger, Christian A1 - Dams, Florian A1 - Schreiner, Rupert T1 - Theoretical investigations into the field enhancement factor of silicon structures T2 - 25th International Vacuum Nanoelectronics Conference (IVNC) - Jeju, Korea (South), 09.- 13.07.2012 N2 - In order to optimize our field-emitting silicon structures, the influence of geometric parameters like aspect ratio, aperture angle and curvature on the field enhancement factor was investigated by finite element simulations. A universal geometric model consisting of a rounded triangle and elliptic curvatures was taken for modeling a variety of different silicon tip as well as ridge structures. Whereas, a high dependency of the field enhancement on the aperture angle was found, the simulations show that the elliptic curvature affects the field enhancement only marginal. KW - elemental semiconductors KW - field emitter arrays KW - field enhancement factor KW - finite element analysis KW - silicon KW - silicon field emitter Y1 - 2012 SN - 978-1-4673-1984-3 SN - 978-1-4673-1983-6 SN - 978-1-4673-1982-9 U6 - https://doi.org/10.1109/IVNC.2012.6316886 SN - 2380-6311 SN - 2164-2370 PB - IEEE CY - Piscataway, N.J. ER - TY - JOUR A1 - Prommesberger, Christian A1 - Bachmann, Michael A1 - Düsberg, Felix A1 - Langer, Christoph A1 - Ławrowski, Robert Damian A1 - Hofmann, Martin A1 - Pahlke, Andreas A1 - Schreiner, Rupert T1 - Regulation of the Transmitted Electron Flux in a Field-Emission Electron Source Demonstrated on Si Nanowhisker Cathodes JF - IEEE Transactions on Electron Devices N2 - We report on a method to stabilize the transmitted electron flux in a field-emission electron source using an external regulation circuit. The electron source was realized with an array of silicon (Si) nanowhiskers on the top of elongated pillar structures, a mica spacer, and an extraction grid made of Si. As for most applications, the emitted electron current from the cathode is not as crucial as the transmitted electron flux through the extraction grid toward the anode. We investigated a method which allows the regulation directly by the emitted electron flux and not merely on the cathode current. By using this method, we were able to stabilize the emitted electron flux of our electron source down to values below 1%. Simultaneously, it was shown that there is the possibility to stabilize the influencing value in the real application as well. The effectiveness of this method was demonstrated successfully with an X-ray source setup. The measured X-ray photon count rate was stabilized to a standard deviation of 0.30% at a pressure of 1 × 10 -7 mbar. Even in harsh environment of 2 × 10 -5 mbar, a stabilization of the X-ray photon count rate down to a value of 0.63% was achieved. KW - Cathodes KW - Nanostructured devices KW - Current measurement KW - Photonics KW - Electron sources KW - Emissions KW - Voltage measurement Y1 - 2017 U6 - https://doi.org/10.1109/TED.2017.2763239 SN - 5128-5133 VL - 64 IS - 12 PB - IEEE ER - TY - JOUR A1 - Langer, Christoph A1 - Bomke, Vitali A1 - Hausladen, Matthias A1 - Ławrowski, Robert Damian A1 - Prommesberger, Christian A1 - Bachmann, Michael A1 - Schreiner, Rupert T1 - Silicon Chip Field Emission Electron Source Fabricated by Laser Micromachining JF - Journal of Vacuum Science & Technology B N2 - The components for a silicon chip electron source were fabricated by laser micromachining using pulsed laser ablation and wet chemical cleaning and etching dips. The field emission electron source consists of a silicon field emission cathode with 4 × 4 conical shaped emitters with a height of 250 μm and a tip radius of about 50 nm, a 50 μm thick laser-structured mica spacer, and a silicon grid electrode with a grid periodicity of 200 μm and a bar width of 50 μm. These three components are combined to a single chip with the size of 14 × 10 mm2 and the thickness of 1 mm to form the electron source. Several of these devices were characterized in ultrahigh vacuum. Onset voltages of about 165 V and cathode currents of about 15 μA for voltages lower than 350 V were observed. Operating the electron source with an anode voltage of 500 V and an extraction grid voltage of 300 V yielded a cathode current of 4.5 μA ± 8.9%, an anode current of 4.0 μA ± 9.6%, and a corresponding grid transmittance of 89%. Regulating the anode current by the extraction grid voltage, an extremely stable anode current of 5.0 μA ± 0.017% was observed. A long-term measurement over 120 h was performed, and no significant degradation or failure was observed. KW - Ultra-high vacuum KW - Field emitter arrays KW - Etching KW - Electrical properties and parameters KW - Electron sources KW - Laser ablation KW - Laser micromachining KW - Silicon chip KW - Triodes Y1 - 2020 U6 - https://doi.org/10.1116/1.5134872 VL - 38 IS - 1 PB - AIP Publishing ER - TY - JOUR A1 - Breuer, Janis A1 - Bachmann, Michael A1 - Düsberg, Felix A1 - Pahlke, Andreas A1 - Edler, Simon A1 - Langer, Christoph A1 - Prommesberger, Christian A1 - Ławrowski, Robert Damian A1 - Schreiner, Rupert A1 - Serbun, Pavel A1 - Lützenkirchen-Hecht, Dirk T1 - Extraction of the current distribution out of saturated integral measurement data of p-type silicon field emitter arrays JF - Journal of Vacuum Science and Technology B N2 - At the moment, only complicated techniques are known for the determination of array properties of field emitter arrays such as the number of active tips, the current distribution, or the individual tip radii. In this work, a method for extracting these parameters from integral measurement data is presented. A model describing the characteristics of a single emitter, including the saturation as a function of the applied voltage and the emitter radius, is developed. It is shown that experimental data of field emitter arrays can be represented as the sum of these functions and the characteristic parameters can be fitted to field emission data of an array. Using this method, the values of the radii as well as the parameters of distribution models can be determined directly. Analysis of experimental data from p-type Si emitter arrays shows that only 1–2% of the tips contribute significantly. Y1 - 2018 U6 - https://doi.org/10.1116/1.5035189 VL - 36 IS - 5 PB - AIP Publishing ER - TY - JOUR A1 - Edler, Simon A1 - Bachmann, Michael A1 - Breuer, Janis A1 - Dams, Florian A1 - Düsberg, Felix A1 - Hofmann, Martin A1 - Jakšič, Jasna A1 - Pahlke, Andreas A1 - Langer, Christoph A1 - Ławrowski, Robert Damian A1 - Prommesberger, Christian A1 - Schreiner, Rupert T1 - Influence of adsorbates on the performance of a field emitter array in a high voltage triode setup JF - Journal of Applied Physics N2 - In the present work, black-silicon field emitter arrays (FEAs) are investigated regarding the influence of residual gas pressure on the characteristics and lifetime in the high voltage triode setup. Current-voltage-characteristics at different pressure levels are recorded and show a decreasing emission current with rising pressure. This decrease can be explained by an increase of the work function and charging of the emitter surface caused by adsorbates. The emission current can be restored to its initial value by heating of the FEA up to 110 °C during active emission. With this regeneration procedure, an extended lifetime from about 20 h to 440 h at a residual gas pressure of 10−5 mbar is achieved. Y1 - 2017 U6 - https://doi.org/10.1063/1.4987134 VL - 122 ER - TY - JOUR A1 - Langer, Christoph A1 - Prommesberger, Christian A1 - Ławrowski, Robert Damian A1 - Schreiner, Rupert A1 - Serbun, Pavel A1 - Müller, Günter A1 - Düsberg, Felix A1 - Hofmann, Martin A1 - Bachmann, Michael A1 - Pahlke, Andreas T1 - Field emission properties of p-type black silicon on pillar structures JF - Journal of Vacuum Science & Technology B N2 - Arrays of black silicon field emission pillar structures were fabricated on p-type silicon substrates. Two types of samples with the same number of pillars (arrays of 10 × 10) but different pillar heights (8 and 20 μm) were prepared as well as a black silicon reference sample without pillars. The field emission properties of these cathodes were investigated both by means of integral current-voltage measurements and by field emission scanning microscopy. Samples with a pillar height of 20 μm revealed onset fields as low as 6.4 V/μm, field enhancement factors up to 800, and emission currents up to 8 μA at an applied field of 20 V/μm. Due to the p-type material, a saturation of the emission current for fields above 11 V/μm was observed. This saturation leads to a stable operation with a current fluctuation of less than ±8%. It was found that samples with a pillar height of 20 μm showed improved emission characteristics compared to samples with a pillar height of 8 μm or without pillars. The voltage maps revealed an increased emission homogeneity after a “burn-in” sequence of the sample. The current map showed that a few of the pillars dominate the emission. Integral current stability measurements were performed under different vacuum pressures, in order to investigate altered emission behavior and a potential degradation of the emitters. At pressures above 10−6 mbar, the sample starts to degrade irreversibly. Nevertheless, even after a harsh treatment over 30 min at 5 × 10−5 mbar and at an applied field of 23 V/μm, the cathode was still operating, and did not fail during further operation over 20 h at 5 × 10−8 mbar and at an applied field of 28 V/μm. Y1 - 2016 U6 - https://doi.org/10.1116/1.4943919 VL - 34 IS - 2 ER - TY - JOUR A1 - Bachmann, Michael A1 - Dams, Florian A1 - Düsberg, Felix A1 - Hofmann, Martin A1 - Pahlke, Andreas A1 - Langer, Christoph A1 - Ławrowski, Robert Damian A1 - Prommesberger, Christian A1 - Schreiner, Rupert A1 - Serbun, Pavel A1 - Lützenkirchen-Hecht, Dirk A1 - Müller, Günter T1 - Extraction of the characteristics of current-limiting elements from field emission measurement data JF - Journal of Vacuum Science & Technology B N2 - In this contribution, the authors will present an algorithm to extract the characteristics of nonideal field emission circuit elements from saturation-limited field emission measurement data. The method for calculating the voltage drop on current-limiting circuit elements is based on circuit theory as well as Newton's method. Since the only assumption the authors make on the current-limiting circuit is a connection in series, this method is applicable to most field emission data showing saturation. To be able to determine the significance of any parameter output, the uncertainties of data and extracted parameters as well as the parameter correlations are fully taken into account throughout the algorithm. N-type silicon samples with varying external serial resistors are analyzed. All results show a good agreement to the nominal resistor values. Additionally, several p-type samples are analyzed, showing a diodelike behavior. The extracted current-limiting characteristics of the p-type samples are in good agreement with a pn-junction model. The stability of the emission current of the p-type samples is measured by constant voltage measurements and compared to the extracted current-limiting characteristics. The application of the algorithm to measurement data shows that the given algorithm is a valuable tool to analyze field emission measurement data influenced by nonemissive processes. Y1 - 2017 U6 - https://doi.org/10.1116/1.4971768 VL - 35 IS - 2 ER - TY - CHAP A1 - Langer, Christoph A1 - Hausladen, Matthias A1 - Prommesberger, Christian A1 - Ławrowski, Robert Damian A1 - Bachmann, Michael A1 - Düsberg, Felix A1 - Pahlke, Andreas A1 - Shamonin (Chamonine), Mikhail A1 - Schreiner, Rupert T1 - Field emission current investigation of p-type and metallized silicon emitters in the frequency domain T2 - International Vacuum Nanoelectronics Conference (IVNC), 31st, 2018, Kyoto, Japan N2 - We investigated two different field emitter arrays consisting of 10×10 p-type and 10×10 undoped Au-coated high aspect ratio silicon tips. The I-V characterization of the p-type sample showed a pronounced saturation for voltages higher than 500 V and a maximum emission current of 39 nA. The metallized sample revealed a FN-like emission up to several μA. The metallized and the p-type sample operating below the saturation region showed high current fluctuations of ±16%. Whereas, the metallized sample with current regulation and the p-type sample in the saturation yielded a current stability of ±0.4% and ±0.3%, respectively. Investigations in the frequency domain revealed the for field emission typical 1/f-noise. By operating in the saturation region (p-type sample) or using an emission current regulation (metallized sample) the noise level was reduced by at least 20 dB. Finally, the p-type sample was illuminated by a light emitting diode to increase and modulate the emission current in the saturation region. The emission current was increased by a factor of 3.7 to 145 nA. With this configuration we emulated an unstable emission behavior and evaluated the performance of our emission current regulation circuit. KW - field emission KW - field emitter array KW - silicon tip KW - current fluctuation KW - current stability KW - field emission noise Y1 - 2018 U6 - https://doi.org/10.1109/IVNC.2018.8520127 PB - IEEE ER - TY - JOUR A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Ławrowski, Robert Damian A1 - Schreiner, Rupert T1 - Investigations on the long-term performance of gated p-type silicon tip arrays with reproducible and stable field emission behavior JF - Journal of Vacuum Science & Technology B N2 - The authors report on the fabrication and characterization of p-type Si tip arrays with an integrated gate electrode for applications as field emission electron sources. After the reactive ion etching of the emitters, the combined thermal dry and wet oxidation was used for both the sharpening of the emitters and for the realization of an enhanced insulation layer. Au was evaporated in a self-aligned process as gate electrode. Arrays of 16 Si tips were fabricated with tip heights of about 3 μm and tip radii of about 20 nm with integrated gate electrode concentrically positioned ≈2 μm below the tip apex. Integral measurements with an additional anode showed improved field emission properties with a reproducible and stable emission behavior. A fast activation of the tips, low onset voltages of about 30 V, and moderate field emission currents up to 0.55 μA were noticed. The field emission parameters were calculated using the Fowler–Nordheim characteristics. A pronounced saturation regime was observed, and current fluctuations of less than ±1% were investigated for 30 min. Long-term measurements were carried out for a period of more than 8 h. In the first 6 h of operation, the authors observed a drift of the emission current from 0.35 to 0.55 μA caused by an increased emission surface. Y1 - 2017 U6 - https://doi.org/10.1116/1.4972519 VL - 35 IS - 1 ER - TY - CHAP A1 - Ławrowski, Robert Damian A1 - Hausladen, Matthias A1 - Schreiner, Rupert T1 - Individually Addressable Fully Integrated Field Emission Electron Source Fabricated by Laser Micromachining of Silicon T2 - 33rd International Vacuum Nanoelectronics Conference (IVNC): 6-10 July 2020, Lyon N2 - A cathode with individually addressable Si tips allows the observation of the activation procedure and emission behaviour of each field emission emitter at any time of the measurement. The cathode consists of an array of 2x2 conically shaped emitter structures, which were fabricated by laser micromachining and wet etching of a Si substrate bonded on a glass carrier. Using the same process, a Si extractions grid was fabricated and mounted onto the emitter. Integral field emission measurements were performed in a diode configuration in a vacuum chamber at pressures of about 10- 9 mbar. The emitters show an onset voltage between 200 V and 300 V. The emission current for each emitter on the cathode was regulated to a given value (1.0 μA, 2.5μA, 5.0μA) by an external regulating circuit and was recorded individually during the measurement. With such approach, the relation between the emission behaviour and the geometry of emitters can be studied in detail. In addition, the current stabilization of each emitters of an array can be investigated, which led to a current stability of better than 0.5%. Y1 - 2020 SN - 978-1-7281-9454-7 U6 - https://doi.org/10.1109/IVNC49440.2020.9203470 SP - 1 EP - 2 PB - IEEE ER - TY - CHAP A1 - Prommesberger, Christian A1 - Ławrowski, Robert Damian A1 - Langer, Christoph A1 - Mecani, Mirgen A1 - Huang, Yifeng A1 - She, Juncong A1 - Schreiner, Rupert ED - Tiginyanu (Ed.), Ion M. T1 - Field emission properties of ring-shaped Si ridges with DLC coating T2 - Proc. SPIE 10248, Nanotechnology VIII, 102480H (30 May 2017) N2 - We report on the fabrication and the emission characterization of single ring-shaped Si ridges with a coating of diamond-like carbon (DLC). The reactive ion etching and the subsequent inductively coupled plasma step were adjusted to realize ring-shaped Si ridges with a height of 7.5 μm respectively 15 μm and an apex radius of 20 – 25 nm. The samples were coated with a DLC layer (thickness ≈ 2 – 5 nm) by a filtered cathodic vacuum arc deposition system in order to lower the work function of the emitter and to improve the field emission characteristics. The field emission characterizations were done in diode configuration with cathode and anode separated by a 50 μm thick mica spacer. A higher emission current was carried out for the ring-shaped Si ridge in comparison to the point-shaped Si tips due to the increased emission area. The highest emission current of 0.22 μA at 1000 V was measured on a DLC-coated sample with the highest aspect ratio. No degradation of the emission current was observed in the plateau regime during a measurement period of 6 h. Finally, no decreasing performance of the field emission properties was found due to changes in the geometry or destructions. KW - Etching KW - Scanning electron microscopy KW - Silicon carbide KW - Carbon KW - Mica KW - Oxides Y1 - 2017 U6 - https://doi.org/10.1117/12.2265627 VL - 102480H PB - Society of Photo-Optical Instrumentation Engineers (SPIE) ER - TY - CHAP A1 - Ławrowski, Robert Damian A1 - Langer, Christoph A1 - Prommesberger, Christian A1 - Schreiner, Rupert T1 - Field emission from three-dimensional epitaxial grown GaN-microrods T2 - 29th International Vacuum Nanoelectronics Conference (IVNC), 2016, 11-15 July, Vancouver, BC, Canada N2 - A novel three-dimensional epitaxial technique allows on patterned substrates the realization of gallium nitride pillars, also known as nano- and microrods. The typical dimensions of the microrods are in the range of one micron for the radius of the hexagonal footprint and about 10 μm in height. The microrods consist of a semiconductor heterostructure with an n GaN core, a n-GaN shell, a p GaN shell and an intermediate quantum well layer. The field emission properties were investigated in diode configuration by integral field emission measurements in a vacuum chamber at pressures around 10 -9 mbar. The spacer was mica with a thickness of 50 μm. A metallized fine-meshed nitride grid (or a metallized Si-grid) was used as anode. A current of about 1 μA at a voltage of 1250 V (1750 V) was measured. An onset field of about 12.5 MV/m (20 MV/m) and field enhancement factors in the range of 200 to 500 (150 to 300) were found. The investigation with the fine-meshed grid showed an expected pronounced saturation region. KW - field emission KW - GaN KW - LED Y1 - 2016 U6 - https://doi.org/10.1109/IVNC.2016.7551477 SN - 2380-6311 SP - 87 EP - 88 PB - IEEE ER - TY - CHAP A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Ławrowski, Robert Damian A1 - Schreiner, Rupert T1 - Field emission from black silicon structures with integrated gate electrode T2 - 29th International Vacuum Nanoelectronics Conference (IVNC), 2016, 11-15 July, Vancouver, BC, Canada N2 - Black silicon structures with integrated gate electrode were realized by using an improved fabrication process. An enhanced insulation layer was achieved by a combination of dry and wet oxidation, and a gold layer was evaporated as gate electrode. The black silicon structures were prepared with a RIE/ICP etching process at room temperature. Arrays of 16 and 100 apertures with buried p-doped black silicon whiskers have been fabricated. These structures have an emitter height of approximately 1.5 μm with tip radii between 5 nm and 30 nm. The whiskers are surrounded by the gate electrode in a distance of 1.5 μm. Integral field emission measurements yielded an onset voltage of 92 V for 16 apertures and 60 V for 100 apertures for an emission current of 1 nA. Maximum emission currents up to 0.2 μA were observed for the array with 100 apertures at a cathode voltage of 200 V. Stability measurements showed a current fluctuation of ± 21% at a mean value of the emission current of 12 nA over a period of 30 minutes for 16 apertures with b-Si whiskers. KW - field emission KW - black silicon KW - integrated gate electrode Y1 - 2016 U6 - https://doi.org/10.1109/IVNC.2016.7551532 SN - 2380-6311 SP - 219 EP - 220 PB - IEEE ER - TY - CHAP A1 - Ławrowski, Robert Damian A1 - Langer, Christoph A1 - Prommesberger, Christian A1 - Schreiner, Rupert T1 - Microrods and microlines by three-dimensional epitaxially grown GaN for field emission cathodes T2 - International Vacuum Nanoelectronics Conference (IVNC), 30th, 2017, Regensburg N2 - The three-dimensional epitaxial technique allows the realization of gallium nitride lines in addition to the rods. To optimize the properties of GaN-based field emission cathodes further investigations and an improvement of the epitaxial process were performed. The microrods and microlines consist of a one-order higher n-doped gallium nitride in comparison to the gallium nitride layer on the sapphire substrate. The typical height of the microrods and -lines is about 5 μm. The field emission properties of these structures were investigated in diode configuration by integral field emission measurements at pressures below 10 -9 mbar. For the microrods (microlines) a voltage of 1100 V (2000 V) was measured for a field emission current of about 0.5 μA with an onset field of about 12 MV/m (24 MV/m). Furthermore, the field enhancement factors for microrods and -lines are in the range of 300 and 200, respectively. KW - field emission KW - GaN KW - LED KW - Gallium nitride KW - Epitaxial growth Y1 - 2017 U6 - https://doi.org/10.1109/IVNC.2017.8051576 SP - 130 EP - 131 PB - IEEE ER - TY - CHAP A1 - Bachmann, Michael A1 - Dams, Florian A1 - Düsberg, Felix A1 - Hofmann, Martin A1 - Pahlke, Andreas A1 - Langer, Christoph A1 - Ławrowski, Robert Damian A1 - Prommesberger, Christian A1 - Schreiner, Rupert T1 - Extraction of the characteristics of limiting elements from field emission measurement data T2 - 29th International Vacuum Nanoelectronics Conference (IVNC), 2016, 11-15 July, Vancouver, BC, Canada N2 - In this contribution we will present an algorithm to extract the characteristics of non-Fowler-Nordheim (FN) circuit elements from saturation limited field emission (FE) measurement data. The method for calculating the voltage drop on limiting circuit elements is based on circuit theory as well as Newton's method. Since no assumption on the limiting circuit is made, this method is applicable to any FE data showing saturation. To be able to determine the significance of any parameter output, the uncertainties of data and extracted parameters are fully taken into account throughout the algorithm. External serial resistors and a limiting p-doped substrate are analyzed, where the latter shows a diode-like behavior. Y1 - 2016 U6 - https://doi.org/10.1109/IVNC.2016.7551474 SN - 2380-6311 SP - 81 EP - 82 PB - IEEE ER - TY - CHAP A1 - Langer, Christoph A1 - Prommesberger, Christian A1 - Ławrowski, Robert Damian A1 - Schreiner, Rupert A1 - Huang, Yifeng A1 - She, Juncong T1 - Gated p-Si field emission cathode applied in an ionization vacuum gauge T2 - 29th International Vacuum Nanoelectronics Conference (IVNC), 2016, 11-15 July, Vancouver, BC, Canada N2 - A commercial Bayard-Alpert ionization vacuum gauge was equipped with a field emission electron source based on a cathode consisting of an array of 16 gated, p-doped, and DLC-coated Si-tips and characterized. An anode current of about 1.3 μA led to an ion current of 7 fA at 3×10 -7 mbar and 0.8 pA at 4×10 -5 mbar. Whereas at pressures higher than 4×10 -5 mbar the emission current of the electron source decreased, the ratio of ion and anode current remained linear. A nearly constant sensitivity of ~ 17 mbar -1 of the ionization vacuum gauge within the investigated pressure range was depicted. KW - field emission KW - field emitter array KW - Si KW - DLC KW - electron source KW - ionization vacuum gauge Y1 - 2016 U6 - https://doi.org/10.1109/IVNC.2016.7551500 SN - 2380-6311 SP - 145 EP - 146 PB - IEEE ER - TY - CHAP A1 - Bachmann, Michael A1 - Dams, Florian A1 - Düsberg, Felix A1 - Hofmann, Martin A1 - Pahlke, Andreas A1 - Langer, Christoph A1 - Ławrowski, Robert Damian A1 - Prommesberger, Christian A1 - Schreiner, Rupert T1 - Control of the electron source current T2 - International Vacuum Nanoelectronics Conference (IVNC), 30th, 2017, Regensburg N2 - A control circuit to stabilize the flux of electrons transmitted through an extractor electrode is presented. By controlling the emission current a fluctuation with a standard deviation of 0.015% is observed. However, the achievable stability of the transmitted electron current is limited due to a variation of the extraction grid current ratio showing a standard deviation of 4.33%. By regulating the difference of the emission current and the extraction grid current an improved stability of the transmitted electron current down to a standard deviation of 0.280% is observed. Even with operation at 2 × 10 -5 mbar a standard deviation of 0.558% is achieved. KW - Standards KW - Circuit stability KW - Power system stability KW - Current measurement KW - Voltage measurement KW - Electron sources KW - Stability analysis Y1 - 2017 U6 - https://doi.org/10.1109/IVNC.2017.8051550 SP - 66 EP - 67 PB - IEEE ER - TY - CHAP A1 - Ławrowski, Robert Damian A1 - Schreiner, Rupert A1 - Linghu, Shuangyi A1 - Gu, Fuxing T1 - Field Emission Behaviour of Single-Crystal Pd Nanowires T2 - 33rd International Vacuum Nanoelectronics Conference (IVNC): 6-10 July 2020, Lyon, France N2 - Single-crystal Pd nanowires with typically 100 nm diameters and lengths from several micrometers to tens of micrometers were grown on Al 2 O 3 substrates in a furnace with Ar atmosphere. Integral field emission measurements of such samples after Pd coating (~10 nm) were performed in a diode configuration with a 50 μm mica spacer in a vacuum chamber at pressures of about 10 -9 mbar. The IV measurement of the sample shows an integral emission current up to 2 μA at a voltage of 500 V (10 MV/m) and an onset voltage for a current of 1 nA of about 275 V. The corresponding Fowler-Nordheim plot show a linear behavior, like expected for a metal needle. Y1 - 2020 SN - 978-1-7281-9454-7 U6 - https://doi.org/10.1109/IVNC49440.2020.9203510 SP - 1 EP - 2 PB - IEEE ER - TY - CHAP A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Ławrowski, Robert Damian A1 - Schreiner, Rupert T1 - Benzocyclobutene as a novel integrated spacer material in a field emission electron source T2 - International Vacuum Nanoelectronics Conference (IVNC), 30th, 2017, Regensburg N2 - For the realization of a miniaturized field emission electron source we tested benzocyclobutene (BCB) as a new spacer material between cathode and anode. We fabricated black silicon emitters and characterized the emission behavior with an integrated 5 μm thin and large-area spacer of BCB. The integrated BCB layer allows the realization of a compact electron source with only two components consisting of a cathode with BCB and a grid. The comparison with other spacer materials like polyimide (25 μm thickness) or mica (50 μm thickness) revealed for the cathode with BCB a significantly reduced operational voltage of 240 V for a field emission current of 1 μA. KW - field emission KW - benzocyclobutene KW - integrated spacer KW - electron source KW - black silicon Y1 - 2017 U6 - https://doi.org/10.1109/IVNC.2017.8051605 SP - 192 EP - 193 PB - IEEE ER - TY - CHAP A1 - Ławrowski, Robert Damian A1 - Langer, Christoph A1 - Prommesberger, Christian A1 - Schreiner, Rupert T1 - Light emitting diodes based on three-dimensional epitaxial grown crystalline GaN rods T2 - 7. MikroSystemTechnik Kongress "MEMS, Mikroelektronik, Systeme", 23.-25. Oktober 2017, München Y1 - 2017 SN - 978-3-8007-4491-6 SP - 131 EP - 134 PB - VDE-Verlag CY - München ER - TY - CHAP A1 - Lindner, Matthias A1 - Berndt, Dominik A1 - Tschurtschenthal, Karl A1 - Ehrlich, Ingo A1 - Jungbauer, Bastian A1 - Schreiner, Rupert A1 - Pipa, Andrei V. A1 - Hink, Rüdiger A1 - Foest, Rüdiger A1 - Brandenburg, Ronny A1 - Neuwirth, Daniel A1 - Karpen, Norbert A1 - Bonaccurso, Elmar A1 - Weichwald, Robert A1 - Max, Alexander A1 - Caspari, Ralf T1 - Aircraft Icing Mitigation by DBD-based Micro Plasma Actuators T2 - AIAA AVIATION 2020 FORUM: June 15-19, 2020 N2 - We present the application of plasma actuators as a technology for ice prevention at airfoils. The miniaturized dielectric barrier discharge (DBD) plasma actuators (PA) were fabricated by means of microelectromechanical systems (MEMS). We elucidate how to make the actuator samples scalable and applicable to any desired shape by the use of flexible inorganic zirconia substrates. For this purpose, we applied our developed embedding method to integrate the micro actuators in modern carbon/glass fiber reinforced polymer (CFRP/GFRP) materials. Next, the embedded actuator samples were mounted on a mechanical air profile-like fixture and placed in the icing wind tunnel iCORE. The samples were tested in rime ice conditions at temperatures of -15 to -20° C and air speeds up to 30 m/s. Unlike other groups we used a thin film zirconia substrate as dielectric for the plasma actuator. Due to the low substrate thickness of just 150 µm, an operating voltage of 2 kVRMS is already sufficient enough for a stable plasma formation. The experiments show that the operated actuator was able to prevent the ice formation and first indications of a De-icing function were also found. Hence, we show that it is feasible to realize an anti-icing system with zirconia-based plasma actuators operated at lower voltages compared to conventional ones. Y1 - 2020 U6 - https://doi.org/10.2514/6.2020-3243 ER - TY - JOUR A1 - Ławrowski, Robert Damian A1 - Hausladen, Matthias A1 - Buchner, Philipp A1 - Schreiner, Rupert T1 - Silicon Field Emission Electron Source With Individually Controllable Single Emitters JF - IEEE Transactions on Electron Devices N2 - An electron source with an array of individually controllable single tips allows the observation of each emitter current simultaneously as well as the measurement of the integral current. Furthermore, the initial activation process of the individual tips and current distribution of the source can be examined. The Si cathode consists of an array of 2 x 2 conically shaped emitter structures on a borosilicate glass substrate. The emitters were fabricated by laser micromachining and wet etching. Integral field emission (FE) measurements were performed in a diode configuration in a vacuum chamber at pressures of about 10(-9) mbar with a self-aligned Si extraction grid, due to adjustment pins. The total emission current was regulated to a predefined value (4.0, 10, 20, 40, and 50 mu A) by an external regulating circuit and recorded individually during the measurement. The onset voltage for a current of 1 nA varied between 320 and 430 V. The voltage conversion factor is in the range of 7.6 x 10(4) cm(-1) to 1.3 x 10(5) cm(-1). Constant currentmeasurementsover a longer periodof time (1800 values with a sample rate of 0.5 Hz) were performed and show a total current fluctuation less than 0.6% due to the regulation circuit. Despite the stable total current in regulated operation, it was observed that the individual emitters fluctuate up to 75% for low (similar to 10(-8) A) and 5% for high (similar to 10(-5) A) currents. KW - Current distribution KW - current limiters KW - electron emission KW - electron sources KW - silicon-on-insulator Y1 - 2021 U6 - https://doi.org/10.1109/TED.2021.3093374 VL - 68 IS - 8 SP - 4116 EP - 4122 PB - IEEE ER - TY - JOUR A1 - Bachmann, Michael A1 - Düsberg, Felix A1 - Pahlke, Andreas A1 - Edler, Simon A1 - Schels, Andreas A1 - Herdl, Florian A1 - Ławrowski, Robert Damian A1 - Schreiner, Rupert T1 - High current silicon nanowire field emitter arrays JF - Journal of Vacuum Science & Technology B N2 - Arrays of n-doped silicon nanowire field emitters with a high aspect ratio are realized by a novel dry etching technique. Compared to the high current silicon emitters in the literature, the manufacturing process is much simpler and requires only a single photolithography step and two dry etching steps. The cathodes realized with this method exhibit a total current of 20 mA from an active area of 4×4 mm2, which is significantly higher than that for most known structures made from silicon and also represents good performance in comparison with other emitter types, e.g., carbon nanotubes. In addition to characterization in ultrahigh vacuum, measurements at 10−5 mbar are performed and compared with our recent silicon emitters. Compared to these cathodes, the structures with the nanowires exhibit at least two orders of magnitude higher current-carrying capability. Y1 - 2022 U6 - https://doi.org/10.1116/6.0001639 VL - 40 IS - 1 PB - AIP Publishing ER - TY - JOUR A1 - Remskar, Maja A1 - Hüttel, Andreas K. A1 - Shubina, Tatiana V. A1 - Seabaugh, Alan A1 - Fathipour, Sara A1 - Ławrowski, Robert Damian A1 - Schreiner, Rupert T1 - Confinement Related Phenomena in MoS2 Tubular Structures Grown from Vapour Phase JF - Israel Journal of Chemistry N2 - We review recently discovered phenomena observed in the MoS2 tubular structures, which were synthesized by a lasting chemical transport reaction nearly at chemical equilibrium. Such MoS2 nanotubes are distinguished by low density of structural defects, thin walls and a high aspect ratio, which intrinsically provide a confined, edge-free geometry. Quantum confinement with single electron conductance was recorded and a bright exciton photoluminescence with appearance of whispering gallery modes was observed. In addition, the field-effect transistors and field emitters based on single MoS2 nanotubes were demonstrated. These discoveries revitalize research of MoS2 curved structures grown from vapour phase, which were reported several decades ago. Y1 - 2021 U6 - https://doi.org/10.1002/ijch.202100100 SN - 1869-5868 VL - 62 IS - 3-4 SP - 1 EP - 11 PB - Wiley ER - TY - CHAP A1 - Ławrowski, Robert Damian A1 - Bachmann, Michael A1 - Schreiner, Rupert T1 - Field Emission Arrays from Graphite Fabricated by Laser Micromachining T2 - 34th International Vacuum Nanoelectronics Conference (IVNC): 7/5/2021 - 7/9/2021, Lyon, France N2 - Arrays of 4x4 conical shaped emitters were directly structured by laser micromaching. Assembled as an electron source with a spacer and Si-grid, they were investigated by means of IV-measurement in ultra-high vacuum. The IV-measurements of the sample show integral emission currents up to 10 µA at a voltage of 1000 V (11 MV/m). Initially, an ideal FN-behaviour is noticeable. The deviation for higher voltage values in the FN-plot is caused by the change of the work function, which was proven by numerical calculations. KW - field emission array KW - graphite KW - laser micromachining Y1 - 2021 SN - 978-1-6654-2589-6 U6 - https://doi.org/10.1109/IVNC52431.2021.9600736 SP - 1 EP - 2 PB - IEEE ER - TY - CHAP A1 - Lindner, Matthias A1 - Berndt, Dominik A1 - Jungbauer, Bastian A1 - Ehrlich, Ingo A1 - Schreiner, Rupert A1 - Pipa, Andrei V. A1 - Hink, Rüdiger A1 - Foest, Rüdiger A1 - Brandenburg, Ronny A1 - Max, Alexander A1 - Caspari, Ralf T1 - Fabrication, surface integration and testing of miniaturized dielectric barrier discharge plasma actuators for active flow control applications T2 - AIAA Aviation 2019 Forum, 17-21 June 2019, Dallas, Texas Y1 - 2019 U6 - https://doi.org/10.2514/6.2019-2998 ER - TY - CHAP A1 - Langer, Christoph A1 - Ławrowski, Robert Damian A1 - Prommesberger, Christian A1 - Dams, Florian A1 - Serbun, Pavel A1 - Bachmann, Michael A1 - Müller, Günter A1 - Schreiner, Rupert T1 - High aspect ratio silicon tip cathodes for application in field emission electron sources T2 - 2014 27th International Vacuum Nanoelectronics Conference (IVNC), 6-10 July 2014, Engelberg, Switzerland N2 - Precisely aligned arrays of sharp tip structures on top of elongated pillars were realized by using an improved fabrication process including an additional inductively-coupled-plasma reactive-ion etching step. Arrays of n-type and p-type silicon with 271 tips have been fabricated and investigated. Those structures have a total height of 5–6 µm and apex radii less than 20nm. Integral field emission measurements of the arrays yielded low onset-fields in the range of 8–12V=µm and field enhancement factors between 300 and 700. The I-E curves of n-type structures showed the usual Fowler-Nordheim behaviour, whereas p-type structures revealed a significant saturation region due to the limited number of electrons in the conduction band and a further carrier depletion effect caused by the pillar. The maximum integral current in the saturation region was 150 nA at fields above 30V=µm. An excellent stability of the emission current of less than ± 2% fluctuation was observed in the saturation region. For n-type Si a maximum integral current of 10 µA at 24V=µm and an average current stability with a fluctuation of ± 50% were measured. KW - Current measurement KW - Etching KW - FABRICATION KW - field emission KW - field emitter array KW - GEOMETRY KW - Iron KW - Sensor arrays KW - silicon KW - silicon tip Y1 - 2014 U6 - https://doi.org/10.1109/IVNC.2014.6894824 SP - 222 EP - 223 PB - IEEE ER - TY - JOUR A1 - Bachmann, Michael A1 - Düsberg, Felix A1 - Langer, Christoph A1 - Herdl, Florian A1 - Bergbreiter, Lukas A1 - Dams, Florian A1 - Miyakawa, Natuski A1 - Eggert, Tobias A1 - Pahlke, Andreas A1 - Edler, Simon A1 - Prommesberger, Christian A1 - Ławrowski, Robert Damian A1 - Hausladen, Matthias A1 - Schreiner, Rupert T1 - Vacuum-sealed field emission electron gun JF - Journal of Vacuum Science & Technology B N2 - A compact vacuum-sealed field emission electron gun with an operation voltage below 5 kV is presented. With a 150 nm thick pyrolytic carbon membrane, a transmission of 40% at 5 kV is obtained. For more than 2500 h of continuous operation at an emission current of 100 nA, no significant increase (<50V ) and almost no degradation were found. From this measurement, a lifetime of more than 10 000 h at continuous operation with approximately a linear increase of the extraction voltage from about 545 V to about 730 V is predicted. This electron source enables application of field emitter arrays in poor vacuum or even ambient pressure. ACKNOWLEDGMENT This work was supported by the German Federal Ministry for Economic Affairs and Energy under Project No. ZF4081502GM8. C.P., R.L., M.H., and R.S. were supported by Grant No. ZF4562901GM8. Y1 - 2020 U6 - https://doi.org/10.1116/1.5139316 VL - 38 IS - 2 PB - AIP Publishing ER - TY - JOUR A1 - Langer, Christoph A1 - Prommesberger, Christian A1 - Ławrowski, Robert Damian A1 - Dams, Florian A1 - Schreiner, Rupert T1 - Simulation and Fabrication of Silicon Field Emission Cathodes for Cold Electron Sources JF - Advanced Materials Research N2 - We report on the simulation and fabrication of nanostructured silicon surfaces for field emission (FE) applications, e.g. ionization sensors and x-ray tubes. For the design and optimization of field-emitting silicon structures, the influence of the geometric parameters like tip height, apex radius, aperture angle and curvature shape on the field enhancement factor was investigated by simulation using finite element method. A universal geometric model which describes the real geometry of our silicon structures sufficiently accurate was taken for modeling a variety of different silicon tip structures as well as ridge structures. While a high dependency of the field enhancement on the aspect ratio and the aperture angle was found, the simulations show that the elliptic curvature affects the field enhancement only marginally. Finally, an improved process for fabrication of such silicon structures on n-type as well as p-type substrate is described, using reactive ion etching with adjustable anisotropy, wet thermal oxidation and wet etching. KW - field emission cathodes KW - field enhancement factor KW - silicon field emitter Y1 - 2014 U6 - https://doi.org/10.4028/www.scientific.net/amr.1024.48 VL - 1024 SP - 48 EP - 51 ER - TY - JOUR A1 - Ławrowski, Robert Damian A1 - Bachmann, Michael A1 - Schreiner, Rupert T1 - Field emission arrays from graphite fabricated by laser micromachining JF - Journal of Vacuum Science & Technology B N2 - Laser micro structuring allows the manufacturing of conical shaped emitters on a graphitized carbon substrate without any additional treatment. Integral field emission measurements were performed in a diode configuration with a 50 µm mica spacer and a metalized Si-grid in a vacuum chamber at pressures of about 10-9 mbar. Emission currents up to 10 µA at a voltage of 1000 V (11 MV/m) with a positive current drift were observed for an array of 16 emitters. A strong modification of the emitter tip is noticeable after individual measurements. A comparable alteration of the surface is also achieved by an electrochemical treatment of the samples with a potassium hydroxide solution. However, the IV-measurements of such samples show higher onset voltages, but also higher integral emission currents. For all arrays an ideal FN behaviour is only noticeable at applied voltages below 625 V (7 MV/m). Numerical calculations indicate that the deviation in the FN-plot for higher voltage values is caused by the change of the effective work function. Y1 - 2022 U6 - https://doi.org/10.1116/6.0001547 VL - 40 IS - 2 PB - AIP Publishing ER - TY - JOUR A1 - Ławrowski, Robert Damian A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Dams, Florian A1 - Schreiner, Rupert T1 - Improvement of Homogenity and Aspect Ratio of Silicon Tips for Field Emission by Reactive-Ion Etching JF - Advances in materials science and engineering N2 - The homogeneity of emitters is very important for the performance of field emission (FE) devices. Reactive-ion etching (RIE) and oxidation have significant influences on the geometry of silicon tips. The RIE influences mainly the anisotropy of the emitters. Pressure has a strong impact on the anisotropic factor. Reducing the pressure results in a higher anisotropy, but the etch rate is also lower. A longer time of etching compensates this effect. Furthermore an improvement of homogeneity was observed. The impact of uprating is quite low for the anisotropic factor, but significant for the homogeneity. At low power the height and undercut of the emitters are more constant over the whole wafer. The oxidation itself is very homogeneous and has no observable effect on further variation of the homogeneity. This modified fabrication process allows solving the problem of inhomogeneity of previous field emission arrays. Y1 - 2014 U6 - https://doi.org/10.1155/2014/948708 VL - 2014 PB - Hindawi ER - TY - GEN A1 - Bieker, Johannes A1 - Schlaak, Helmut F. A1 - Wilfert, Stefan A1 - Ławrowski, Robert Damian A1 - Hausladen, Matthias A1 - Schreiner, Rupert T1 - Development of FE-based electron sources for XHVion gauges in cryogenic vacuum environments T2 - 32nd International Vacuum Nanoelectronics Conference (IVNC 2019), 22.-26.07.2019, Cincinnati, USA Y1 - 2019 ER - TY - GEN A1 - Ławrowski, Robert Damian A1 - Hausladen, Matthias A1 - Schreiner, Rupert T1 - Individually Addressable Silicon Field Emission Cathodes Fabricated by Laser Micromachining T2 - 7th ITG International Vacuum Electronics Workshop (IVEW) 2020 and 13th International Vacuum Electron Sources Conference (IVeSC) 2020, 26. - 29.5.2020, Bad Honnef Y1 - 2020 ER - TY - GEN A1 - Hausladen, Matthias A1 - Ławrowski, Robert Damian A1 - Schreiner, Rupert T1 - Fast Pulse Source for Field Emission Applications T2 - 7th ITG International Vacuum Electronics Workshop (IVEW) 2020 and 13th International Vacuum Electron Sources Conference (IVeSC) 2020, 26. - 29.5.2020, Bad Honnef Y1 - 2020 ER - TY - CHAP A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Ławrowski, Robert Damian A1 - Muller, F. A1 - Dams, Florian A1 - Schreiner, Rupert A1 - Serbun, Pavel A1 - Müller, Günter T1 - Comparison of integral and local field-emission properties of Mo-coated p-Si tip arrays T2 - 2015 28th International Vacuum Nanoelectronics Conference (IVNC), 13-17 July 2015, Guangzhou, China N2 - Silicon tip arrays were fabricated by means of reactive ion etching followed by oxidation for final sharpening and molybdenum thin film coating. The field-emission (FE) properties of these Mo-coated p-Si tip arrays were systemically investigated by different measurement techniques. Integral measurements in diode configuration yielded a turn-on field (for 1 nA) of 22 V/μm and nearly stable FE currents up to 6.6 μA at 38 V/μm. The effective field enhancements factor extracted from the FN plots is about 180. Detailed investigations of these FE arrays were also performed by means of field emission scanning microscopy combined with electron microscopy. A rather limited efficiency of the tips (50% at 1500 V) and FE homogeneity (180 nA at 700 V) might be correlated with the varying morphology of the tips and the presence of oxides. Local I-V measurements of selected single tips revealed both activation and deactivation effects, which finally resulted in nearly reproducible I-V curves. Current stability measurements at a constant voltage showed rather large fluctuations (0.1-1 μA) of the FE current, which could be reduced up to 1.7% by using of a PID-regulated voltage source. SEM images showed unchanged tip shape after the current processing. KW - CATHODES KW - Coatings KW - Current measurement KW - field emission KW - Iron KW - Mo-coated KW - p-Si tip KW - Scanning electron microscopy KW - silicon KW - tip arrays KW - Vacuum technology Y1 - 2015 U6 - https://doi.org/10.1109/IVNC.2015.7225579 SP - 192 EP - 193 PB - IEEE ER - TY - CHAP A1 - Ławrowski, Robert Damian A1 - Langer, Christoph A1 - Prommesberger, Christian A1 - Dams, Florian A1 - Bachmann, Michael A1 - Schreiner, Rupert T1 - Fabrication and simulation of silicon structures with high aspect ratio for field emission devices T2 - 2014 27th International Vacuum Nanoelectronics Conference (IVNC), 6-10 July 2014, Engelberg, Switzerland N2 - To obtain higher field enhancement factors of Si-tip structures, we present an improved fabrication process utilizing reactive-ion etching (RIE) with an inductively coupled plasma (ICP). In our design, a pillar under the tips is realized by a combination of RIE with ICP. With adjusted power settings (≈ 240 W) and step times (<; 5 s), vertical slopes with a low roughness of approximately 10 nm to 20 nm are possible. The remaining silicon is oxidized thermally to sharpen the emitters. A final tip radius of R <; 20 nm is obtained for the tips of the emitters. The pillar height HP can be mainly adjusted by the duration of the ICP-etching step. A total emitter height of H ≈ 6 μm with a pillar height of HP ≈ 5 μm is achieved. Simulations with COMSOL Multiphysics® are applied to calculate the field enhancement factor β. A two-dimensional model is used in rotational symmetry. In addition to the previous model, a pillar with a varying diameter ØP and height HP is added. A conventional emitter (H = 1 μm and R = 20 nm) placed on a pillar of the height HP ≈ 5 μm approximately results in a three times higher β-factor (β≈ 105). By decreasing the diameter ØP a slight increase of the β-factor is observed. However, the aspect ratio of the emitter mainly influences on the β-factor. KW - Anodes KW - CATHODES KW - FABRICATION KW - field emission KW - field emitter array KW - field enhancement factor KW - Iterative closest point algorithm KW - Lead KW - silicon tips Y1 - 2014 U6 - https://doi.org/10.1109/IVNC.2014.6894805 SP - 193 EP - 194 PB - IEEE ER - TY - CHAP A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Ławrowski, Robert Damian A1 - Dams, Florian A1 - Schreiner, Rupert A1 - Ławrowski, Robert Damian T1 - Gated p-Si field emitter arrays for sensor applications T2 - 2015 28th International Vacuum Nanoelectronics Conference (IVNC) N2 - We report on gated p-type Si-tip array cathodes for implementation into field emission electron sources for sensor applications. Arrays of 16 and 100 tips with tip heights of 3 μm and tip radii below 30 nm with integrated gate electrodes concentrically positioned 2 μm below the tip apexes were fabricated using an improved process, which leads to an enhanced isolation layer quality with sufficient breakdown field strengths and low leakage currents. Integral measurements with a fixed grid potential of 400 V showed emission currents up to 35 μA for 100 tips at a cathode voltage of 150 V and an almost negligible parasitic gate current. The array with 16 p-type Si-tips showed a significant stabilization of the emission current in the range of 0.3 - 0.4 μA, for cathode voltages between 90 V and 150 V. The current fluctuation in this saturation regime was measured for 10 minutes and a value of less than ± 1% was observed. No degradation of the cathode was found after 6 hours of operation at a constant cathode voltage of 100 V and a constant grid voltage of 400 V. KW - CATHODES KW - Current measurement KW - Current stabilization KW - field emission KW - integrated gate-electrode KW - Iron KW - Logic gates KW - semiconductor KW - Semiconductor device measurement KW - silicon KW - silicon tip array Y1 - 2015 U6 - https://doi.org/10.1109/IVNC.2015.7225567 SP - 164 EP - 165 PB - IEEE ER - TY - CHAP A1 - Langer, Christoph A1 - Prommesberger, Christian A1 - Ławrowski, Robert Damian A1 - Müller, F. A1 - Schreiner, Rupert A1 - Serbun, Pavel A1 - Müller, Günter T1 - Enhanced field emission from p-doped black silicon on pillar structures T2 - 2015 28th International Vacuum Nanoelectronics Conference (IVNC), 13-17 July 2015, Guangzhou, China N2 - Aligned square arrays of black silicon (b-Si) on top of pillars were fabricated on p-type silicon substrate by a deep-etching step combined with a b-Si process. Two 10×10 arrays with pillar heights of 8 μm and 20 μm and one b-Si reference sample without pillars were investigated. Integral field emission (FE) measurements of the arrays yielded rather low onset-fields between 6.4 V/μm and 13.5 V/μm and field enhancement factors between 430 and 800. The I-V curves showed typical Fowler-Nordheim behavior for low fields, whereas a saturation region was observed at higher fields. The maximum integral current in the saturation region was 8 μA at a field of 20 V/μm. The stability of the emission current was investigated over 3 hours and revealed moderate fluctuations of ± 8% in the saturation region. Voltage scans showed well-aligned FE from nearly all pillars. KW - black silicon KW - CATHODES KW - Current measurement KW - Etching KW - FABRICATION KW - field emission KW - field emitter array KW - Iron KW - silicon KW - Vacuum technology Y1 - 2015 U6 - https://doi.org/10.1109/IVNC.2015.7225547 SP - 104 EP - 105 PB - IEEE ER - TY - CHAP A1 - Prommesberger, Christian A1 - Ławrowski, Robert Damian A1 - Langer, Christoph A1 - Dams, Florian A1 - Schreiner, Rupert T1 - Realisierung von Siliziumspitzenarrays mit integrierter Gate-Elektrode für Anwendungen in der Vakuumsensorik T2 - 4. Landshuter Symposium Mikrosystemtechnik, Mikrosystemtechnik als Schlüsseltechnologie der Systemintegration, Tagungsband zum Symposium 12./13. März 2014, Hochschule Landshut N2 - Bei der Feldemission (kalte Emission) können Elektronen durch ein starkes elektrisches Feld eine glatte und leitende Oberfläche verlassen. Die Elektronen tunneln dabei durch eine Potentialbarriere, deren Breite durch ein äußeres elektrisches Feld verkleinert wird. Durch das Hinzufügen einer integrierten Gate-Elektrode um eine Siliziumspitze kann die notwendige Einsatzspannung für Feldemission deutlich gesenkt werden. Zwischen Si-Kathode und Gate-Elektrode befindet sich dabei eine Isolationsschicht, die höchste Anforderungen bezüglich der elektrischen Durchbruchsfestigkeit erfüllen muss. Mit einer Kombination aus Trocken- (Schichtdicke 50 nm) und Feuchtoxid (Schichtdicke 950 nm) konnte eine Isolationsschicht entwickelt werden, die im integrierten Aufbau eine minimale Durchbruchsfeldstärke von 3,2 MV/cm aufweist. Für die Realisierung von Siliziumkathoden mit integrierter Gate-Elektrode wurde ein bereits bestehender Herstellungsprozess um zusätzliche Prozessschritte erweitert. Die Übertragung der lateralen Position der Spitze erfolgt durch Strukturierung des Umkehrlacks AZ5214 und einer RIE-Ätzung der zuvor hergestellten SiO2-Schicht. Nach dem Entfernen der Lackschicht wird die vertikale Struktur der Siliziumspitzen durch einen RIE-Ätzprozess mit den Prozessgasen SF6 und O)2 realisiert. Aus einer thermischen Oxidation bei 940 °C resultiert anschließend die Isolationsschicht zwischen Si-Kathode und Gate-Elektrode . Gleichzeitig wird diese Anschärfeoxidation auch zur Realisierung der endgültigen Spitzengeometrie verwendet. Durch die lithographische Strukturierung des Photolacks AZ5214 kann dabei die Fläche der aufgedampften Gate-Elektrode festgelegt werden. Die Gate-Elektrode wird in einem selbstjustierenden Prozessschritt exakt konzentrisch um die Si-Spitze aufgedampft. Der gerichtete Aufdampfprozess bewirkt eine Abschattung, so dass das Oxidplättchen nicht komplett von Metall ummantelt wird. Die Opferschicht aus Photolack wird mit den nicht benötigten Metallflächen in einem Lift-off-Prozess entfernt. KW - elektrischer Durchbruch KW - Feldelektronenemission KW - Halbleiterschicht KW - Isolierschicht KW - Kathode KW - Silicium KW - Vakuumsensor Y1 - 2014 SN - 978-3-9812696-5-9 SP - 36 EP - 41 CY - Landshut ER - TY - CHAP A1 - Ławrowski, Robert Damian A1 - Deml, Sonja A1 - Varghese, T. A1 - Schimpke, T. T1 - Leuchtdiodenchips mit dreidimensional epitaktisch gewachsenen kristallinen GaN Säulen T2 - 7. MikroSystemTechnik Kongress "MEMS, Mikroelektronik, Systeme", 23.-25. Oktober 2017, München N2 - Um die Eigenschaften von Leuchtdioden zu verbessern und den Herstellungsprozess zu vereinfachen, wurde ein erweitertes Verfahren der metallorganischen Gasphasenepitaxie verwendet, um dichtgepackte dreidimensionale GaN-Säulen mit hohen Aspektverhältnis auf Chipoberflächen zu wachsen. Diese selbstorganisierenden dreidimensionalen Strukturen sollen einerseits die lichtabstrahlende Oberfläche der Leuchtdiode bei gleichbleibender Chipgröße vergrößern und andererseits durch die nichtpolaren Kristallebenen an den Seiten- und Deckflächen der Säulen die Effizienz dieser Bauteile erhöhen. Messungen an ersten Bauteilen, die mit dieser Methode realisiert wurden, zeigen eine homogene blaue Emission bei Wellenlängen von 450 nm und abgestrahlte Lichtleistungen von bereits mehr als 50 mW bei Stromdichten von 120 A/cm². Diese Ergebnisse sind bereits sehr vielversprechend und lassen eine deutliche Performancesteigerung bei Optimierung der Herstellungstechnologie erwarten. N2 - In order to increase the performance and to simplify the production of light emitting diode chips, an advanced metal organic vapor-phase-epitaxy process was used for the growth of densely packed high-aspect-ratio GaN microrods on the chip surface. The purpose of these self-organizing structures is, to increase the effective light emitting surface of the chip as well as to improve the efficiency. Measurements on first structures have shown blue emission at wavelengths of 450 nm and emitted output power of more than 50 mW at current densities of 120 A/cm². These promising results let us expect a significant improvement when optimizing the fabrication process further. T2 - Light emitting diodes based on three-dimensional epitaxial grown crystalline GaN rods KW - Aufbauorganisation KW - Ausgangsleistung KW - dreidimensionale Struktur KW - Fertigungstechnologie KW - Herstellungsablauf KW - Kristallebene KW - Leuchtdiode KW - Metalldampf KW - metallorganische Gasphasenepitaxie KW - organischer Dampf KW - Produktionsprozess KW - Stromdichte KW - Wellenlänge Y1 - 2017 SN - 978-3-8007-4491-6 SP - 131 EP - 134 PB - VDE-Verlag CY - München ER - TY - CHAP A1 - Ławrowski, Robert Damian A1 - Langer, Christoph A1 - Prommesberger, Christian A1 - Dams, Florian A1 - Serbun, Pavel A1 - Müller, Günter A1 - Schreiner, Rupert T1 - Spitzen- und Kantenemitter aus Silizium mit einem hohen Aspektverhältnis für Ionisationsgassensoren T2 - Mikrosystemtechnik als Schlüsseltechnologie der Systemintegration : 4. Landshuter Symposium Mikrosystemtechnik ; Tagungsband zum Symposium ; 12./13. März 2014, Hochschule Landshut N2 - Durch die Optimierung von reaktivem Ionenätzen mit induktiv gekoppeltem Plasma ist die Herstellung von verschiedenen Siliziumkathoden mit hoher Anisotropie und hohem Aspektverhältnis für Feldemissionsanwendungen möglich. Simulationen mit COMSOL Multiphysics untermauern das Potential von solchen Spitzen- und Kantenfeldemittern. Die Ergebnisse der Simulation zeigen einen zwei- bis sechsfach höheren Feldüberhöhungsfaktor der tiefgeätzten Strukturen im Vergleich zu identischen Emittern ohne zusätzliche Tiefenätzung. Feldemissionsmessungen bestätigen die Simulationsergebnisse. Der modifizierte Herstellungsprozess der Feldemitter ermöglicht somit einen zuverlässigen Betrieb von Feldemissionselektronenquellen bei kleineren makroskopischen Feldstärken. Außerdem weisen die Messungen des Emissionsstroms im Sättigungsbereich eine weitgehende Unabhängigkeit vom elektrischen Feld auf. Lokale Feldemissionsmessungen ergeben dadurch eine deutliche Stromstabilisierung, welche über große Feldstärkenbereiche konstant bleibt. Die Nutzung der HAR-Emitter (high aspect ratio) ist damit eine gute Voraussetzung für einen zuverlässigen Betrieb der Emissionskathoden bei kleinen Feldstärken für die Anwendung in Ionisationsgassensoren. KW - Emitter KW - Feldelektronenemission KW - Gassensor KW - Herstellung KW - Ionenemission KW - Silicium Y1 - 2014 SN - 978-3-9812696-5-9 SP - 28 EP - 35 PB - Cluster Mikrosystemtechnik CY - Landshut ER - TY - JOUR A1 - Ławrowski, Robert Damian A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Dams, Florian A1 - Schreiner, Rupert T1 - Improvement of Homogeneity and Aspect Ratio of Silicon Tips for Field Emission by Reactive-Ion Etching JF - Advances in Materials Science and Engineering. Special issue: Advances in Smart Materials and Applications N2 - The homogeneity of emitters is very important for the performance of field emission (FE) devices. Reactive-ion etching (RIE) and oxidation have significant influences on the geometry of silicon tips. The RIE influences mainly the anisotropy of the emitters. Pressure has a strong impact on the anisotropic factor. Reducing the pressure results in a higher anisotropy, but the etch rate is also lower. A longer time of etching compensates this effect. Furthermore an improvement of homogeneity was observed. The impact of uprating is quite low for the anisotropic factor, but significant for the homogeneity. At low power the height and undercut of the emitters are more constant over the whole wafer. The oxidation itself is very homogeneous and has no observable effect on further variation of the homogeneity. This modified fabrication process allows solving the problem of inhomogeneity of previous field emission arrays. Y1 - 2014 U6 - https://doi.org/10.1155/2014/948708 SN - 1687-8442 SN - 1687-8434 VL - 2014 SP - 1 EP - 6 PB - Hindawi ER - TY - CHAP A1 - Ławrowski, Robert Damian A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Dams, Florian A1 - Schreiner, Rupert T1 - Influence of reactive ion etching parameters on the geometry of silicon tip cathodes for field emission T2 - Applied Research Conference 2013, ARC 2013 : 17th and 18th October 2013, Deggendorf Y1 - 2013 SN - 978-3-8440-2274-2 SP - 67 EP - 69 PB - Shaker CY - Aachen ER - TY - CHAP A1 - Ławrowski, Robert Damian A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Dams, Florian A1 - Schreiner, Rupert T1 - Feldemissionselektronenquellen basierend auf Siliziumemittern mit hohen Aspektverhältnis T2 - Forschungsbericht der OTH Regensburg 2013 Y1 - 2013 UR - https://doi.org/10.35096/othr/pub-799 SP - 47 EP - 48 CY - Regensburg ER - TY - JOUR A1 - Lindner, Matthias A1 - Pipa, Andrei V. A1 - Brandenburg, Ronny A1 - Schreiner, Rupert T1 - Expansion of surface barrier discharge scrutinized JF - Plasma Sources Science and Technology N2 - Developing the fundamentals for the electrical diagnostics of surface dielectric barrier discharges (SDBDs) is of enormous importance for several applications, for example, flow control and gas cleaning. The main challenge is to account for the discharge expansion along the dielectric surface. Typically, a linear expansion with the amplitude of the applied voltage is observed. In this work, we report on a step-wise SDBD expansion along the Al 2 O 3 dielectric surface. More specific, the discharge occupied a certain area after ignition, which remained constant until the voltage exceeded the critical amplitude V L . This absence of expansion is seen as a linear dependence of the discharge power on the applied voltage and it was additionally confirmed by photographs with long exposure times. This novel phenomenon is more pronounced for thicker dielectrics. It is suggested that the derivative of the charge-voltage characteristics can be used for the determination of all essential parameters of the simplest equivalent circuit of SDBDs. Moreover, it was shown that the derivative of the charge-voltage characteristics for the positive half-cycle of the discharge agrees numerically with the voltage dependence of the reactor capacitance derived from photographs. This agreement between both measurement methods indicates a similar step-wise expansion of the SDBD even if a voltage amplitude above V L is applied. … Y1 - 2022 U6 - https://doi.org/10.1088/1361-6595/ac95bf VL - 31 IS - 10 PB - IOP Publishing ER - TY - CHAP A1 - Mingels, Stephan A1 - Bornmann, Benjamin A1 - Lützenkirchen-Hecht, Dirk A1 - Müller, Günter A1 - Langer, Christoph A1 - Prommesberger, Christian A1 - Schreiner, Rupert ED - Scholl, Caitlin ED - Schaa, Volker R.W. T1 - Electric Field Dependence of Photoemission from n- and p-type Si Crystals T2 - Proceedings, 35th International Free Electron Laser Conference (FEL 2013) : New York, NY, USA, August 26-19, 2013 N2 - The performance of free electron lasers depends on the brilliance of the electron source. Nowadays photo-cathodes (e.g. Cs2Te) are used despite of their high emittance. To develop robust and more brilliant cathodes we have built up an UHV system which enables systematic photoemission (PE) measurements with a tunable pulsed laser (hv) at high electric fields (E). First results on Au and Ag crystals revealed only low quantum efficiency (QE) due to fast electron relaxation. Hence, we have started QE(hv,E) investigations on n- and p-Si wafers. Resonant PE was observed above as well as below the work function O, which can be assigned to optical transitions in the electronic band structure or explained by thermally excited states at the bottom of the conduction band. As expected, only low QE values were achieved even for n-Si probably due to surface oxide. Moreover, a significant rise of the QE peaks above O were obtained for n-Si at E >8 MV/m but limited by the occurrence of parasitic field emission from dust particles. Y1 - 2013 UR - https://accelconf.web.cern.ch/FEL2013/papers/tupso49.pdf#search=%20domain%3Daccelconf%2Eweb%2Ecern%2Ech%20%20%2Bauthor%3A%22schreiner%22%20%20url%3Aaccelconf%2FFEL2013%20FileExtension%3Dpdf%20%2Durl%3Aabstract%20%2Durl%3Aaccelconf%2Fjacow SN - 9783954501267 SP - 339 EP - 343 PB - Curran CY - Red Hook, NY ER - TY - CHAP A1 - Schreiner, Rupert A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Dams, Florian A1 - Serbun, Pavel A1 - Bornmann, Benjamin A1 - Navitski, Aliaksandr A1 - Müller, Günter T1 - Highly uniform and stable electron field emission from B-doped Si-tip arrays for applications in integrated vacuum microelectronic devices T2 - 25th International Vacuum Nanoelectronics Conference (IVNC) - Jeju, Korea (South), 09.07. - 13.07.2012 N2 - In order to improve the uniformity and field emission stability of p-type silicon tip arrays for pulsed sensor applications, we have systematically studied the influence of the fabrication parameters on the tip shape and the specific operating conditions. Based on detailed design calculations of the field enhancement, we have fabricated a series of hexagonal arrays of B-doped Si-tips in a triangular arrangement, each containing a different number of tips (91, 575 and 1300) of 1 μm height, 20 nm apex radius, and 20 μm pitch. The field emission properties of both individual tips and complete arrays were investigated with by field emission scanning microscopy. The current plateaus of these tips typically occur at about 10 nA and 60 V/μm field level. In this carrier depletion range, single tips provide the highest current stability (<; 4%) and optical current switching ratios of ~2.5. Rather homogeneous emission of the tip arrays leads to an almost linear scaling of the saturation current (2 nA/tip) and to a much improved current stability (<; 1%) measured over 1 hour. KW - boron KW - circuit stability KW - elemental semiconductors KW - field emission ion microscopy KW - field emitter arrays KW - integrated optoelectronics KW - microfabrication KW - microsensors KW - optical switches KW - silicon tips Y1 - 2012 SN - 978-1-4673-1984-3 SN - 978-1-4673-1983-6 SN - 978-1-4673-1982-9 U6 - https://doi.org/10.1109/IVNC.2012.6316857 SN - 2380-6311 SN - 2164-2370 SP - 1 EP - 2 PB - IEEE CY - Piscataway, NJ. ER - TY - CHAP A1 - Schreiner, Rupert A1 - Dams, Florian A1 - Prommesberger, Christian A1 - Bornmann, Benjamin A1 - Serbun, Pavel A1 - Navitski, Aliaksandr A1 - Müller, Günter T1 - Silicon-based integrated field emission electron sources for sensor application T2 - 24th International Vacuum Nanoelectronics Conference (IVNC), 2011 : 18 - 22 July 2011, Wuppertal, Germany N2 - We report on the design, fabrication and characterization of p-type silicon field emitter arrays for the application in compact fast switchable electron sources. Since standard silicon technology has been used to prepare the devices, they can be easily integrated with other silicon based sensors and electronic components, too. The emitter arrays consist of approx. 3×105 tips per cm2, with a tip radius less than 20 nm. By using self-aligned processes, an integrated gate electrode with a diameter of  3 μm was placed concentrically around the tips. A mesh of silicon-beams with a grating period of 100 μm and beam width of 20 μm forms the anode of the electron source. A glass wafer (thickness 300 μm) acts as spacer between anode and Si-tip cathode. Characterization of the field emission properties of the emitter arrays was performed by high resolution field emission scanning microscopy. The emitter arrays exhibit a highly stable and very homogeneous emission. A maximum stable current of 0.1 μA per tip was found. A saturation level in the voltage current characteristics, which was found at around 10 nA, supports current stabilisation and will enable optical modulation of the emission current. KW - anodes KW - cathodes KW - field emission electron microscopy KW - field emission electron sources KW - field emitter arrays KW - silicon tips KW - structured cold cathode KW - vacuum sensors Y1 - 2012 UR - https://ieeexplore.ieee.org/document/6004541?arnumber=6004541 SP - 19 EP - 20 PB - IEEE CY - Piscataway, NJ ER - TY - CHAP A1 - Bornmann, Benjamin A1 - Mingels, Stephan A1 - Serbun, Pavel A1 - Lützenkirchen-Hecht, Dirk A1 - Müller, Günter A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Dams, Florian A1 - Schreiner, Rupert T1 - Photosensitivity of electron field emission from B-doped Si-tip arrays T2 - 25th International Vacuum Nanoelectronics Conference (IVNC) ; Jeju, Korea (South), 09.07.2012 - 13.07.2012 N2 - The electron current from field-emitting B-doped Si-tip arrays under illumination was studied. An improved cathode design with a patch of 271 tips yielded a reproducible cathode current between 0.2-2000 nA in the electric field range of 3.8-6.6 V/μm. The plateau in the Fowler-Nordheim plot shows the actual carrier depletion and leads to a very stable emission at ~1 μA with a current noise of less than 3.3 %. Color-filtered halogen lamp illumination was used to investigate the photo-sensitivity of the saturation current. The intensity-normalized current switching ratio increases nonlinearly with the photon energy. This hints either for secondary generation in the conduction band or deeper valence band excitation. The first is supported by a rough estimation of the quantum efficiency. Further experiments with a tunable laser and electron spectroscopy are planned. KW - boron KW - electron field emission KW - electron spectroscopy KW - elemental semiconductors KW - field emitter arrays KW - halogens KW - lamps KW - lighting KW - p-doped Si tips KW - photosensitivity KW - silicon KW - valence bands Y1 - 2012 SN - 978-1-4673-1984-3 SN - 978-1-4673-1983-6 SN - 978-1-4673-1982-9 U6 - https://doi.org/10.1109/IVNC.2012.6316980 SN - 2380-6311 SN - 2164-2370 SP - 1 EP - 2 PB - IEEE ER - TY - CHAP A1 - Langer, Christoph A1 - Prommesberger, Christian A1 - Dams, Florian A1 - Serbun, Pavel A1 - Bornmann, Benjamin A1 - Mingels, Stephan A1 - Müller, Günter A1 - Schreiner, Rupert T1 - Si-Feldemissionskathoden für Anwendungen in miniaturisierten Ionisationsvakuumsensoren T2 - Verhandlungen der Deutschen Physikalischen Gesellschaft e.V. (DPG), Regensburg, 10. - 15. März 2013 N2 - Feldemissionselektronenquellen sind aufgrund ihrer prinzipiellen Vorteile gegenüber Glühkathoden bereits seit längerer Zeit Gegenstand der Forschung und werden bisher nur in einigen Spezialanwendungen erfolgreich eingesetzt. Hierbei werden Einzelspitzen mit Spannungen im kV-Bereich und Strömen im nA-Bereich betrieben. Dagegen werden für miniaturisierte Sensorsysteme eher Spannungen von ca. 100 V und Ströme von ca. 1 mA benötigt. Dazu wurden bisher meist Feldemissionskathoden mit CNTs vorgeschlagen, welche für Anwendungen in der Halbleiterindustrie aufgrund des Kohlenstoffanteils nicht erwünscht sind. Ziel unserer Arbeit ist es, Si-basierte Elektronenquellen zu realisieren, die mit anderen miniaturisierten Vakuumsensoren auf einem Chip integrierbar sind. Mithilfe eines optimierten Herstellungsprozesses konnten wir p-Si-Spitzenarrays mit Spitzenradien von wenigen nm realisieren [1]. Messungen an diesen Strukturen zeigen ein sehr homogenes Emissionsverhalten, das vor allem im Sättigungsbereich bei Emissionsströmen von ca. 10 nA pro Spitze zeitlich stabil (Schwankungen < 5 %) und optisch schaltbar (Faktor > 2.5) ist [2]. Y1 - 2013 UR - https://www.researchgate.net/publication/281373011_Si-Feldemissionskathoden_fur_Anwendungen_in_miniaturisierten_Ionisationsvakuumsensoren PB - Deutsche Physikalische Gesellschaft e.V. ER - TY - JOUR A1 - Bornmann, Benjamin A1 - Mingels, Stephan A1 - Dams, Florian A1 - Prommesberger, Christian A1 - Schreiner, Rupert A1 - Lützenkirchen-Hecht, Dirk A1 - Müller, Günter T1 - Electron spectrometer in adjustable triode configuration for photo-induced field emission measurements JF - The Review of scientific instruments N2 - We have constructed a new ultrahigh vacuum apparatus with a triode configuration for the systematic investigation of photo-induced field emission (PFE) from metallic or semiconducting cathodes. These are exposed to electric fields up to 400 MV∕m and laser irradiation by means of hole or mesh gates. Cathodes and gates are in situ exchangeable and adjustable with high precision to ensure a homogeneous extraction of electrons which are partially transmitted to the fixed electron spectrometer. Its hemispherical sector analyzer provides an energy resolution limit of 8 meV. The commissioning of the measurement system has been performed with a tungsten needle. Its temperature showed up in the high-energy tail of the electron spectrum, while its work function was derived from the spectral low-energy part combined with the integral current-voltage curve. First PFE measurements on B-doped Si-tip arrays yielded a small field emission current increase under green laser illumination. A shift and splitting of the energy spectra was observed which revealed different emission regimes as well as the photosensitivity of the cathode due to carrier excitation into the conduction band. For the full exploitation of the PFE system, a tunable laser over a wide eV-range is required. Y1 - 2012 U6 - https://doi.org/10.1063/1.3673475 VL - 83 IS - 1 PB - American Institute of Physics CY - Melville, NY ER - TY - CHAP A1 - Bornmann, Benjamin A1 - Mingels, Stephan A1 - Lützenkirchen-Hecht, Dirk A1 - Müller, Günter A1 - Dams, Florian A1 - Schreiner, Rupert T1 - Field emission spectroscopy studies on photo-sensitive p-doped Si-tip arrays T2 - 24th International Vacuum Nanoelectronics Conference (IVNC), 2011 : 18 - 22 July 2011, Historische Stadthalle Wuppertal, Germany N2 - The influence of laser illumination on the integral as well as on the energy-resolved electron currents from well-defined p-doped Si-tip arrays was investigated. First results have provided stable cathode currents between 100 nA and 500 μA in a field range of 2-20 V/μm. Green laser illumination resulted in an enhanced cathode current and an increased population of the conduction band which can be seen in the spectra. Charging of the cathode surface, however, leads to a shift and broadening of the spectra which complicate their analysis. Therefore, further experiments with a rotatable cathode and a varying number of tips as well as with a tunable laser are planned. KW - cathodes KW - conduction bands KW - electron field emission KW - elemental semiconductors KW - field emission spectroscopy KW - field emitter arrays KW - laser illumination KW - lighting KW - p-doped silicon tips KW - photo sensitivity KW - silicon Y1 - 2011 UR - https://ieeexplore.ieee.org/document/6004582?arnumber=6004582 SN - 978-3-00-035081-8 SN - 978-1-4577-1243-2 SN - 2380-6311 SN - 2164-2370 SP - 101 EP - 102 PB - IEEE ER - TY - CHAP A1 - Prommesberger, Christian A1 - Dams, Florian A1 - Langer, Christoph A1 - Schreiner, Rupert A1 - Rutkowski, S. A1 - Bornmann, Benjamin A1 - Müller, Günter T1 - Simulation of electron trajectories of a field emission electron source in triode configuration by using finite element methods T2 - 24th International Vacuum Nanoelectronics Conference (IVNC), 2011 : 18 - 22 July 2011, Historische Stadthalle Wuppertal, Germany N2 - The finite element simulation program COMSOL Multiphysics® was used to simulate the emission efficiency of a silicon tip electron source in triode configuration for different geometries and electrode potentials. The simulation predicts a maximum emission efficiency of 84% for an optimized structure. In a second simulation a gate electrode was concentrically arranged above a single CNT column. Here, the efficiency was simulated as a function of gate hole geometry, electrode potentials and distances between the electrodes. The simulation shows that a conical shape of the gate hole results in an efficiency up to nearly 100%. KW - carbon nanotubes KW - electron field emission KW - electron source simulation KW - finite element analysis KW - simulation of electron trajectories KW - triodes Y1 - 2011 UR - https://ieeexplore.ieee.org/document/6004589 SN - 978-3-00-035081-8 SN - 978-1-4577-1243-2 SN - 2380-6311 SN - 2164-2370 SP - 144 EP - 145 PB - IEEE CY - Piscataway, NJ ER - TY - CHAP A1 - Bachmann, Michael A1 - Dams, Florian A1 - Düsberg, F. A1 - Hofmann, Martin A1 - Pahlke, Andreas A1 - Langer, Christoph A1 - Ławrowski, Robert Damian A1 - Prommesberger, Christian A1 - Schreiner, Rupert T1 - Stability investigation of high aspect ratio n-type silicon field emitter arrays T2 - 2015 28th International Vacuum Nanoelectronics Conference (IVNC), 13-17 July 2015, Guangzhou, China N2 - Electron sources based on silicon field emitter arrays, produced in processes based on semiconductor technology, are good candidates for a miniaturized X-ray source. A key parameter for this application is the stability of the X-ray photon flux and, thus, the emission current. In the present work we have investigated the influence of the residual gas pressure and a resistor in series on the emission stability of a high aspect ratio n-type silicon emitter array with hybrid extraction electrode. An increase of current fluctuations was found for pressures above 10-6 mbar. High resistances in series to the emitter array alter the emission characteristics, but greatly suppress spikes in the emission current and improve its stability. This, however, strongly depends on the bias point. The field enhancement factor is not affected by the resistance. In a long term measurement the emission current was found to be constant after an initial phase of degradation. KW - Current measurement KW - emission current stability KW - field emitter array KW - Field emitter arrays KW - RESISTANCE KW - Resistors KW - semiconductor field emission KW - silicon KW - silicon tips KW - Stability analysis KW - Thermal stability KW - XRF spectroscopy Y1 - 2015 U6 - https://doi.org/10.1109/IVNC.2015.7225584 SP - 204 EP - 205 PB - IEEE ER - TY - JOUR A1 - Pangerl, Jonas A1 - Moser, Elisabeth A1 - Müller, Max A1 - Weigl, Stefan A1 - Jobst, Simon A1 - Rück, Thomas A1 - Bierl, Rudolf A1 - Matysik, Frank-Michael T1 - A sub-ppbv-level Acetone and Ethanol Quantum Cascade Laser Based Photoacoustic Sensor– Characterization and Multi-Component Spectra Recording in Synthetic Breath JF - Photoacoustics N2 - Trace gas analysis in breath is challenging due to the vast number of different components. We present a highly sensitive quantum cascade laser based photoacoustic setup for breath analysis. Scanning the range between 8263 and 8270 nm with a spectral resolution of 48 pm, we are able to quantify acetone and ethanol within a typical breath matrix containing water and CO2. We photoacoustically acquired spectra within this region of mid-infra-red light and prove that those spectra do not suffer from non-spectral interferences. The purely additive behavior of a breath sample spectrum was verified by comparing it with the independently acquired single component spectra using Pearson and Spearman correlation coefficients. A previously presented simulation approach is improved and an error attribution study is presented. With a 3σ detection limit of 6.5 ppbv in terms of ethanol and 250 pptv regarding acetone, our system is among the best performing presented so far. KW - Acetone KW - Breath analysis KW - Photoacoustic spectroscopy KW - Quantum cascade laser KW - Spectral simulation Y1 - 2023 U6 - https://doi.org/10.1016/j.pacs.2023.100473 SN - 2213-5979 N1 - Corresponding author: Jonas Pangerl VL - 30 SP - 1 EP - 12 PB - Elsevier ER - TY - JOUR A1 - Menzel, Andreas A1 - Kammler, Martin A1 - Conrad, E. H. A1 - Yeh, V. A1 - Hupalo, Myron A1 - Tringides, Michael C. T1 - Kinetics measurements of Pb island growth on Si(111) JF - Physical Review B N2 - We present the results of kinetics experiments on quantum-size-effects (QSE) Pb islands formed on Si(111). We have looked at the evolution of seven-layer Pb islands from five-layer Pb islands due to the transport of Pb atoms from the interisland region, overcoming a barrier at the island edges, and moving to the island tops. By analyzing low-energy electron-diffraction and scanning-tunneling microscopy data, we have estimated the barrier for layer formation in this system to be ∼0.32eV. This energy is much larger than that expected from QSE electronic contributions alone. Y1 - 2003 U6 - https://doi.org/10.1103/PhysRevB.67.165314 VL - 67 IS - 16 PB - American Physical Society ER - TY - CHAP A1 - Serbun, Pavel A1 - Navitski, Aliaksandr A1 - Müller, Günter A1 - Schreiner, Rupert A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Dams, Florian T1 - Scaling of the field emission current from B-doped Si-tip arrays T2 - 25th International Vacuum Nanoelectronics Conference (IVNC) ; Jeju, Korea (South), 09.07.2012 - 13.07.2012 N2 - We have fabricated a test chip with various hexagonal arrays of B-doped Si tips (height ~ 3 μm, apex radius <; 30 nm, number 1-4447, resistivity 4 Ωcm, 100 orientation) in triangular arrangement (pitch 10 μm, density 1.16×10 6 cm -2 ) in order to systematically investigate the field emission current scaling with the number N of tips. Regulated voltage scans for 1 nA revealed rather efficient emission from nearly all tips of the arrays at an average field of 15 V/μm. The expected current plateau was always obtained at fields around 20 V/μm, but its width strongly increased with N. In this carrier depletion range, the single tip provided a much higher stability (<; 5%) of the current (2-3 nA) than at lower (>; 50 %) and higher currents (>; 30%). Integral current measurements of the hexagonal arrays resulted in a statistically improved current stability (<; 1%) but only a weak increase of the total current with N 0.28 yet. These results will be discussed with respect to the remaining inhomogeneity of the tips. KW - Anodes KW - B-doped KW - boron KW - Current measurement KW - current scaling KW - electron field emission KW - elemental semiconductors KW - field emitter arrays KW - Iron KW - Nonhomogeneous media KW - silicon KW - Voltage control Y1 - 2012 SN - 978-1-4673-1984-3 SN - 978-1-4673-1983-6 SN - 978-1-4673-1982-9 U6 - https://doi.org/10.1109/IVNC.2012.6316965 SN - 2380-6311 SN - 2164-2370 SP - 1 EP - 2 PB - IEEE CY - Piscataway, N.J. ER -